Patent classifications
C23C16/45555
ENCAPSULATION SYSTEM FOR ELECTRONIC COMPONENTS AND BATTERIES
Systems, methods, and apparatus for encapsulating objects like that of microelectronic components and batteries. The system includes three successive layers that include a first covering layer composed of an electrically insulating material deposited by atomic layer deposition, which at least partly covers the object, a second covering layer that includes parylene and/or polyimide, and which is disposed on the first covering layer, and a third covering layer deposited on the second covering layer in such a way as to protect the second encapsulation layer, namely, with respect to oxygen, and thereby increase the service life of the object.
LAMINATE AND METHOD OF PRODUCING THE SAME, AND GAS BARRIER FILM AND METHOD OF PRODUCING THE SAME
A laminate that improves barrier properties of an atomic layer deposition film in spite of use of a substrate made of a polymer material, and provides a gas barrier film and a method of producing the same. The laminate includes: a substrate made a polymer material; an undercoat layer disposed on at least part of a surface of the substrate and made up of an inorganic material containing Ta; and an atomic layer deposition film disposed so as to cover a surface of the undercoat layer.
SOLID ELECTROLYTE CONTAINING OXYNITRIDE, AND SECONDARY BATTERY INCLUDING THE SOLID ELECTROLYTE
A solid electrolyte includes an oxynitride that contains an alkaline-earth metal, phosphorus, oxygen, and nitrogen. A P2p spectrum obtained by an X-ray photoelectron spectroscopy measurement of the oxynitride contains a peak component originating from a P—N bond.
FUNCTIONALIZED FOAMS
A method of fabricating an foam includes providing a foam comprising a base material. The base material is coated with an inorganic material using at least one of an atomic layer deposition (ALD), a molecular layer deposition (MLD), or sequential infiltration synthesis (SIS) process. The SIS process includes at least one cycle of exposing the foam to a first metal precursor for a first predetermined time and a first partial pressure. The first metal precursor infiltrates at least a portion of the base material and binds with the base material. The foam is exposed to a second co-reactant precursor for a second predetermined time and a second partial pressure. The second co-reactant precursor reacts with the first metal precursor, thereby forming the inorganic material on the base material. The inorganic material infiltrating at least the portion of the base material. The inorganic material is functionalized with a material.
METHOD FOR MANUFACTURING A POROUS ELECTRODE, AND MICROBATTERY CONTAINING SUCH AN ELECTRODE
A method for manufacturing an electrode having a porosity of between 20% and 60% by volume and pores with an average diameter of less than 50 nm. In the method, provision is made of a substrate and a colloidal suspension of aggregates or agglomerates of monodisperse primary nanoparticles of an active electrode material, having an average primary diameter D.sub.50 of between 2 and 100 nm, the aggregates or agglomerates having an average diameter D.sub.50 of between 50 nm and 300 nm. A layer is deposited from said colloidal suspension on the substrate. The deposited layer is then dried and consolidated to obtain a mesoporous layer. A coating of an electronically conductive material is then deposited on and inside the pores of the porous layer. Such a porous electrode can be used in lithium-ion microbatteries.
METHODS FOR FORMING PROTECTIVE COATINGS CONTAINING CRYSTALLIZED ALUMINUM OXIDE
Embodiments of the present disclosure generally relate to protective coatings on substrates and methods for depositing the protective coatings. In one or more embodiments, a method of forming a protective coating on a substrate includes depositing a chromium oxide layer containing amorphous chromium oxide on a surface of the substrate during a first vapor deposition process and heating the substrate containing the chromium oxide layer comprising the amorphous chromium oxide to convert at least a portion of the amorphous chromium oxide to crystalline chromium oxide during a first annealing process. The method also includes depositing an aluminum oxide layer containing amorphous aluminum oxide on the chromium oxide layer during a second vapor deposition process and heating the substrate containing the aluminum oxide layer disposed on the chromium oxide layer to convert at least a portion of the amorphous aluminum oxide to crystalline aluminum oxide during a second annealing process.
Method of Preparing Positive Electrode Active Material for Secondary Battery
A method of preparing a positive electrode active material for a secondary battery includes preparing a lithium composite transition metal oxide which includes nickel, cobalt, and manganese and contains 60 mol % or more of the nickel among all metals except lithium, adding a moisture absorbent and the lithium composite transition metal oxide into an atomic layer deposition (ALD) reactor, and adding a coating metal precursor into the atomic layer deposition (ALD) reactor and forming a metal oxide coating layer on surfaces of particles of the lithium composite transition metal oxide by atomic layer deposition (ALD).
Atomic layer etching on microdevices and nanodevices
The present invention relates to the unexpected discovery of novel methods of preparing nanodevices and/or microdevices with predetermined patterns. In one aspect, the methods of the invention allow for engineering structures and films with continuous thickness equal to or less than 50 nm.
Corrosion-resistant permanent magnet and intravascular blood pump comprising the magnet
This invention is directed to a corrosion-resistant permanent magnet, to a method for producing a corrosion-resistant permanent magnet, and to an intravascular blood pump comprising the magnet. The magnet is corrosion resistant due to a composite coating comprising a first layer structure and optionally a second layer structure on the first layer structure, each layer structure comprising an inorganic layer, a linker layer on the inorganic layer, and an organic layer formed from poly(2-chloro-p-xylylene) on the linker layer. The inorganic layers comprise aluminum and/or aluminum oxide.
Laminate and method of producing the same, and gas barrier film and method of producing the same
A laminate that improves barrier properties of an atomic layer deposition film in spite of use of a substrate made of a polymer material, and provides a gas barrier film and a method of producing the same. The laminate includes: a substrate made a polymer material; an undercoat layer disposed on at least part of a surface of the substrate and made up of an inorganic material containing Ta; and an atomic layer deposition film disposed so as to cover a surface of the undercoat layer.