C23C18/405

Conductive fabric and its preparation and applications

The present invention provides a conductive fabric comprising base cloth and a conductive metallic circuit structure formed on the surface of the base cloth. The conductive metallic circuit structure comprises at least one metallic seed layer and at least one chemical-plating layer. The metallic seed layer is an evaporation-deposition layer or a sputter-deposition layer and has a circuit pattern. The chemical-plating layer is applied over the surface of the metallic seed layer. The conductive fabric has improved conductivity and heat generation efficiency.

Structure with Conductive Pattern and Method for Manufacturing Same
20220408558 · 2022-12-22 · ·

Provided are: a structure with a conductive pattern that can be obtained in a simple manufacturing process and that exhibits favorable interlayer adhesion; and a method for manufacturing same. An embodiment of the present invention provides a structure with a conductive pattern, the structure comprising a base material, and a copper-containing conductive layer arranged on the surface of the base material, wherein when a principal surface of the conductive layer on the side facing the base material is a first principal surface, and a principal surface of the conductive layer on the opposite side from the first principal surface is a second principal surface, the conductive layer: has a porosity of 0.01 to 50 volume percent in a first principal surface-side region that extends from the first principal surface to a depth of 100 nm in the thickness direction of the conductive layer.

ELECTROLESS COPPER COATING PROCESS FOR CHROMIUM METAL POWDERS
20220364239 · 2022-11-17 ·

Disclosed herein are methods for electrolessly coating copper onto a chromium metal powder, the method comprising adding a nickel-coated chromium powder to an aqueous electroless copper plating bath comprising a source of copper cations, a copper-cation complexing agent, a copper-cation reducing agent, and a first base, thereby forming a copper-coated chromium metal powder. Also disclosed are copper-coated chromium metal powders prepared by a disclosed method.

Plated laminate and printed circuit board

Provided is a plating lamination technology for providing a highly adhesive inner layer of a printed circuit board. The plating lamination technology is effective in providing an electroless plated laminate, including a non-etched/low-roughness pretreated laminate or a low-roughness copper foil, and a printed circuit board including the plated laminate.

NOVEL METHODOLOGY FOR COATING NON-CONDUCTING ARTICLES WITH BROAD-SPECTRUM ANTIMICROBIAL ELECTROLESS PLATING LAYERS
20220356582 · 2022-11-10 ·

A method of coating an antimicrobial conductive metal layer on a non-conductive surface of articles with novel chemistry and methods with just a few process steps consisting of contacting the chemistries at room temperature for short durations is disclosed. The methodology is environmentally friendly, non-toxic aqueous bath of different salt compositions for providing uniform anti-microbial metal coating on the articles. The cost-effective methodology can be used on a wide variety of non-conductive surfaces such as glass, fibers, textiles, ceramic, plastic, foam and so on.

SYSTEM AND METHOD FOR DIRECT ELECTROLESS PLATING OF 3D-PRINTABLE GLASS FOR SELECTIVE SURFACE PATTERNING

The present disclosure relates to a method for forming a glass structure having a metallized surface portion. The method may comprise forming a structure using a flowable first material, adapted to form a glass, which includes a metal component. The structure is then treated to remove substantially all solvents and organic components contained in the first flowable material. Finally, the structure is exposed to a bath of a metal salt during which nucleation occurs and a metallized surface coating is formed on at least a portion of an outer surface of the structure.

Circuit Board Traces in Channels using Electroless and Electroplated Depositions

A circuit layer is formed by drilling vias and forming channels in a circuit layer which has catalytic particles exposed on the surfaces, channels, and vias. A first flash electroless deposition is followed by application of dry film, followed by selective laser ablation of the dry film channels and vias. A second electroless solution is applied which provides additional deposition over the first flash electroless deposition but only on the vias and trace channel areas. An electrodeposition follows, using the first deposition as a cathode. The dry film is stripped and the first electroless layer is etched, leaving only depositions in the channels and vias.

METHODS FOR TREATING METAL NANOCRYSTALS AND FOR FORMING BULK NANOSTRUCTURED METAL ALLOYS

Methods of treating metal nanocrystals are provided. In embodiments, such a method comprises exposing metal nanocrystals comprising a metal and characterized by at least one twinning boundary therein, to a plating solution comprising a reducing agent and coating metal cations comprising a different metal, under conditions to form a coating of the different metal on surfaces of the metal nanocrystals via electroless deposition by chemical reduction of the coating metal cations, thereby providing coated metal nanocrystals. Methods of forming bulk nanostructured metal alloys from the coated metal nanocrystals are also provided.

Cleaning solution for cleaning metal surfaces

Cleaning solution for cleaning and/or wetting metal surfaces, comprising at least one acid, a first surfactant, which is an alkyl-poly(ethyleneglycol-co-propyleneglycol)-ether having a cloud point of ≤25° C., a second surfactant, which is selected from the group consisting of i) an alkyl-poly(ethyleneglycol-co-propyleneglycol)-ether having a cloud point of ≥30° C., ii) an alkyl-polyethyleneglycol-ether having a cloud point of ≥45° C.
wherein the cloud points are determined according to European Standard EN 1890:2006, item 8.2 of German Version, with the modification that 10 wt % H.sub.2SO.sub.4 is used as solvent and that the concentration of the surfactant is 1000 mg/L.

POLYMER FILAMENTS COMPRISING A METAL PRECURSOR FOR ADDITIVE MANUFACTURING AND METHODS ASSOCIATED THEREWITH
20230116573 · 2023-04-13 · ·

Additive manufacturing processes, such as fused filament fabrication, may be employed to form printed objects in a range of shapes. It is sometimes desirable to form conductive traces upon the surface of a printed object. Conductive traces and similar features may be introduced in conjunction with fused filament fabrication processes by incorporating a metal precursor in a polymer filament having a filament body comprising a thermoplastic polymer, and forming a printed object from the polymer filament through layer-by-layer deposition, in which the metal precursor remains substantially unconverted to metal while forming the printed object. Suitable polymer filaments compatible with fused filament fabrication may comprise a thermoplastic polymer defining a filament body, and a metal precursor contacting the filament body, in which the metal precursor is activatable to form metal islands upon laser irradiation.