An antimicrobial composition comprising: a) C2-C8 alkylated polyvinylpyrrolidone polymer; and b) biocidal agent selected from the group consisting of quaternary ammonium compounds, chlorohexidine salts, polymeric biguanides, organic acids, hydrogen peroxide, tertiary alkyl amines, iodophors and mixtures thereof.

Solid rinsing, cleaning and/or sanitizing compositions for various applications are provided. In particular, solid compositions include a complex of urea and an acid having desirable storage stability previously unavailable in solid urea/acid compositions. Stable solid compositions are disclosed and methods of making the same to overcome conventional limitations associated with with forming kinetically and thermodynamically stable solids that utilize urea/acid compositions.

Provided are a cleaning agent and a cleaning liquid that prevent a reduction in the rejection rate of an RO membrane which may occur when the RO membrane is cleaned and a method for cleaning an RO membrane with the cleaning liquid. The agent for cleaning an RO membrane includes a urea derivative. The urea derivative preferably includes urea (H.sub.2N—CO—NH.sub.2) and/or biuret (H.sub.2N—CO—NH—CO—NH.sub.2). The cleaning liquid is an aqueous solution produced by diluting the cleaning agent. The method for cleaning an RO membrane uses the cleaning liquid. Urea and biuret have a structure analogous to amide bonds included in aromatic polyamide RO membranes, and have a strong affinity for amide bond portions. Urea and biuret adsorb onto the amide bond portions, and prevent the amide bonds from being broken by the cleaning liquid.

The present invention improves greying inhibition in the washing of textiles by the use of urea derivatives comprising sulfonic or carboxylic acid groups.

A polyimide-based resin film cleaning liquid includes at least one solvent selected from the group consisting of a hydroxy aliphatic carboxylic acid ester, an aliphatic carboxylic acid ester, a chain or cyclic ketone, an alkylene glycol monoalkyl ether, an alkylene glycol monoalkyl ether acetate, and an aprotic polar solvent other than these solvents.

Hand sanitizers are provided with improved aesthetics and skin-conditioning effects, such that healthcare workers and others subject to high frequency hand hygiene requirements are encouraged to comply with said requirements. The hand sanitizers provide excellent antimicrobial efficacy and skin conditioning benefits that actually increase with increased frequency of use. The sanitizing compositions are hydroalcoholic, and contain a synergistic combination of skin-conditioning agents.

Solid rinsing, cleaning and/or sanitizing compositions for various applications are provided. In particular, solid compositions include a complex of urea and an acid having desireable storage stability previously unavailable in solid urea/acid compositions. Stable solid compositions are disclosed and methods of making the same to overcome conventional limitations associated with with forming kinetically and thermodynamically stable solids that utilize urea/acid compositions.

A cleaning agent composition for use in removal of an adhesive residue, the composition containing a quaternary ammonium salt and a solvent, wherein the solvent consists of an organic solvent, and the organic solvent includes an N,N,N′,N′-tetra(hydrocarbyl)urea.

The invention provides compositions useful in post-CMP cleaning operations, particularly those substrates which contain exposed copper surfaces. The compositions of the invention provide excellent cleaning of such substrates while showing fewer defects from silica and organic materials present at the surface of the substrate. Also provided is a method for cleaning a microelectronic device substrate using such compositions and a kit comprising, in two or more containers, the components of the compositions.

Described are methods for removing abrasive particles from a polymeric surface, such as from a polymeric surface of a cleaning brush used in a post chemical-mechanical processing cleaning step, as well as related cleaning solutions.