A radiation shield and an assembly and a reactor including the radiation shield are disclosed. The radiation shield can be used to control heat flux from a susceptor heater assembly and thereby enable better control of temperatures across a surface of a substrate placed on a surface of the susceptor heater assembly.

A window member for separating an internal environment of an x-ray device from an environment external to the x-ray device is provided. The window member comprises a substrate and a coating layer disposed upon a surface of the substrate. The substrate is formed from a polycrystalline material and is substantially transparent to low-energy x-rays. The coating layer is non-porous, covers the crystal grains at the surface of the substrate and extends into the grain boundaries therebetween, such that the coating layer forms an impermeable barrier between the substrate and the external environment.

The present disclosure provides a film coating apparatus. In the film coating apparatus, by disposing the position sensor outside the coating chamber to detect the position of the coating carrier through the through hole and the light transmitting window of the sensor detection path, the position sensor may not directly contact the coating carrier, so that the coating carrier may not be damaged by the position sensor, and the position sensor may not be influenced by the extreme environment in the coating chamber. Furthermore, by disposing the protection device in the coating chamber to protect the through hole and the light transmitting window from covering by the coating material, the normal working of the position sensor can be ensured. The film coating apparatus of the present disclosure has simple structure and low cost, and is easy to use.

Apparatuses and methods for cleaning a semiconductor processing chamber is provided. The semiconductor processing chamber may include a UV radiation source, a substrate holder, and a UV transmissive window. The UV transmissive window may include one or multiple panes. One or more panes of the UV transmissive window may be non-reactive with fluorine containing chemistries. In multi-pane windows a purge gas flow path may be formed in the gap between windows. A purge gas may be flowed through the purge gas flow path to prevent process gases used in the chamber interior from reaching one or more panes of the UV transmissive window.

A radiation shield and an assembly and a reactor including the radiation shield are disclosed. The radiation shield can be used to control heat flux from a susceptor heater assembly and thereby enable better control of temperatures across a surface of a substrate placed on a surface of the susceptor heater assembly.

A system for depositing a layer on a substrate includes a processing chamber defining a gas inlet for introducing gas into the processing chamber and a gas outlet to allow the gas to exit the processing chamber. A substrate support is positioned within the processing chamber and is configured to receive a substrate. A transparent upper window includes a convex first face spaced from the substrate support to define an air gap therebetween. The upper window is positioned within the processing chamber to direct the gas from the gas inlet, through the air gap, and to the gas outlet. The first face includes a radially outer surface and a radially inner surface circumscribed within the outer surface. The outer surface has a first radius of curvature and the inner surface has a second radius of curvature that is different from the first radius of curvature.

Embodiments described herein provide a substrate processing apparatus that includes a vacuum chamber comprising a first dome and a second dome, a substrate support disposed inside the vacuum chamber between the first and second domes, a collimated energy source arranged in a compartmented housing and positioned proximate the second dome, wherein the second dome is between the collimated energy source and the substrate support. At least a portion of the second dome and the substrate support may be optically transparent to the collimated energy from the collimated energy source.

A window member for separating an internal environment of an x-ray device from an environment external to the x-ray device is provided. The window member comprises a substrate and a coating layer disposed upon a surface of the substrate. The substrate is formed from a polycrystalline material and is substantially transparent to low-energy x-rays. The coating layer is non-porous, covers the crystal grains at the surface of the substrate and extends into the grain boundaries therebetween, such that the coating layer forms an impermeable barrier between the substrate and the external environment.

A window for a CVD system includes a processing chamber defining a gas inlet introducing gas into the processing chamber and a gas outlet to allow the gas to exit the processing chamber. A substrate support is within the processing chamber and receives a substrate. A transparent upper window includes a convex first face spaced from the substrate support to define an air gap therebetween. The upper window is within the processing chamber to direct the gas from the gas inlet, through the air gap, and to the gas outlet. The first face includes a radially outer surface and a radially inner surface circumscribed within the outer surface. The outer surface has a first radius of curvature and the inner surface has a second radius of curvature that is different from the first radius of curvature.

A processing tool is provided including an exhaust inlet; two or more process chambers surrounding the exhaust inlet, each process chamber including: a chamber body enclosing an interior volume, the chamber body including a plurality of sidewalls that include one or more outer walls and one or more inner walls; one or more substrate supports disposed in the interior volume; a plurality of lamps positioned over each substrate support; a window positioned between the plurality of lamps and the substrate support; and a gas inlet that is located closer to one of the one or more outer walls than the gas inlet is to each of the one or more inner walls.