Patent classifications
C09D161/14
Rosin-modified phenol resin, lithographic printing ink, and printed product
A rosin-modified phenol resin (A) is a reaction product of a rosin (b), a phenol (c), a formaldehyde (d) and a polyol (e), wherein the rosin (b) contains 0.1 to 3.5% by mass of a monoterpene (a1) and a sesquiterpene (a2) relative to the total weight of the rosin, and Mw/Mn which is the ratio of the weight average molecular weight (Mw) and the number average molecular weight (Mn) is 10 to 60.
Rosin-modified phenol resin, lithographic printing ink, and printed product
A rosin-modified phenol resin (A) is a reaction product of a rosin (b), a phenol (c), a formaldehyde (d) and a polyol (e), wherein the rosin (b) contains 0.1 to 3.5% by mass of a monoterpene (a1) and a sesquiterpene (a2) relative to the total weight of the rosin, and Mw/Mn which is the ratio of the weight average molecular weight (Mw) and the number average molecular weight (Mn) is 10 to 60.
Powder coating pretreatment compositions, and methods of using and making the same
The present document describes a composition for the pretreatment of surfaces, which comprises plasticizers, degassers, pH adjusting agents, pigments, a phenol formaldehyde resin based adhesive, process of making the same and method of using the same.
Powder coating pretreatment compositions, and methods of using and making the same
The present document describes a composition for the pretreatment of surfaces, which comprises plasticizers, degassers, pH adjusting agents, pigments, a phenol formaldehyde resin based adhesive, process of making the same and method of using the same.
ROSIN-MODIFIED PHENOL RESIN, LITHOGRAPHIC PRINTING INK, AND PRINTED PRODUCT
A rosin-modified phenol resin (A) is a reaction product of a rosin (b), a phenol (c), a formaldehyde (d) and a polyol (e), wherein the rosin (b) contains 0.1 to 3.5% by mass of a monoterpene (a1) and a sesquiterpene (a2) relative to the total weight of the rosin, and Mw/Mn which is the ratio of the weight average molecular weight (Mw) and the number average molecular weight (Mn) is 10 to 60.
ROSIN-MODIFIED PHENOL RESIN, LITHOGRAPHIC PRINTING INK, AND PRINTED PRODUCT
A rosin-modified phenol resin (A) is a reaction product of a rosin (b), a phenol (c), a formaldehyde (d) and a polyol (e), wherein the rosin (b) contains 0.1 to 3.5% by mass of a monoterpene (a1) and a sesquiterpene (a2) relative to the total weight of the rosin, and Mw/Mn which is the ratio of the weight average molecular weight (Mw) and the number average molecular weight (Mn) is 10 to 60.
Method for coating pipe with acid-curable resin and acid curing agent
In the coating method, a pipe for transporting oil and/or gas mined from underground is provided. An acid curable resin is passed through the pipe to adhere the acid curable resin to at least a part of an inner wall of the pipe. Then, an acid curing agent is passed through the pipe to allow the acid curing agent to make contact with the acid curable resin such that the acid curable resin is cured.
Method for coating pipe with acid-curable resin and acid curing agent
In the coating method, a pipe for transporting oil and/or gas mined from underground is provided. An acid curable resin is passed through the pipe to adhere the acid curable resin to at least a part of an inner wall of the pipe. Then, an acid curing agent is passed through the pipe to allow the acid curing agent to make contact with the acid curable resin such that the acid curable resin is cured.
Modified hydroxy naphthalene novolak resin, production method for modified hydroxy naphthalene novolak resin, photosensitive composition, resist material and coating
Provided is a modified hydroxy naphthalene novolak resin which is optimal for a photosensitive composition and a resist material having high optical sensitivity, resolution, and alkali developability, and excellent heat resistance and moisture absorption resistance, and the modified hydroxy naphthalene novolak resin includes a structural moiety (I) represented by Structural Formula as a repeating unit: ##STR00001## wherein R.sup.1is any one of a hydrogen atom, a tertiary alkyl group, an alkoxyalkyl group, an acyl group, an alkoxycarbonyl group, a hetero atom-containing cyclic hydrocarbon group, and a trialkylsilyl group; m is 1 or 2; R.sup.2's each independently is any one of a hydrogen atom, an alkyl group, an alkoxy group, an aryl group, an aralkyl group, and a halogen atom; and at least one of the R.sup.1's present in the resin is any one of a tertiary alkyl group, an alkoxyalkyl group, an acyl group, an alkoxycarbonyl group, a hetero atom-containing cyclic hydrocarbon group, and a trialkylsilyl group.
Modified hydroxy naphthalene novolak resin, production method for modified hydroxy naphthalene novolak resin, photosensitive composition, resist material and coating
Provided is a modified hydroxy naphthalene novolak resin which is optimal for a photosensitive composition and a resist material having high optical sensitivity, resolution, and alkali developability, and excellent heat resistance and moisture absorption resistance, and the modified hydroxy naphthalene novolak resin includes a structural moiety (I) represented by Structural Formula as a repeating unit: ##STR00001## wherein R.sup.1is any one of a hydrogen atom, a tertiary alkyl group, an alkoxyalkyl group, an acyl group, an alkoxycarbonyl group, a hetero atom-containing cyclic hydrocarbon group, and a trialkylsilyl group; m is 1 or 2; R.sup.2's each independently is any one of a hydrogen atom, an alkyl group, an alkoxy group, an aryl group, an aralkyl group, and a halogen atom; and at least one of the R.sup.1's present in the resin is any one of a tertiary alkyl group, an alkoxyalkyl group, an acyl group, an alkoxycarbonyl group, a hetero atom-containing cyclic hydrocarbon group, and a trialkylsilyl group.