A dental instrument comprising a shaft and a working part adjoined thereto, with the working part having a coating in which abrasive bodies are embedded, is proposed. Firstly, the average proportion of the surface of the abrasive bodies which is covered by the coating can be at least 60%, preferably at least 65%, most preferably at least 70%. Secondly, the coating can, moreover, also consist of a nickel alloy which additionally contains at least one element selected from the group consisting of titanium, vanadium, niobium, chromium, molybdenum, tungsten, manganese, iron and cobalt. In addition, a process for coating a working part, in particular for producing a dental instrument of this type, and also the use of such a dental instrument for cutting machining of solid bodies are proposed.

A dental instrument comprising a shaft and a working part adjoined thereto, with the working part having a coating in which abrasive bodies are embedded, is proposed. Firstly, the average proportion of the surface of the abrasive bodies which is covered by the coating can be at least 60%, preferably at least 65%, most preferably at least 70%. Secondly, the coating can, moreover, also consist of a nickel alloy which additionally contains at least one element selected from the group consisting of titanium, vanadium, niobium, chromium, molybdenum, tungsten, manganese, iron and cobalt. In addition, a process for coating a working part, in particular for producing a dental instrument of this type, and also the use of such a dental instrument for cutting machining of solid bodies are proposed.

A method of controlling chemical concentration in electrolyte includes measuring a chemical concentration in an electrolyte, wherein the electrolyte is contained in a tank; and increasing a vapor flux through an exhaust pipe connected to the tank when the measured chemical concentration is lower than a control lower limit value.

A method of controlling chemical concentration in electrolyte includes measuring a chemical concentration in an electrolyte, wherein the electrolyte is contained in a tank; and increasing a vapor flux through an exhaust pipe connected to the tank when the measured chemical concentration is lower than a control lower limit value.

A method of electroplating a target electrode comprises establishing a first electric current through an electrolytic solution, comprising a quantity of an electrically charged material, an initial electrode, and a transitional electrode, so that a quantity of the electrically charged material is converted to a quantity of an electrically neutral material, which is electroplated, as a deposit, onto the transitional electrode; and establishing a second electric current through the electrolytic solution, the transitional electrode, and the target electrode so that a quantity of the electrically neutral material from the deposit is converted to a quantity of the electrically charged material, which is dissolved into the electrolytic solution, and a quantity of the electrically charged material in the electrolytic solution is converted to a quantity of the electrically neutral material, which is electroplated onto the surface of the target electrode.

The disclosure relates to the field of metal ion capture, more particularly of selective capture of nickel Ni(II) ions, by a polymeric compound based on a polymer selected from styrenic polymers and chloropolymers. In the polymeric compound, at least one portion of the monomer units of the polymer is functionalised by the ligand, the ligand including at least one chemical group selected from the glyoxime groups.

The glyoxime groups have a strong affinity for the Ni(II) ions, as well as an excellent selectivity vis-à-vis metal ions of chemical properties similar to Ni(II) ions. This ligand thus allows a selective complexation of the Ni(II) ions by the polymeric compound, including in solutions of low concentrations of Ni(II) ions.

The polymeric compound according to at least one embodiment of the disclosure is particularly intended for capturing the Ni(II) ions during the electrogalvanising methods as well as for recycling material comprising nickel.

Electroplating systems may include an electroplating chamber. The systems may also include a replenish assembly fluidly coupled with the electroplating chamber. The replenish assembly may include a first compartment housing anode material. The first compartment may include a first compartment section in which the anode material is housed and a second compartment section separated from the first compartment section by a divider. The replenish assembly may include a second compartment fluidly coupled with the electroplating chamber and electrically coupled with the first compartment. The replenish assembly may also include a third compartment electrically coupled with the second compartment, the third compartment including an inert cathode.

Electroplating systems may include an electroplating chamber. The systems may also include a replenish assembly fluidly coupled with the electroplating chamber. The replenish assembly may include a first compartment housing anode material. The first compartment may include a first compartment section in which the anode material is housed and a second compartment section separated from the first compartment section by a divider. The replenish assembly may include a second compartment fluidly coupled with the electroplating chamber and electrically coupled with the first compartment. The replenish assembly may also include a third compartment electrically coupled with the second compartment, the third compartment including an inert cathode.

Method for reducing concentration of iron ions in a trivalent chromium electroplating bath, including: (i) providing the trivalent chromium electroplating bath including trivalent chromium ions, and iron ions, (ii) subjecting at least a portion of the bath to air agitation, to obtain an air-agitated portion of the bath, (iii) contacting the air-agitated portion with an ion exchange resin, to obtain a resin-treated portion of the bath, and (iv) returning the resin-treated portion of the bath to the trivalent chromium electroplating bath,
provided that the bath provided in step (i) was or is utilized for electrodepositing chromium on a substrate applying a cathodic current density of 18 A/dm.sup.2 or more, after step (iii), iron ions in the resin-treated portion have a lower concentration than in the air-agitated portion, and after step (iv), iron ions in the bath have a concentration below 50 mg/L.

Provided are a measurement method, an electrochemical measuring cell, and a measuring device which are capable of directly and continuously measuring the concentration of monovalent copper ions (Cu.sup.+), 3-mercaptopropyl sulfonate (MPS), or Cu.sup.+-MPS, which is a plating additive breakdown product, in a plating solution during a copper plating process.