Patent classifications
C11D7/329
COMPOSITIONS COMPRISING CATIONIC POLY ALPHA-1,3-GLUCAN ETHERS
Fabric conditioning compositions that include a poly alpha-1,3-glucan ether compound and depositable actives, where the poly alpha-1,3-glucan ether compound may be characterized by certain molecular weights and degrees of cationic substitution. Related methods of using and making such compositions.
Composition For Removing Etch Residues, Methods Of Using And Use Thereof
A method and cleaning composition for microelectronic devices or semiconductor substrates including at least one N alkanolamine; at least one hydroxylamine or derivatives of hydroxylamine or mixtures thereof; at least one polyfunctional organic acid with at least two carboxylic acid groups and water. The cleaning compositions can further include at least one corrosion inhibitor.
CLEANING COMPOSITIONS CONTAINING GUM AND METHODS OF USE THEREWITH
The disclosure provides cleaning compositions including at least one acid, at least one carbonate salt, at least one gum, at least one acid salt, and, optionally, at least one chelating agent. When exposed to an aqueous medium, the cleaning compositions may produce carbon dioxide. These cleaning compositions find use, for example, in cleaning textile fibers, such as carpets, drapery, upholstery, and the like. The disclosure provides methods of cleaning soiled textile fibers with a cleaning composition including gum arabic, at least one acid, and at least one carbonate salt.
DISHWASH DETERGENT PRODUCT
The present invention is in the field of machine dishwashing compositions. More particularly, it relates to machine dishwashing compositions comprising a phosphonate and polycarboxylate comprising acrylic acid monomers. The invention also relates to a method of washing kitchenware in a machine dishwasher with a machine dishwashing composition comprising a phosphonate and a polycarboxylate comprising acrylic acid monomers and a process for making said composition.
Cleaning composition and method for cleaning semiconductor wafers after CMP
The invention provides a composition for cleaning contaminants from semiconductor wafers following chemical-mechanical polishing. The cleaning composition contains one or more quaternary ammonium hydroxides, one or more organic amines, one or more metal inhibitors, and water. The invention also provides methods for using the cleaning composition.
TREATMENT COMPOSITIONS COMPRISING CATIONIC POLY ALPHA-1,6-GLUCAN ETHERS
Treatment compositions, such as fabric care or dish care compositions, that include poly alpha-1,6-glucan ether compounds, which include poly alpha-1,6-glucans substituted with at least one positively charged organic group, the compounds being characterized by, for example, a degree of substitution of about 0.001 to about 3.0, and optionally, where about 3% or more of the backbone glucose monomer units have branches via alpha-1,2- and/or alpha-1,3-glycosidic linkages. Methods related to making and using such compositions.
COMPOSITIONS AND METHODS FOR REDUCING INTERACTION BETWEEN ABRASIVE PARTICLES AND A CLEANING BRUSH
Described are methods for removing abrasive particles from a polymeric surface, such as from a polymeric surface of a cleaning brush used in a post chemical-mechanical processing cleaning step, as well as related cleaning solutions.
Compositions and methods for reducing interaction between abrasive particles and a cleaning brush
Described are methods for removing abrasive particles from a polymeric surface, such as from a polymeric surface of a cleaning brush used in a post chemical-mechanical processing cleaning step, as well as related cleaning solutions.
COMPOSITIONS AND METHODS FOR CLEARING TISSUE
Investigation of fine tissue structures, such as those in non-neural, non-osseous tissues or organs, is best performed in intact tissue. Described herein are compositions and methods for clearing tissues for subsequent three-dimensional analysis. The compositions referred to herein as tissue clearing compositions are composed of four core components: (1) a homogenizing agent such as N-methylglucamine, urea, thiourea, guanidine, guanidinium chloride, lithium perchlorate, ethylenediamine, and derivatives thereof; (2) a water-soluble adjusting agent such as iohexol, sodium thiosulfate, polyethylene glycol, and derivatives thereof; (3) a lipid-soluble adjusting agent such as 2,2′-thiodiethanol, propylene glycol, and derivatives thereof; and (4) a borate compound such as boric acid, tetraboric acid, disodium tetraborate, and derivatives thereof. The disclosed tissue clearing compositions are particularly suitable for use with non-neural, non-osseous tissues or organs. The tissues or organs can be fresh, archived, or retrieved from paraffin wax-embedded tissues.
Cleaning compositions containing gum and methods of use therewith
The disclosure provides cleaning compositions including at least one acid, at least one carbonate salt, at least one gum, at least one acid salt, and, optionally, at least one chelating agent. When exposed to an aqueous medium, the cleaning compositions may produce carbon dioxide. These cleaning compositions find use, for example, in cleaning textile fibers, such as carpets, drapery, upholstery, and the like. The disclosure provides methods of cleaning soiled textile fibers with a cleaning composition including gum arabic, at least one acid, and at least one carbonate salt.