C25D21/16

ALKALINE ELECTROLYTE REGENERATION

Methods and systems for electrolyte regeneration are provided, which regenerate a spent alkaline electrolyte (SE) comprising dissolved aluminum hydrates from an aluminum-air battery, by electrolysis, to precipitate aluminum tri-hydroxide (ATH) and form regenerated alkaline electrolyte, and adding a same-cation salt to an anolyte used in the electrolysis to supplant a corresponding electrolyte cation. The regeneration may be carried out continuously and further comprise mixing the SE and the same-cation salt in a salt tank configured to deliver the anolyte, removing the regenerated alkaline electrolyte from a catholyte tank configured to deliver the catholyte, and filtering the ATH from a solution delivered from the salt tank to the anolyte. Optionally, the salt may be a buffering salt, and in some cases chemical reactions may be used to enhance the regeneration by electrolysis.

Powder supply apparatus and plating system
11359304 · 2022-06-14 · ·

There is provided a powder supply apparatus that prevents powder from scattering as much as possible. There is provided the powder supply apparatus that supplies a powder containing a metal used for a plating to a plating solution. This powder supply apparatus includes a plating solution tank, a feed pipe, a gas supply line, and a spiral-air-flow-generating component. The plating solution tank is configured to house the plating solution. The feed pipe is configured to feed the powder into the plating solution tank. The gas supply line is configured to supply a gas. The spiral-air-flow-generating component is configured to receive the gas from the gas supply line to generate a spiral air flow heading toward the plating solution tank inside the feed pipe.

Powder supply apparatus and plating system
11359304 · 2022-06-14 · ·

There is provided a powder supply apparatus that prevents powder from scattering as much as possible. There is provided the powder supply apparatus that supplies a powder containing a metal used for a plating to a plating solution. This powder supply apparatus includes a plating solution tank, a feed pipe, a gas supply line, and a spiral-air-flow-generating component. The plating solution tank is configured to house the plating solution. The feed pipe is configured to feed the powder into the plating solution tank. The gas supply line is configured to supply a gas. The spiral-air-flow-generating component is configured to receive the gas from the gas supply line to generate a spiral air flow heading toward the plating solution tank inside the feed pipe.

SUBSTRATE PLATING APPARATUS INCLUDING HYBRID PADDLE THAT SIMULTANEOUSLY CIRCULATES AND STIRS PLATING SOLUTION AND REMOVES AIR BUBBLES
20220170161 · 2022-06-02 ·

Provided is a substrate plating apparatus capable of simultaneously circulating and stirring a plating solution and removing air bubbles. The plating apparatus includes a hybrid paddle disposed in front of a substrate in a plating bath to stir the plating solution. Here, the hybrid paddle includes a spray assembly for spraying the plating solution toward the substrate and a suction assembly for suctioning air bubbles formed on the substrate during plating, and the spray assembly and the suction assembly are coupled into one body and perform a reciprocating movement along a surface of the substrate to stir the plating solution.

SUBSTRATE PLATING APPARATUS INCLUDING HYBRID PADDLE THAT SIMULTANEOUSLY CIRCULATES AND STIRS PLATING SOLUTION AND REMOVES AIR BUBBLES
20220170161 · 2022-06-02 ·

Provided is a substrate plating apparatus capable of simultaneously circulating and stirring a plating solution and removing air bubbles. The plating apparatus includes a hybrid paddle disposed in front of a substrate in a plating bath to stir the plating solution. Here, the hybrid paddle includes a spray assembly for spraying the plating solution toward the substrate and a suction assembly for suctioning air bubbles formed on the substrate during plating, and the spray assembly and the suction assembly are coupled into one body and perform a reciprocating movement along a surface of the substrate to stir the plating solution.

POWDER SUPPLY APPARATUS AND PLATING SYSTEM
20220243356 · 2022-08-04 ·

There is provided a powder supply apparatus that prevents powder from scattering as much as possible. There is provided the powder supply apparatus that supplies a powder containing a metal used for a plating to a plating solution. This powder supply apparatus includes a plating solution tank, a feed pipe, a gas supply line, and a spiral-air-flow-generating component. The plating solution tank is configured to house the plating solution. The feed pipe is configured to feed the powder into the plating solution tank. The gas supply line is configured to supply a gas. The spiral-air-flow-generating component is configured to receive the gas from the gas supply line to generate a spiral air flow heading toward the plating solution tank inside the feed pipe.

POWDER SUPPLY APPARATUS AND PLATING SYSTEM
20220243356 · 2022-08-04 ·

There is provided a powder supply apparatus that prevents powder from scattering as much as possible. There is provided the powder supply apparatus that supplies a powder containing a metal used for a plating to a plating solution. This powder supply apparatus includes a plating solution tank, a feed pipe, a gas supply line, and a spiral-air-flow-generating component. The plating solution tank is configured to house the plating solution. The feed pipe is configured to feed the powder into the plating solution tank. The gas supply line is configured to supply a gas. The spiral-air-flow-generating component is configured to receive the gas from the gas supply line to generate a spiral air flow heading toward the plating solution tank inside the feed pipe.

ELECTROLYTIC COPPER FOIL OF HIGH STRENGTH, ELECTRODE COMPRISING THE SAME, SECONDARY BATTERY COMPRISING THE SAME, AND METHOD OF MANUFACTURING THE SAME
20220098746 · 2022-03-31 ·

Disclosed herein is an electrolytic copper foil including a copper layer, wherein the copper layer includes a (220) surface, and an orientation index M(220) of the (220) surface is one or more.

METHOD FOR REPRODUCING PLATING SOLUTION

A plating solution containing a leveler is brought into contact with silica particles with an average particle diameter of 500 μm or less to remove impurities from the plating solution.

METHOD FOR REPRODUCING PLATING SOLUTION

A plating solution containing a leveler is brought into contact with silica particles with an average particle diameter of 500 μm or less to remove impurities from the plating solution.