Patent classifications
C25D11/06
Anodized aluminum film
Provided is an anodized aluminum film formed on a surface of a substrate that comprises aluminum or an aluminum alloy, the anodized aluminum film having a structure constituted of a single anodized film layer or a structure composed of superposed anodized film layers of two or more different kinds, wherein the outermost anodized film has a degree of film formation, defined by equation (1), of 1.3 or more and the proportion of the thickness of this anodized film in the entire film thickness is 3% or higher. Thus, the anodized aluminum film is inhibited from cracking in bent portions. As a result, the substrate is inhibited from corroding in corrosive-gas atmospheres, and a decrease in withstand voltage characteristics due to film cracking is inhibited. With this anodized aluminum film, enhanced withstand voltage characteristics can hence be attained:
Degree of film formation=(thickness of anodized film)/(substrate thickness loss by anodization) (1).
Electrolytic solution and method for surface treatment of aluminum alloys for casting
A method for surface treatment of aluminum alloys for forms an oxidation film in the aluminum alloys for casting by adding a metallic anion compound to an electrolytic solution. The method can prevent cracks from occurring on a surface of the aluminum alloys for casting at the time of applying an anodizing method.
Electrolytic solution and method for surface treatment of aluminum alloys for casting
A method for surface treatment of aluminum alloys for forms an oxidation film in the aluminum alloys for casting by adding a metallic anion compound to an electrolytic solution. The method can prevent cracks from occurring on a surface of the aluminum alloys for casting at the time of applying an anodizing method.
Method of preparing corrosion resistant coatings
A method for preparing thin double-structured composite corrosion resistant and/or passivating coatings that consist of a thin metal oxide-hydroxide subcoating prepared by anodizing the metal substrate materials near-surface part and then provided with an atomic layer deposition (ALD) topmost nanocoating, of e.g. oxide, nitride, carbonate, carbide etc. or their mixes or laminates, or laminates with ceramic and metallic layers, or laminates with inorganic or organic polymers and ceramic layers.
Method of preparing corrosion resistant coatings
A method for preparing thin double-structured composite corrosion resistant and/or passivating coatings that consist of a thin metal oxide-hydroxide subcoating prepared by anodizing the metal substrate materials near-surface part and then provided with an atomic layer deposition (ALD) topmost nanocoating, of e.g. oxide, nitride, carbonate, carbide etc. or their mixes or laminates, or laminates with ceramic and metallic layers, or laminates with inorganic or organic polymers and ceramic layers.
SURFACE COLOR TREATMENT OF ALLOYS WITH MICRO-ARC OXIDATION PROCESS
Example embodiments include methods of treating a surface of an aluminum (Al) alloy or magnesium (Mg) with an electrolyte to obtain a surface with a coloration that is uniformly enhanced. Example embodiments also include surface-treated Al alloy or Mg alloy made by the example methods.
SURFACE COLOR TREATMENT OF ALLOYS WITH MICRO-ARC OXIDATION PROCESS
Example embodiments include methods of treating a surface of an aluminum (Al) alloy or magnesium (Mg) with an electrolyte to obtain a surface with a coloration that is uniformly enhanced. Example embodiments also include surface-treated Al alloy or Mg alloy made by the example methods.
ELECTROLYTE COMPOSITION AND METHOD OF USE THEREOF
Provided herein is an electrolyte composition including a metal silicate or a metal aluminate, a metal phosphate, zinc oxide particles, and a complexing agent useful for plasma electrolytic oxidation treatment of a surface of a metal substrate.
ELECTROLYTE COMPOSITION AND METHOD OF USE THEREOF
Provided herein is an electrolyte composition including a metal silicate or a metal aluminate, a metal phosphate, zinc oxide particles, and a complexing agent useful for plasma electrolytic oxidation treatment of a surface of a metal substrate.
Method of anodising a surface of a semiconductor device
The present disclosure provides a method of anodizing a surface of a semiconductor device comprising a p-n junction. The method comprises exposing a first surface portion of the semiconductor device to an electrolytic solution that is suitable for anodizing the first surface portion when an electrical current is directed through a region at the first surface portion. Further, the method comprises exposing a portion of the semiconductor device to electromagnetic radiation in a manner such that the electromagnetic radiation induces the electrical current and the first surface portion anodizes.