A heat-treating furnace has: a rotary shaft; a rotary bottom surface pivotally supported by the rotary shaft and rotates; a plurality of workpiece storage chambers arranged on the rotary bottom surface in a multi-stage torus configuration around an axis of the rotary shaft as a center; a hollow bell-shaped hot-blast guide disposed in a center of the torus configuration on the rotary bottom surface around the axis of the rotary shaft as a center so as to decrease a volumetric capacity in the furnace and to adjust a quantity of a hot blast fed in from above itself into the workpiece storage chamber on each stage; a furnace body bottom surface spaced away from the rotary bottom surface; and a furnace body lateral surface disposed on the furnace body bottom surface.

A vertical batch furnace assembly for processing wafers comprising a cassette handling space, a wafer handling space, and an internal wall separating the cassette handling space and the wafer handling space. The cassette handling space is provided with a cassette storage configured to store a plurality of wafer cassettes provided with a plurality of wafers. The cassette handling space is also provided with a cassette handler configured to transfer wafer cassettes between the cassette storage and a wafer transfer position. The wafer handling space is provided with a wafer handler configured to transfer wafers between a wafer cassette in the wafer transfer position and a wafer boat in a wafer boat transfer position. The internal wall is provided with a wafer transfer opening adjacent the wafer transfer position for a wafer cassette from or to which wafers are to be transferred. The cassette storage comprises two cassette storage carousels.

Described is an oven (1) for melting precious and non-precious metals, non-metallic materials such as ashes, organic industrial waste, inorganic material such as ceramics, which are heat-resistant and not, in particular in the jewellery sector, comprising an outer unit (2) forming an inner space (6) and having an inductive thermal unit (3) positioned around the inner space (6); an inner unit (4) positioned in the inner space (6) and having a melting chamber (5) for a metal to be melted and operating in conjunction with the inductive thermal unit (3) in such a way that a heating of the inner unit (4) by the inductive thermal unit (3) causes the melting of the metal in the melting pot (5). In particular, the melting chamber (5) has an opening (11) for loading and unloading the metal. The inner unit (4) is rotatably mounted in a motor-driven fashion on the outer unit (2) about an axis of rotation (Z) suitable for mixing the metal contained in the melting chamber (5). Moreover, the outer unit (2) has rotatable supporting means (21) defining a tilting axis (Y) perpendicular to the axis of rotation (Z) and suitable for unloading liquid metal from the melting chamber (5).

A processing apparatus for a thermal treatment of a workpiece is presented. The processing apparatus includes a processing chamber, a workpiece support disposed within the processing chamber, a rotation system configured to rotate the workpiece support, a gas delivery system configured to flow one or more process gases into the processing chamber from the a first side of the processing chamber, one or more gas exhaust ports for removing gas from the processing chamber such that a vacuum pressure can be maintained, one or more radiative heating sources disposed on the second side of the processing chamber, one or more dielectric windows disposed between the workpiece support and the one or more radiative heating sources, and a workpiece temperature measurement system configured at a temperature measurement wavelength range to obtain a measurement indicative of a temperature of a back side of the workpiece.

The invention relates to a device for treating container blanks for a container treatment installation. The device comprises a furnace for heating the container blanks. A planar drive system has a base element and a plurality of movement devices for transporting the container blanks. The plurality of movement devices are movable independently from one another relative to the base element. The container blanks can be moved through the furnace by means of the plurality of movement devices.

A vertical batch furnace assembly for processing wafers comprising a cassette handling space, a wafer handling space, and an internal wall separating the cassette handling space and the wafer handling space. The cassette handling space is provided with a cassette storage configured to store a plurality of wafer cassettes provided with a plurality of wafers. The cassette handling space is also provided with a cassette handler configured to transfer wafer cassettes between the cassette storage and a wafer transfer position. The wafer handling space is provided with a wafer handler configured to transfer wafers between a wafer cassette in the wafer transfer position and a wafer boat in a wafer boat transfer position. The internal wall is provided with a wafer transfer opening adjacent the wafer transfer position for a wafer cassette from or to which wafers are to be transferred. The cassette storage comprises two cassette storage carousels.

A vertical batch furnace assembly for processing wafers comprising a cassette handling space, a wafer handling space, and an internal wall separating the cassette handling space and the wafer handling space. The cassette handling space is provided with a cassette storage configured to store a plurality of wafer cassettes. The cassette handling space is also provided with a cassette handler configured to transfer wafer cassettes between the cassette storage and a wafer transfer position. The wafer handling space is provided with a wafer handler configured to transfer wafers between a wafer cassette in the wafer transfer position and a wafer boat. The internal wall is provided with a wafer transfer opening adjacent the wafer transfer position for a wafer cassette from or to which wafers are to be transferred. The cassette storage comprises a cassette storage carousel with a diameter between 1.1 and 1.6 meter.

Described is an oven (1) for melting precious and non-precious metals, non-metallic materials such as ashes, organic industrial waste, inorganic material such as ceramics, which are heat-resistant and not, in particular in the jewellery sector, comprising an outer unit (2) forming an inner space (6) and having an inductive thermal unit (3) positioned around the inner space (6); an inner unit (4) positioned in the inner space (6) and having a melting chamber (5) for a metal to be melted and operating in conjunction with the inductive thermal unit (3) in such a way that a heating of the inner unit (4) by the inductive thermal unit (3) causes the melting of the metal in the melting pot (5). In particular, the melting chamber (5) has an opening (11) for loading and unloading the metal. The inner unit (4) is rotatably mounted in a motor-driven fashion on the outer unit (2) about an axis of rotation (Z) suitable for mixing the metal contained in the melting chamber (5). Moreover, the outer unit (2) has rotatable supporting means (21) defining a tilting axis (Y) perpendicular to the axis of rotation (Z) and suitable for unloading liquid metal from the melting chamber (5).

A heat-treating furnace has: a rotary shaft; a rotary bottom surface pivotally supported by the rotary shaft and rotates; a plurality of workpiece storage chambers arranged on the rotary bottom surface in a multi-stage torus configuration around an axis of the rotary shaft as a center; a hollow bell-shaped hot-blast guide disposed in a center of the torus configuration on the rotary bottom surface around the axis of the rotary shaft as a center so as to decrease a volumetric capacity in the furnace and to adjust a quantity of a hot blast fed in from above itself into the workpiece storage chamber on each stage; a furnace body bottom surface spaced away from the rotary bottom surface; and a furnace body lateral surface disposed on the furnace body bottom surface.

A vertical batch furnace assembly for processing wafers comprising a cassette handling space, a wafer handling space, and an internal wall separating the cassette handling space and the wafer handling space. The cassette handling space is provided with a cassette storage configured to store a plurality of wafer cassettes. The cassette handling space is also provided with a cassette handler configured to transfer wafer cassettes between the cassette storage and a wafer transfer position. The wafer handling space is provided with a wafer handler configured to transfer wafers between a wafer cassette in the wafer transfer position and a wafer boat. The internal wall is provided with a wafer transfer opening adjacent the wafer transfer position for a wafer cassette from or to which wafers are to be transferred. The cassette storage comprises a cassette storage carousel with a diameter between 1.1 and 1.6 meter.