Compositions and methods for aromatic polysulfone copolymers are described herein. The polysulfone copolymers have advantageous properties, particularly in terms of high glass transition temperatures (T.sub.g), improved thermal stability, improved flame resistance, good mechanical properties, chemical resistance and dimensional stability at elevated temperature. The polysulfone copolymers are suitable for manufacturing high temperature molded systems and other articles of manufacture via injection molding, extrusion, compression molding, coating, blow molding, thermoforming, rotational molding and additive manufacturing.

Compositions and methods for amorphous high temperature polyketone polymers incorporating 2H-benzimidazol-2-one with dihalobenzophenone and bis(halobenzoyl)benzene as comonomer units are described herein. The polyketones polymers have advantageous properties, particularly in terms of high glass transition temperatures (T.sub.g), inherently flame resistance, good mechanical properties at elevated temperature, chemical resistance and dimensional stability in wet environment. The polymers are suitable for manufacturing high temperature molded systems and other articles of manufacture via injection molding, extrusion, compression molding, coating, blow molding, thermoforming, rotational molding and additive manufacturing.

Compositions and methods for semicrystalline poly(aryl ether ketone) copolymers incorporating 2-benzimidazolinone and hydroquinone as comonomer units with 4,4′-dihalobenzophenone, and compositions and methods for semicrystalline poly(aryl ether ketone) copolymers incorporating 2-benzimidazolinone and hydroquinone as comonomer units with 1,4-bis(4-dihalobenzoyl)benzene are described herein. The copolymers have advantageous properties, particularly in terms of their glass transition temperatures (T.sub.g), crystallization temperatures from melt (T.sub.c), melting temperatures (T.sub.m), crystallinity and chemical resistance. The copolymers are suitable for manufacturing high temperature and chemical resistance molded systems and other articles of manufacture via injection molding, extrusion, compression molding, thermoforming and additive manufacturing.

Compositions and methods for semicrystalline poly(aryl ether ketone) copolymers incorporating 2-benzimidazolinone and hydroquinone as comonomer units with 4,4′-dihalobenzophenone, and compositions and methods for semicrystalline poly(aryl ether ketone) copolymers incorporating 2-benzimidazolinone and hydroquinone as comonomer units with 1,4-bis(4-dihalobenzoyl)benzene are described herein. The copolymers have advantageous properties, particularly in terms of their glass transition temperatures (T.sub.g), crystallization temperatures from melt (T.sub.c), melting temperatures (T.sub.m), crystallinity and chemical resistance. The copolymers are suitable for manufacturing high temperature and chemical resistance molded systems and other articles of manufacture via injection molding, extrusion, compression molding, thermoforming and additive manufacturing.

A composition for forming a resist underlayer film that enables the formation of a desired resist pattern; and a method for producing a resist pattern and a method for producing a semiconductor device, each of which uses the resist underlayer film-forming composition. The resist underlayer film-forming composition comprises an organic solvent and the reaction product of (A) a hydantoin-containing compound that has two epoxy groups and (B) a hydantoin-containing compound different from (A). This reaction product is preferably the reaction product of a secondary amino group present in the hydantoin-containing compound (B) and the epoxy group present in the hydantoin-containing compound (A).

The present invention relates to an n-type conductive composition comprising a rigid conjugated polymer having a dihedral angle from 0° to 20° and an n-type polymeric cation. Further, the present invention relates to an n-type conductive ink comprising such a composition.

Compositions and methods for amorphous high temperature polyketone polymers incorporating 2H-benzimidazol-2-one with dihalobenzophenone and bis(halobenzoyl)benzene as comonomer units are described herein. The polyketones polymers have advantageous properties, particularly in terms of high glass transition temperatures (T.sub.g), inherently flame resistance, good mechanical properties at elevated temperature, chemical resistance and dimensional stability in wet environment. The polymers are suitable for manufacturing high temperature molded systems and other articles of manufacture via injection molding, extrusion, compression molding, coating, blow molding, thermoforming, rotational molding and additive manufacturing.

A polymer comprising a repeating structure of formula (I): -D-X.sup.1-A-X.sup.2-. D is a conjugated electron-donating group of formula (II); A is a conjugated electron-accepting group; X.sup.1 and X.sup.2 are each independently a conjugated bridge group selected from phenylene, thiophene, furan, thienothiophene, furofuran, thienofuran, thiazole, oxazole, alkene, alkyne and imine, each of which may be unsubstituted or substituted with one or more substituents. The polymer has a highest occupied molecular orbital (HOMO) level as measured by square wave voltammetry of no more than 5.30 eV from vacuum level. The polymer may be used as an electron donor in an organic photodetector.

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Compositions and methods for aromatic polysulfone copolymers are described herein. The polysulfone copolymers have advantageous properties, particularly in terms of high glass transition temperatures (T.sub.g), improved thermal stability, improved flame resistance, good mechanical properties, chemical resistance and dimensional stability at elevated temperature. The polysulfone copolymers are suitable for manufacturing high temperature molded systems and other articles of manufacture via injection molding, extrusion, compression molding, coating, blow molding, thermoforming, rotational molding and additive manufacturing.

A polymer compound to be used as a binder for a negative electrode of a power storage device is provided. The polymer compound is formed by condensation of a polyacrylic acid and a polyfunctional amine represented by the following general formula (1), where X is a ring structure having 1 to 3 benzene rings; and C.sup.1 to C.sup.4 are each a carbon atom constituting a benzene ring in the ring structure. ##STR00001##