C23C18/1841

METAL DISPLACEMENT SOLUTION, METHOD FOR SURFACE TREATMENT OF ALUMINUM OR ALUMINUM ALLOY

The present invention aims to provide a metal displacement solution that can provide good adhesion to a plating film (metal film), and a method for surface treatment of aluminum or an aluminum alloy using the metal displacement solution. Included is a metal displacement solution which contains a zinc compound, a nickel compound, a germanium compound, and a fluorine compound.

Method for producing magnetic cores

A method for fabricating magnetic cores, wherein the magnetic cores have at least two materials with different magnetic properties. The materials are selected from a ferrite material, an oxide ceramic material and a superparamagnetic material and are formed alternately in individual regions along the magnetic core.

ANTI-MULTIPACTOR DEVICE

The invention relates to anti-multipactor coating deposited onto a substrate that can be exposed to the air and its procedure of obtainment by simple chemical methods. Furthermore, the present invention relates to its use for the fabrication of high power devices working at high frequencies.

Plating method, plating apparatus and recording medium

A substrate W having a non-plateable material portion 31 and a plateable material portion 32 formed on a surface thereof is prepared, and then, a catalyst is selectively imparted to the plateable material portion 32 by performing a catalyst imparting processing on the substrate W. Thereafter, a plating layer 35 is selectively formed on the plateable material portion 32 by supplying a plating liquid M1 onto the substrate W. The plating liquid M1 contains an inhibitor which suppresses the plating layer 35 from being precipitated on the non-plateable material portion 31.

Composite copper foil

[Problem] An object is to provide novel composite copper foils. [Means to solve the problem] A composite copper foil comprises a copper foil and a layer of metal other than copper, the metal layer being formed on at least a part of a surface of the copper foil, wherein at least a part of the composite copper foil has protrusions on a surface thereof, and each protrusion has a height of 10 nm or more but 1000 nm or less in a cross-section of the composite copper foil.

SOLUTION AND PROCESS FOR THE ACTIVATION OF NONCONDUCTIVE AREA FOR ELECTROLESS PROCESS
20220267906 · 2022-08-25 ·

The present invention discloses a novel activator system for electroless metallization deposition, particularly activators that may be free of tin and surfactants. Activators of the invention are preferably employed for electroless copper deposition.

COMPOSITE COPPER FOIL
20200332431 · 2020-10-22 ·

[Problem] An object is to provide novel composite copper foils. [Means to solve the problem] A composite copper foil comprises a copper foil and a layer of metal other than copper, the metal layer being formed on at least a part of a surface of the copper foil, wherein at least a part of the composite copper foil has protrusions on a surface thereof, and each protrusion has a height of 10 nm or more but 1000 nm or less in a cross-section of the composite copper foil.

ANTI-MULTIPACTOR COATING DEPOSITED ON AN RF OR MW METAL COMPONENT, METHOD FOR FORMING SAME BY LASER SURFACE TEXTURING
20200255948 · 2020-08-13 ·

Anti-multipactor coating deposited on an RF or MW component, by surface texturing of such a coating by laser.

The invention relates to a formation method by laser ablation, on a metal substrate, of an anti-multipactor coating whose constituent material is chosen from amongst the metals of column 10 or column 11 of the Mendeleev table or an alloy of these metals and whose texture comprises one or more patterns of cavities repeated at regular intervals, the interval pitch between two adjacent cavities being in the range between 0 and 100 m.

Anti-multipactor device

The invention relates to anti-multipactor coating deposited onto a substrate that can be exposed to the air and its procedure of obtainment by simple chemical methods. Furthermore, the present invention relates to its use for the fabrication of high power devices working at high frequencies.

METHOD FOR FORMING A METAL FILM, AND NANOIMPRINT LITHOGRAPHY MATERIAL

The present invention is to solve the problem of residues in nanoimprint lithography without losing the merits thereof, i.e., low cost and high productivity, and provides a metal film formation technique advantageous in pattern accuracy and product reliability over time. A metal film formation method according to the present invention comprises a first step where a nanoimprint lithography material is deposited on an insulating substrate to form an underlayer, a second step where the underlayer is pressed with a mold having protrusions to pattern by nanoimprint lithography, a third step where residues of the underlayer at regions pressed with the protrusions of the mold are evaporated by heating to be removed, and forming a metal film at least on the patterned underlayer. A nanoimprint lithography material according to the present invention contains a catalyst for a metal plating.