The disclosed and claimed subject matter relates to wet etchants exhibiting high copper and cobalt etching rates where the etching rate ratio between the two metals can be varied. The wet etchants have a composition comprising a formulation consisting of: at least one alkanolamine having at least two carbon atoms, at least one amino substituent and at least one hydroxyl substituent with the amino and hydroxyl substituents attached to two different carbon atoms; at least one pH adjuster for adjusting the pH of the formulation to between approximately 9 and approximately 12; at least one chelating agent; and water.

An aqueous etching composition comprising: (a) functionalized urea, biuret and guanidine derivatives and/or salts thereof selected from compounds having formulae I or II:

##STR00001## wherein X and Y are independently selected from oxygen, NRR′ and NR.sup.5, R, R′ and R.sup.5 are independently selected from R.sup.1, hydrogen, polyethylene glycols, aromatic compounds, and C.sub.1-C.sub.4 alkyl, wherein the aromatic compounds and C.sub.1-C.sub.4 alkyl optionally comprise at least one substituent selected as OR.sup.6, R.sup.6 is selected from hydrogen and C.sub.1-C.sub.4alkyl, X and Y can be identical or different; R.sup.1 and R.sup.2 are independently selected from hydrogen, alkyl compounds, amines, and nitrogen-comprising heteroaromatic compounds, R.sup.1 and R.sup.2 can be identical or different, with the proviso that R.sup.1 cannot be hydrogen, and with the proviso that in compounds having formula I R.sup.1 cannot be hydrogen or alkyl compound if X is oxygen; m is an integer from 1 to 4, and n is an integer from 0 to 8; wherein m and n can be identical or different; (b) an oxidizing agent; and wherein the composition comprises a pH from 7.1 to 14.

An aqueous etching composition comprising: (a) functionalized urea, biuret and guanidine derivatives and/or salts thereof selected from compounds having formulae I or II:

##STR00001## wherein X and Y are independently selected from oxygen, NRR′ and NR.sup.5, R, R′ and R.sup.5 are independently selected from R.sup.1, hydrogen, polyethylene glycols, aromatic compounds, and C.sub.1-C.sub.4 alkyl, wherein the aromatic compounds and C.sub.1-C.sub.4 alkyl optionally comprise at least one substituent selected as OR.sup.6, R.sup.6 is selected from hydrogen and C.sub.1-C.sub.4alkyl, X and Y can be identical or different; R.sup.1 and R.sup.2 are independently selected from hydrogen, alkyl compounds, amines, and nitrogen-comprising heteroaromatic compounds, R.sup.1 and R.sup.2 can be identical or different, with the proviso that R.sup.1 cannot be hydrogen, and with the proviso that in compounds having formula I R.sup.1 cannot be hydrogen or alkyl compound if X is oxygen; m is an integer from 1 to 4, and n is an integer from 0 to 8; wherein m and n can be identical or different; (b) an oxidizing agent; and wherein the composition comprises a pH from 7.1 to 14.

A copper etching solution contains an oxidizing agent and an amine compound. The oxidizing agent is one or more selected from the group consisting of a perchlorate, a chlorate, a chlorite, a hypochlorite, hydrogen peroxide, and a perborate, and the amine compound has one or more primary amino groups or secondary amino groups.

The present invention relates to an eco-friendly and simple super-hydrophobic coating method that does not use harmful substances and special equipment. Coating according to the present invention may be performed as a single process without special equipment, and because only eco-friendly materials are used, the coating material may be easily used and discarded. In addition, even a three-dimensional pipe or a heat-exchanger having a complex shape may be modified to have super-hydrophobicity by applying the present coating, and a super-hydrophobic metal filter may be manufactured and used for oil-water separation. As a result, the present coating method is eco-friendly, simple, and applicable to various substrates, so it has great potential for application in various industries.

The present invention relates to an eco-friendly and simple super-hydrophobic coating method that does not use harmful substances and special equipment. Coating according to the present invention may be performed as a single process without special equipment, and because only eco-friendly materials are used, the coating material may be easily used and discarded. In addition, even a three-dimensional pipe or a heat-exchanger having a complex shape may be modified to have super-hydrophobicity by applying the present coating, and a super-hydrophobic metal filter may be manufactured and used for oil-water separation. As a result, the present coating method is eco-friendly, simple, and applicable to various substrates, so it has great potential for application in various industries.

The present disclosure provides a new wet atomic layer etch (ALE) process for etching copper. More specifically, the present disclosure provides various embodiments of methods that utilize new etch chemistries for etching copper in a wet ALE process. By utilizing the new etch chemistries disclosed herein within a wet ALE process, the present disclosure provides a highly selective etch of copper with monolayer precision.

Crystal plane orientation enrichment compounds are applied to copper to modify copper grain orientation distribution to the favorable crystal plain orientation to enhance copper electroplating. Electroplating copper on the modified copper enables faster and selective electroplating.

A method of modifying surfaces of diamond particles comprises forming spinodal alloy coatings over discrete diamond particles, thermally treating the spinodal alloy coatings to form modified coatings each independently exhibiting a reactive metal phase and a substantially non-reactive metal phase, and etching surfaces of the discrete diamond particles with at least one reactive metal of the reactive metal phase of the modified coatings. Diamond particles and earth-boring tools are also described.

The invention discloses an etching chelating agent, a manufacturing method thereof, and an etching solution composition. The etching chelating agent includes cellulose cross-linked polymer, and the cellulose cross-linked polymer is obtained by cross-linking and polymerizing carboxymethyl cellulose and an amine compound.