The invention relates to a method and a device for rapidly cooling a metal strip and removing residues present on the strip after this cooling, wherein the residues are formed during a cooling of said metal strip by a non-oxidizing liquid solution for the metal strip and a stripping liquid solution for the oxides present on the surface of the strip, or by a mixture of this liquid solution and a gas.

A system for and method of removing residues, deposits, and debris from a substrate that has been marked by a chemical etching process is disclosed. The system includes one or more upper sprayers that deposit a cleaning solution to a top surface of the product as it passes beneath the one or more upper sprayers. The system further includes at least one upper brush that operates to scrub the top surface of the product after the cleaning solution has been applied thereto. The system optionally includes one or more lower sprayers and lower brushes to clean a bottom surface of the product as it is conveyed through the system. The system further includes an air knife system that assists with drying the product prior to exiting the system. The system further includes a controller that is operable to adjust various system parameters.

The present invention addresses the problem of providing a flame treatment device which is capable of performing a flame treatment on a metal-based base material without requiring a preheat treatment. For the purpose of solving the above-described problem, a flame treatment device according to the present invention comprises: a first temperature measurement unit which measures the temperature of a metal-based base material before a flame treatment; a control unit which determines the combustion energy of flame on the basis of the temperature before a flame treatment, said temperature having been measured by the first temperature measurement unit, so that the surface temperature of the metal-based base material during the flame treatment is 56° C. or higher; and a flame treatment unit which performs a flame treatment on the metal-based base material on the basis of the combustion energy, which has been determined by the control unit.

The present invention addresses the problem of providing a flame treatment device which is capable of performing a flame treatment on a metal-based base material without requiring a preheat treatment. For the purpose of solving the above-described problem, a flame treatment device according to the present invention comprises: a first temperature measurement unit which measures the temperature of a metal-based base material before a flame treatment; a control unit which determines the combustion energy of flame on the basis of the temperature before a flame treatment, said temperature having been measured by the first temperature measurement unit, so that the surface temperature of the metal-based base material during the flame treatment is 56° C. or higher; and a flame treatment unit which performs a flame treatment on the metal-based base material on the basis of the combustion energy, which has been determined by the control unit.

The present disclosure provides a degreasing apparatus which may be made at least partially, or substantially, of at least one plastic material, for use with solvents having relatively low boiling points that are chemically compatible with plastic materials, such as 1233zd (1-chloro-3,3,3-trifluoro-propene, CF.sub.3CH═CHCl). Plastic degreasing apparatuses may comprise a tank comprising a side wall and a bottom wall, a partition coupled to a lower portion of the tank, dividing the tank into an immersion sump and a vaporizing sump, a heating element located within the vaporizing sump, and a condensing element positioned above the lower portion, wherein at least one of the side wall, the bottom wall, and the partition is made of a plastic material.

A system for and method of removing residues, deposits, and debris from a substrate that has been marked by a chemical etching process is disclosed. The system includes one or more upper sprayers that deposit a cleaning solution to a top surface of the product as it passes beneath the one or more upper sprayers. The system further includes at least one upper brush that operates to scrub the top surface of the product after the cleaning solution has been applied thereto. The system optionally includes one or more lower sprayers and lower brushes to clean a bottom surface of the product as it is conveyed through the system. The system further includes an air knife system that assists with drying the product prior to exiting the system. The system further includes a controller that is operable to adjust various system parameters.

A system for and method of removing residues, deposits, and debris from a substrate that has been marked by a chemical etching process is disclosed. The system includes one or more upper sprayers that deposit a cleaning solution to a top surface of the product as it passes beneath the one or more upper sprayers. The system further includes at least one upper brush that operates to scrub the top surface of the product after the cleaning solution has been applied thereto. The system optionally includes one or more lower sprayers and lower brushes to clean a bottom surface of the product as it is conveyed through the system. The system further includes an air knife system that assists with drying the product prior to exiting the system. The system further includes a controller that is operable to adjust various system parameters.

The present invention relates to a cleaning apparatus (100) for metal smallware, comprising: a washing chamber (1) apt to receive a solvent and at least one batch of metal smallware soiled with lubricant and configured to carry out a washing cycle to remove at least part of said lubricant from said batch of metal smallware soiled with lubricant by means of said solvent and; suction means (2) connected to said washing chamber (1) and configured to carry out a discharge cycle by sucking said gaseous mixture comprising air and solvent from said washing chamber (1); a main absorption column (4) having a first side (41) and a second side (42) opposite each other, and wherein said first side (41) is hydraulically connected to said suction means (2) so as to receive said gaseous mixture comprising air and solvent and said second side (42) is hydraulically connected to a supply duct (3) so as to receive an absorption liquid from the latter.

In particular, the main absorption column (4) is configured to cause an interaction between a gaseous mixture supplied by said suction means (2) and an absorption liquid supplied by said supply duct (3) so as to perform chemical absorption of a solvent present in said gaseous mixture comprising air and solvent, in said absorption liquid, and therefore reduce the concentration of solvent in the gaseous mixture comprising air and solvent.

The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a process chamber that provides a treatment space, in which a substrate is treated, in an interior thereof, a fluid supply unit that supplies a fluid into the process chamber, and an exhaust units including an exhaust line, through which the fluid in the process chamber is exhausted, the fluid supply unit includes a supply tank, in which the fluid is stored, a supply line connecting the supply tank and the process chamber, a branch line branched from the supply line at a first point of the supply line, and a controller that controls the fluid supply unit, and the controller controls the fluid supply unit such that the fluid is drained from the supply line through the branch line shortly before the fluid is supplied into the process chamber.

The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a process chamber that provides a treatment space, in which a substrate is treated, in an interior thereof, a fluid supply unit that supplies a fluid into the process chamber, and an exhaust units including an exhaust line, through which the fluid in the process chamber is exhausted, the fluid supply unit includes a supply tank, in which the fluid is stored, a supply line connecting the supply tank and the process chamber, a branch line branched from the supply line at a first point of the supply line, and a controller that controls the fluid supply unit, and the controller controls the fluid supply unit such that the fluid is drained from the supply line through the branch line shortly before the fluid is supplied into the process chamber.