The present invention provides a composition, such as a refrigerant composition comprising 1, 1-difluoroethene (vinylidene fluoride, R-1132a); trifluoromethane (R-23); and one or more compound selected from hexafluoroethane (R-116), ethane (R-170) and carbon dioxide (R-744, CO.sub.2).

The present invention provides a composition, such as a refrigerant composition comprising 1,1-difluoroethene (vinylidene fluoride, R-1132a); trifluoromethane (R-23); and one or more compound selected from hexafluoroethane (R-116), ethane (R-170) and carbon dioxide (R-744, CO.sub.2).

A fluoropropene composition comprising Z-1,3,3,3-tetrafluoropropene, E-1,3,3,3-tetrafluoropropene, 2,3,3,3-tetrafluoropropene, and optionally 1,1,1,3,3-pentafluoropropane wherein the 2,3,3,3-tetrafluoropropene being present in an amount of 0.001 to 1.0%. A method of producing the fluoropropene, methods for using the fluoropropene and the composition formed are also disclosed.

A composition comprises at least 99.5% by weight of an iodofluorocarbon compound A and at most 0.5% by weight of a compound B selected from water, HF, HI, IF5, I2, O2, CO2, CO and nitrogen. The iodofluorocarbon compound A is of formula (I) (R1)(R2)C(I)(R3) or of formula (II) (R1)(R2)C═C(I)(R3); in which R1, R2 and R3 independently of one another are selected from the group consisting of H, F, I, a C1-C10 alkyl radical, a C3-C10 cycloalkyl radical, a C2-C10 alkenyl radical, a C3-C10 cycloalkenyl radical, and a C6-C10 aryl radical. All radicals are optionally substituted by a fluorine or iodine atom. At least one of the substituents R1, R2 or R3, is F or is a radical as defined above comprising at least one fluorine atom. The iodofluorocarbon compound A is not CF3I.

A composition comprising: (i) 1,1-difluoroethene (vinylidene fluoride, R-1132a); (ii) carbon dioxide (CO.sub.2, R-744); (iii) pentafluoroethane (R-125); and (iv) one or more of trifluoromethane (R-23) and hexafluoroethane (R-116).

The invention provides a composition comprising 1,1-difluoroethene (R-1132a); a second component selected from the group consisting of hexafluoroethane (R-116), ethane (R-170) and mixtures thereof; and, optionally carbon dioxide (CO.sub.2, R-744).

A process for removing an electroluminescent material from a substrate. The process includes providing a substrate having an electroluminescent material disposed on a surface thereof. The process further includes contacting the substrate with a composition. The composition includes a hydroflourocompound an organic solvent that forms an azeotrope with the hydroflourocompound when mixed with the hydroflourocompound.

A method of patterning a device is disclosed using a resist precursor structure having at least two fluoropolymer layers. A first fluoropolymer layer includes a first fluoropolymer material having a fluorine content of at least 50% by weight and is substantially soluble in a first hydrofluoroether solvent or in a first perfluorinated solvent, but substantially less soluble in a second hydrofluoroether solvent relative to both the first hydrofluoroether and the first perfluorinated solvent. The second fluoropolymer layer includes a second fluoropolymer material having a fluorine content less than that of the first fluoropolymer material and is substantially soluble in the first or second hydrofluoroether solvents, but substantially less soluble in the first perfluorinated solvent relative to both the first and second hydrofluoroether solvents.

A composition comprising trifluoroiodomethane (CF.sub.3I) and 1,1-difluoroethylene (R-1132a) is described. The composition can also comprise additional compounds, such as at least one non-flammable compound selected from the group consisting of carbon dioxide (CO2; R-744), tetrafluoromethane (R-14), trifluoromethane (R-23) and perfluoroethane (R-116) or at least one additional compound of lower volatility than 1,1-difluoroethylene selected from the group consisting of 1,1,2-trifluoroethylene (R-1123), difluoromethane (R-32), propane (R-290), propylene (R-1270), fluoroethane (R-161), pentafluoroethane (R-125), 1,1,1,2-tetrafluoroethane (R-134a), 2,3,3,3-tetrafluopropene (R-1234yf), isobutane (R-600a), n-butane (R-600), trans-1,3,3,3-tetrafluopropene (R-1234ze(E)), 3,3,3-trifluoropropene (R-1243zf), 1,2,3,3,3-pentafluoropropene (R-1225ye), 1, 1,1,2,3,3,3-heptafluoropropane (R-227ea), 1,1- difluoroethane (R-152a), cis-1,3,3,3-tetrafluopropene (R-1234ze(Z)), 1-chloro-3,3,3-trifluoropropene (R-1233zd(E/Z)) and 1,1,1,4,4,4-hexafluoro-2-butene (R-1336mzz(E/Z)). The compositions have utility as refrigerants in vapour compression heat transfer systems.

The present invention provides a composition, such as a refrigerant composition comprising 1,1-difluoroethene (vinylidene fluoride, R-1132a); trifluoromethane (R-23); and one or more compound selected from hexafluoroethane (R-116), ethane (R-170) and carbon dioxide (R-744, CO.sub.2).