A sensor array includes a plurality of sensors. A sensor of the plurality of sensors has a sensor pad exposed at a surface of the sensor array. A method of treating the sensor array includes exposing at least the sensor pad to a wash solution including sulfonic acid and an organic solvent and rinsing the wash solution from the sensor pad.

A sensor array includes a plurality of sensors. A sensor of the plurality of sensors has a sensor pad exposed at a surface of the sensor array. A method of treating the sensor array includes exposing at least the sensor pad to a wash solution including sulfonic acid and an organic solvent and rinsing the wash solution from the sensor pad.

The invention relates to compounds of general formula (I), ##STR00001##
in which each E independently represents O or NR.sup.1, with the proviso that at least 1 E is not O and at least 1 R.sup.1 represents a substituted C.sub.1-22 alkyl of the general formula (IIa) or (IIb) or (IIIa) or (IIIb), ##STR00002##
in which Q represents O or CH.sub.2, w represents a number from 1 to 22, q represents 1 or 2 and A.sup.+ represents a cation selected from alkali metal cations where q=1, ½ alkaline earth cations where q=2 and ammonium ions where q=1, as well as metal complexes having this ligand compound and dishwashing detergents which contain such metal complexes.

The invention relates to compounds of general formula (I), ##STR00001##
in which each E independently represents O or NR.sup.1, with the proviso that at least 1 E is not O and at least 1 R.sup.1 represents a substituted C.sub.1-22 alkyl of the general formula (IIa) or (IIb) or (IIIa) or (IIIb), ##STR00002##
in which Q represents O or CH.sub.2, w represents a number from 1 to 22, q represents 1 or 2 and A.sup.+ represents a cation selected from alkali metal cations where q=1, ½ alkaline earth cations where q=2 and ammonium ions where q=1, as well as metal complexes having this ligand compound and dishwashing detergents which contain such metal complexes.

Provided is the use of a composition to inactive a virus. The composition comprises a quaternary ammonium compound and a halogenated organic compound. Also provided are a composition and kit for inactivating a virus, and a method for detecting an analyte in a sample.

Provided is the use of a composition to inactive a virus. The composition comprises a quaternary ammonium compound and a halogenated organic compound. Also provided are a composition and kit for inactivating a virus, and a method for detecting an analyte in a sample.

The present disclosure relates to high alkaline cleaners, cleaning systems and methods for removing polymerized zero trans fat soils. The high alkaline cleaner of the present invention generally includes one or more alkaline wetting and saponifying agent(s), a chelating/sequestering system and a surface modifying-threshold agent system. In various embodiments, the cleaners may include, at least one cleaning agent comprising a surfactant or surfactant system and/or a solvent or solvent system and/or a cleaning booster such as a peroxide or sulfite type additive. The cleaners may also include one or more components to modify the composition form and/or the application method in some embodiments. All components described above may also be optimized optionally, to provide emulsification of a composition (both as a usable product or a concentrate that can be diluted to form a usable product). The use of the high alkaline cleaner of the present invention has demonstrated enhanced cleaning characteristics especially at higher temperatures (100° F. to about 200° F.) but also shows enhanced cleaning at ambient temperatures.

The present disclosure relates to high alkaline cleaners, cleaning systems and methods for removing polymerized zero trans fat soils. The high alkaline cleaner of the present invention generally includes one or more alkaline wetting and saponifying agent(s), a chelating/sequestering system and a surface modifying-threshold agent system. In various embodiments, the cleaners may include, at least one cleaning agent comprising a surfactant or surfactant system and/or a solvent or solvent system and/or a cleaning booster such as a peroxide or sulfite type additive. The cleaners may also include one or more components to modify the composition form and/or the application method in some embodiments. All components described above may also be optimized optionally, to provide emulsification of a composition (both as a usable product or a concentrate that can be diluted to form a usable product). The use of the high alkaline cleaner of the present invention has demonstrated enhanced cleaning characteristics especially at higher temperatures (100° F. to about 200° F.) but also shows enhanced cleaning at ambient temperatures.

A cleaning composition which is used for cleaning a coating film forming device, the composition including an acid component having a pKa of 12 or less.

A cleaning composition which is used for cleaning a coating film forming device, the composition including an acid component having a pKa of 12 or less.