A system for and method of removing residues, deposits, and debris from a substrate that has been marked by a chemical etching process is disclosed. The system includes one or more upper sprayers that deposit a cleaning solution to a top surface of the product as it passes beneath the one or more upper sprayers. The system further includes at least one upper brush that operates to scrub the top surface of the product after the cleaning solution has been applied thereto. The system optionally includes one or more lower sprayers and lower brushes to clean a bottom surface of the product as it is conveyed through the system. The system further includes an air knife system that assists with drying the product prior to exiting the system. The system further includes a controller that is operable to adjust various system parameters.

Disclosed are a Co.sub.3O.sub.4 nanosheet loaded stainless steel mesh, a preparation method and an application thereof. The method includes: S1, depositing a cobalt hydroxide nanosheet array on a surface of a stainless steel mesh by an electrochemical deposition method, and obtaining the stainless steel mesh deposited with the cobalt hydroxide nanosheet array; and S2, obtaining the Co.sub.3O.sub.4 nanosheet loaded stainless steel mesh by calcining the stainless steel mesh deposited with the cobalt hydroxide nanosheet array.

Disclosed are a Co.sub.3O.sub.4 nanosheet loaded stainless steel mesh, a preparation method and an application thereof. The method includes: S1, depositing a cobalt hydroxide nanosheet array on a surface of a stainless steel mesh by an electrochemical deposition method, and obtaining the stainless steel mesh deposited with the cobalt hydroxide nanosheet array; and S2, obtaining the Co.sub.3O.sub.4 nanosheet loaded stainless steel mesh by calcining the stainless steel mesh deposited with the cobalt hydroxide nanosheet array.

The present invention relates to wash oil for use as an antifouling agent in gas compressors, in particular in cracked gas compressors, including at least one compound according to formulae (II)

##STR00001##

with the moieties R.sup.2 and R.sup.3 are selected from a group of linear or branched C.sub.1-C.sub.20-alkyl, C.sub.3-C.sub.10-cycloalkyl and linear or branched C.sub.1-C.sub.10-alkyl substituted C.sub.3-C.sub.10-cycloalkyl and C.sub.6-C.sub.12 aryl and C.sub.1-C.sub.10-alkyl substituted C.sub.6-C.sub.12 aryl. The moieties can be interrupted by oxygen or nitrogen. The moieties can be functionalised with hydroxyl groups or amino groups. The moieties can be the same or different. The invention relates also to the use of such wash oil as anti-fouling agent.

The present invention relates to wash oil for use as an antifouling agent in gas compressors, in particular in cracked gas compressors, including at least one compound according to formulae (II)

##STR00001##

with the moieties R.sup.2 and R.sup.3 are selected from a group of linear or branched C.sub.1-C.sub.20-alkyl, C.sub.3-C.sub.10-cycloalkyl and linear or branched C.sub.1-C.sub.10-alkyl substituted C.sub.3-C.sub.10-cycloalkyl and C.sub.6-C.sub.12 aryl and C.sub.1-C.sub.10-alkyl substituted C.sub.6-C.sub.12 aryl. The moieties can be interrupted by oxygen or nitrogen. The moieties can be functionalised with hydroxyl groups or amino groups. The moieties can be the same or different. The invention relates also to the use of such wash oil as anti-fouling agent.

A system for and method of removing residues, deposits, and debris from a substrate that has been marked by a chemical etching process is disclosed. The system includes one or more upper sprayers that deposit a cleaning solution to a top surface of the product as it passes beneath the one or more upper sprayers. The system further includes at least one upper brush that operates to scrub the top surface of the product after the cleaning solution has been applied thereto. The system optionally includes one or more lower sprayers and lower brushes to clean a bottom surface of the product as it is conveyed through the system. The system further includes an air knife system that assists with drying the product prior to exiting the system. The system further includes a controller that is operable to adjust various system parameters.

A system for and method of removing residues, deposits, and debris from a substrate that has been marked by a chemical etching process is disclosed. The system includes one or more upper sprayers that deposit a cleaning solution to a top surface of the product as it passes beneath the one or more upper sprayers. The system further includes at least one upper brush that operates to scrub the top surface of the product after the cleaning solution has been applied thereto. The system optionally includes one or more lower sprayers and lower brushes to clean a bottom surface of the product as it is conveyed through the system. The system further includes an air knife system that assists with drying the product prior to exiting the system. The system further includes a controller that is operable to adjust various system parameters.

A method of treating an apparatus to remove surface deposits therefrom is performed by selecting a colloidal particle dispersion having inorganic nanoparticles with an average particle size of from 500 nm or less that exhibit properties of Brownian motion that facilitate penetration of solid deposits on surfaces of an apparatus that is subject to surface deposits from contact with fluids. The surfaces of the apparatus are contacted with a treatment composition comprising the colloidal particle dispersion. The composition is allowed to act upon the materials adhering to the surfaces of the apparatus to loosen and breakup the materials adhering to the surfaces of the apparatus. The loosened and broken materials are removed from the surfaces of the apparatus.

The present invention relates to a cleaning apparatus (100) for metal smallware, comprising: a washing chamber (1) apt to receive a solvent and at least one batch of metal smallware soiled with lubricant and configured to carry out a washing cycle to remove at least part of said lubricant from said batch of metal smallware soiled with lubricant by means of said solvent and; suction means (2) connected to said washing chamber (1) and configured to carry out a discharge cycle by sucking said gaseous mixture comprising air and solvent from said washing chamber (1); a main absorption column (4) having a first side (41) and a second side (42) opposite each other, and wherein said first side (41) is hydraulically connected to said suction means (2) so as to receive said gaseous mixture comprising air and solvent and said second side (42) is hydraulically connected to a supply duct (3) so as to receive an absorption liquid from the latter.

In particular, the main absorption column (4) is configured to cause an interaction between a gaseous mixture supplied by said suction means (2) and an absorption liquid supplied by said supply duct (3) so as to perform chemical absorption of a solvent present in said gaseous mixture comprising air and solvent, in said absorption liquid, and therefore reduce the concentration of solvent in the gaseous mixture comprising air and solvent.

A system for and method of removing residues, deposits, and debris from a substrate that has been marked by a chemical etching process is disclosed. The system includes one or more upper sprayers that deposit a cleaning solution to a top surface of the product as it passes beneath the one or more upper sprayers. The system further includes at least one upper brush that operates to scrub the top surface of the product after the cleaning solution has been applied thereto. The system optionally includes one or more lower sprayers and lower brushes to clean a bottom surface of the product as it is conveyed through the system. The system further includes an air knife system that assists with drying the product prior to exiting the system. The system further includes a controller that is operable to adjust various system parameters.