C30B7/10

GaN single crystal and method for manufacturing GaN single crystal

A GaN single crystal having a gallium polar surface which is a main surface on one side and a nitrogen polar surface which is a main surface on the opposite side, wherein on the gallium polar surface is found at least one square area, an outer periphery of which is constituted by four sides of 2 mm or more in length, and, when the at least one square area is divided into a plurality of sub-areas each of which is a 100 μm×100 μm square, pit-free areas account for 80% or more of the plurality of sub-areas.

GaN single crystal and method for manufacturing GaN single crystal

A GaN single crystal having a gallium polar surface which is a main surface on one side and a nitrogen polar surface which is a main surface on the opposite side, wherein on the gallium polar surface is found at least one square area, an outer periphery of which is constituted by four sides of 2 mm or more in length, and, when the at least one square area is divided into a plurality of sub-areas each of which is a 100 μm×100 μm square, pit-free areas account for 80% or more of the plurality of sub-areas.

SUBSTRATE-FREE 2D TELLURENE
20230002228 · 2023-01-05 · ·

The present disclosure generally relates to compositions comprising substrate-free 2D tellurene crystals, and the method of making and using the substrate-free 2D tellurene crystals. The 2D tellurene crystals of the present disclosure are characterized by an X-ray diffraction pattern (CuKα radiation, λ=1.54056 A) comprising a peak at 23.79 (2θ±0.1°) and optionally one or more peaks selected from the group consisting of 41.26, 47.79, 50.41, and 64.43 (2θ±0.1°).

SUBSTRATE-FREE 2D TELLURENE
20230002228 · 2023-01-05 · ·

The present disclosure generally relates to compositions comprising substrate-free 2D tellurene crystals, and the method of making and using the substrate-free 2D tellurene crystals. The 2D tellurene crystals of the present disclosure are characterized by an X-ray diffraction pattern (CuKα radiation, λ=1.54056 A) comprising a peak at 23.79 (2θ±0.1°) and optionally one or more peaks selected from the group consisting of 41.26, 47.79, 50.41, and 64.43 (2θ±0.1°).

Preparation method of coating material, coating material, catalyst and three-way catalytic converter
11566340 · 2023-01-31 · ·

Provided is a preparation method of a coating material. The method includes: using an aluminum salt and a silicon source as precursors; and performing hydrothermal crystallization and calcination treatments successively under an action of a template agent to obtain the coating material, wherein the template agent is used to cause the coating material to form a porous spherical structure. In the embodiments of the present disclosure, the preparation process of the coating material is simple and the cost is low, and the specific surface area of the prepared coating material is large.

Preparation method of coating material, coating material, catalyst and three-way catalytic converter
11566340 · 2023-01-31 · ·

Provided is a preparation method of a coating material. The method includes: using an aluminum salt and a silicon source as precursors; and performing hydrothermal crystallization and calcination treatments successively under an action of a template agent to obtain the coating material, wherein the template agent is used to cause the coating material to form a porous spherical structure. In the embodiments of the present disclosure, the preparation process of the coating material is simple and the cost is low, and the specific surface area of the prepared coating material is large.

Group III nitride substrate, method of making, and method of use

Embodiments of the present disclosure include techniques related to techniques for processing materials for manufacture of group-III metal nitride and gallium based substrates. More specifically, embodiments of the disclosure include techniques for growing large area substrates using a combination of processing techniques. Merely by way of example, the disclosure can be applied to growing crystals of GaN, AlN, InN, InGaN, AlGaN, and AlInGaN, and others for manufacture of bulk or patterned substrates. Such bulk or patterned substrates can be used for a variety of applications including optoelectronic and electronic devices, lasers, light emitting diodes, solar cells, photo electrochemical water splitting and hydrogen generation, photodetectors, integrated circuits, and transistors, and others.

Hydrothermal generation of single crystalline molybdenum disulfide

Disclosed is a method for synthesizing single crystalline molybdenum disulfide via a hydrothermal process that minimizes or eliminates carbon byproducts. The method involves providing two components, including a source of molybdenum and a mineralizer solution, to an inert reaction vessel, heating one zone sufficiently to dissolve the source of molybdenum in the mineralizer solution, and heating a second zone to a lower temperature to allow thermal transport to drive the dissolved material to the second zone, and then precipitate MoS.sub.2 on a seed crystal.

Hydrothermal generation of single crystalline molybdenum disulfide

Disclosed is a method for synthesizing single crystalline molybdenum disulfide via a hydrothermal process that minimizes or eliminates carbon byproducts. The method involves providing two components, including a source of molybdenum and a mineralizer solution, to an inert reaction vessel, heating one zone sufficiently to dissolve the source of molybdenum in the mineralizer solution, and heating a second zone to a lower temperature to allow thermal transport to drive the dissolved material to the second zone, and then precipitate MoS.sub.2 on a seed crystal.

Apparatuses and methods for actuation of optical elements

An apparatus having an asymmetric adjustable lens with a deformable optical element. The apparatus may also include one or more actuators coupled to a deformable element of the asymmetric adjustable lens in a direct-drive configuration such that (1) mechanical action of the one or more actuators applies force to the deformable optical element and (2) the force applied by the mechanical action of the one or more actuators changes an optical property of the asymmetric adjustable lens by deforming the deformable optical element. Various other devices, systems, and methods are also disclosed.