Patent classifications
C08G8/18
Polycondensate based water-reducer
The present invention relates to polycondensates containing at least a structural unit, which is an aromatic moiety bearing a polyether side chain, at least a structural unit, which is an aromatic moiety bearing at least one phosphoric acid monoester group, at least a structural unit, which is an aromatic moiety, bearing at least one hydroxy group and at least a methylene unit (—CH.sub.2—), which is attached to two aromatic structural units. The invention also concerns a process for the production of the polycondensates, their use for the dispersion of inorganic binders, for increasing the strength development of concrete and for improving the slump-retention of concrete. The invention relates also to building material mixtures comprising the polycondensates and inorganic binders.
Polycondensate based water-reducer
The present invention relates to polycondensates containing at least a structural unit, which is an aromatic moiety bearing a polyether side chain, at least a structural unit, which is an aromatic moiety bearing at least one phosphoric acid monoester group, at least a structural unit, which is an aromatic moiety, bearing at least one hydroxy group and at least a methylene unit (—CH.sub.2—), which is attached to two aromatic structural units. The invention also concerns a process for the production of the polycondensates, their use for the dispersion of inorganic binders, for increasing the strength development of concrete and for improving the slump-retention of concrete. The invention relates also to building material mixtures comprising the polycondensates and inorganic binders.
DISPERSION LIQUID, CONDUCTIVE FILM AND PRODUCTION METHOD THEREOF, ELECTRODE, AND SOLAR CELL
Provided is a dispersion liquid that can improve coatability (wettability) with respect to a base material and can form a conductive film having high close adherence with a base material. The dispersion liquid contains a carbon material (A), a condensate (B) of an aromatic sulfonic acid compound, a hydroxyphenol compound, and an aldehyde compound, and a solvent (C).
DISPERSION LIQUID, CONDUCTIVE FILM AND PRODUCTION METHOD THEREOF, ELECTRODE, AND SOLAR CELL
Provided is a dispersion liquid that can improve coatability (wettability) with respect to a base material and can form a conductive film having high close adherence with a base material. The dispersion liquid contains a carbon material (A), a condensate (B) of an aromatic sulfonic acid compound, a hydroxyphenol compound, and an aldehyde compound, and a solvent (C).
Material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography and production method thereof, pattern forming method, resin, and purification method
The present embodiment provides a material for forming an underlayer film for lithography, containing at least any of a compound represented by following formula (1) or a resin including a structural unit derived from a compound represented by the following formula (1), ##STR00001##
wherein R.sup.1 represents a 2n-valent group having 1 to 60 carbon atoms, or a single bond, each R.sup.2 independently represents a halogen atom, a straight, branched or cyclic alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, an alkoxy group having 1 to 30 carbon atoms, a thiol group, a hydroxyl group, or a group where a hydrogen atom of a hydroxyl group is substituted with an acid-dissociable group, and may be the same or different in the same naphthalene ring or benzene ring, in which at least one R.sup.2 represents a group where a hydrogen atom of a hydroxyl group is substituted with an acid-dissociable group, n is an integer of 1 to 4, and structural formulae of n structural units in square brackets [ ] may be the same or different when n is an integer of 2 or more, X represents an oxygen atom, a sulfur atom, or a non-bridging group, each m.sup.2 is independently an integer of 0 to 7, provided that at least one m.sup.2 is an integer of 1 to 7, and each q is independently 0 or 1.
Use of an esterified aromatic polyphenol derivative for the production of a phenol-aldehyde resin for reinforcement of a rubber composition
An aromatic polyphenol derivative which comprises at least one aromatic ring bearing at least two OZ groups in the meta position relative to one another, the two positions ortho to at least one of the OZ groups being unsubstituted, is used for the manufacture of a phenol-aldehyde resin for reinforcing a rubber composition. Each OZ group represents an O((CO)(R.sub.1)) group with R.sub.1 representing a hydrocarbon-based radical or a substituted hydrocarbon-based radical.
Use of an esterified aromatic polyphenol derivative for the production of a phenol-aldehyde resin for reinforcement of a rubber composition
An aromatic polyphenol derivative which comprises at least one aromatic ring bearing at least two OZ groups in the meta position relative to one another, the two positions ortho to at least one of the OZ groups being unsubstituted, is used for the manufacture of a phenol-aldehyde resin for reinforcing a rubber composition. Each OZ group represents an O((CO)(R.sub.1)) group with R.sub.1 representing a hydrocarbon-based radical or a substituted hydrocarbon-based radical.
Resist material, resist composition and method for forming resist pattern
The resist material according to the present invention contains a compound represented by the following formula (1): ##STR00001## wherein each R.sup.0 is independently a monovalent group having an oxygen atom, a monovalent group having a sulfur atom, a monovalent group having a nitrogen atom, a hydrocarbon group, or a halogen atom; and each p is independently an integer of 0 to 4.
Resist material, resist composition and method for forming resist pattern
The resist material according to the present invention contains a compound represented by the following formula (1): ##STR00001## wherein each R.sup.0 is independently a monovalent group having an oxygen atom, a monovalent group having a sulfur atom, a monovalent group having a nitrogen atom, a hydrocarbon group, or a halogen atom; and each p is independently an integer of 0 to 4.
ADHESION PROMOTER FOR COATINGS ON METAL SURFACES
Coating or resin compositions substantially free of bisphenol A with excellent surface adhesion comprising a compound in an effective amount of less than 10% w/w based on the resin with the following structure:
##STR00001##
The adhesion promoters are preferably aldehyde condensation products of aromatic carboxylic acid, phosphonic acid, phosphinic acid, sulphonic acid or sulphinic acid or its corresponding ionic form.