Provided is a black light-shielding member, which has an excellent effect of anti-reflection that based on low glossiness and has a high blackness. A black light-shielding member including a substrate film, a resin-made light-shielding layer having a concave-convex shape formed on at least one surface of the substrate film, and a blackened layer formed on the resin-made light-shielding layer is produced. By adjusting an arithmetic mean surface roughness Ra of the surface on which the light-shielding layer and the blackened layer are formed to be 0.25 μm or more, and the maximum thickness of the blackened layer is less than the said Ra, a blackness with an L value of 12 or less is achieved.

Methods for preparing a void-free protective coating are disclosed herein. The void-free protective coating is used on a dielectric window having a central hole, which is used in a plasma treatment tool. A first protective coating layer is applied to the window, leaving an uncoated annular retreat area around the central hole. The first protective coating layer is polished to produce a flat surface and fill in any voids on the window. A second protective coating layer is then applied upon the flat surface of the first protective coating layer to obtain the void-free coating. This increases process uptime and service lifetime of the dielectric window and the plasma treatment tool.

An optical device includes, in sequence, a surface formed of a metal oxide, a samarium oxide-containing layer in contact with the surface formed of a metal oxide, and a magnesium fluoride-containing layer in contact with the samarium oxide-containing layer so as to suppress optical absorption resulting from high-rate sputter deposition of a magnesium fluoride-containing layer on a surface formed of a metal oxide.

The present invention relates to a method of forming a plasma resistant oxyfluoride coating layer, including: mounting a substrate on a substrate holder provided in a chamber; causing an electron beam scanned from an electron gun to be incident on an oxide evaporation source accommodated in a first crucible, and heating, melting, and vaporizing the oxide evaporation source as the electron beam is incident on the oxide evaporation source; vaporizing a fluoride accommodated in a second crucible; and advancing an evaporation gas generated from the oxide evaporation source and a fluorine-containing gas generated from the fluoride toward the substrate, and reacting the evaporation gas generated from the oxide evaporation source and the fluorine-containing gas generated from the fluoride to deposit an oxyfluoride on the substrate. According to the present invention, it is possible to form a dense and stable oxyfluoride coating layer having excellent plasma resistance, suppressed generation of contaminant particles, and no cracks.

Provided is a hard coating film in which a hard coating layer having a water contact angle of 90° or less, a high refractive index layer, and a low refractive index layer are laminated on a substrate, the film having suppressed curling, and excellent hardness and antireflection performance.

Provided is a hard coating film in which a hard coating layer having a water contact angle of 90° or less, a conductive layer, and a low refractive index layer are laminated on a substrate, the film having excellent hardness, anti-curling property, antireflection performance, antifouling performance, and antistatic performance.

A method for manufacturing an optical lens using an ion-assisted deposition apparatus that comprises an ion source includes: forming, on a lens substrate made of a material containing 40 mass % or more of fluoride, a first lower layer of an anti-reflection film of the optical lens, wherein the first lower layer is a fluoride layer; forming, on the first lower layer, a second lower layer of the anti-reflection film; forming on the second lower layer, one or more intermediate layers of the antireflection film; forming, on the one or more intermediate layers, an uppermost layer of the anti-reflection film; and irradiating, using the ion source, the lens substrate with ions.

A method of forming a low reflectivity coating on an optical surface for wide angle of incidence is provided. The method includes depositing a low refractive index layer of material on a stack of dielectric layers, depositing a hydrophobic compatible material on the stack of dielectric layers, forming a blend interface layer on the stack of dielectric layers, the blend interface layer including a portion of the low refractive index layer of material and a portion of the hydrophobic compatible material, and depositing a hydrophobic layer of material adjacent to the blend interface layer. A physical vapor deposition chamber to perform the above method is also provided.

An article comprises a body having a protective coating. The protective coating is a thin film that comprises a metal oxy-fluoride. The metal oxy-fluoride has an empirical formula of M.sub.xO.sub.yF.sub.z, where M is a metal, y has a value of 0.1 to 1.9 times a value of x and z has a value of 0.1 to 3.9 times the value of x. The protective coating has a thickness of 1 to 30 microns and a porosity of less than 0.1%.

The metal material of the present disclosure includes: a metal base; and a film provided on a surface of the metal base and containing a fluorine-containing molybdenum compound, the fluorine-containing molybdenum compound being represented by the formula MoO.sub.xF.sub.y wherein x is a number from 0 to 2 and y is a number from 2 to 5.