A computer that includes a processor and a memory, the memory including instructions executable by the processor can activate a plurality of light sources in an alternating pattern at an illumination frequency and acquire image data depicting light reflected from an object at a timing corresponding to the alternating pattern at the illumination frequency. In response to variations in the light impinging upon the object from the alternating pattern, an object contour can be determined based on estimating one or more object surface normals based on photometric stereo. One or more of object identity and object depth can be determined based on combining the object contour with the image data.

An optical dimensioning system includes one or more light emitting assemblies configured to project one or more predetermined patterns on an object; an imaging assembly configured to sense light scattered and/or reflected off the object, and to capture an image of the object while the patterns are projected; and a processing assembly configured to analyze the image of the object to determine one or more dimension parameters of the object. The light emitting assembly may include a single piece optical component configured for producing a first pattern and second pattern. The patterns may be distinguishable based on directional filtering, feature detection, feature shift detection, or the like. A method for optical dimensioning includes illuminating an object with at least two detectable patterns; and calculating dimensions of the object by analyzing pattern separate of the elements comprising the projected patterns. One or more pattern generators may produce the patterns.

A lighting system is described that includes a first lighting device, a second lighting device and a pattern element. The first lighting device includes at least one individual light-emitting element configured to emit light with a first beam profile. The second lighting device includes at least one individual light-emitting element configured to emit light with a second beam profile such that a third beam profile, different from the first beam profile and the second beam profile, is provided as a combination of the first beam profile and the second beam profile. The pattern element is configured to generate a pattern on at least one of the first beam profile and the second beam profile and a pattern on the third beam profile.

An optical dimensioning system includes one or more light emitting assemblies configured to project one or more predetermined patterns on an object; an imaging assembly configured to sense light scattered and/or reflected off the object, and to capture an image of the object while the patterns are projected; and a processing assembly configured to analyze the image of the object to determine one or more dimension parameters of the object. The light emitting assembly may include a single piece optical component configured for producing a first pattern and second pattern. The patterns may be distinguishable based on directional filtering, feature detection, feature shift detection, or the like. A method for optical dimensioning includes illuminating an object with at least two detectable patterns; and calculating dimensions of the object by analyzing pattern separate of the elements comprising the projected patterns. One or more pattern generators may produce the patterns.

The relationship between space coordinates and a plurality of feature amounts gained from at least a pattern or a change in the pattern that has been projected from a plurality of projection units is found in advance, and the relationship between the feature amounts and the space coordinates is used in order to find the space coordinates of the surface of an object from the feature amounts that have been gained from a pattern or a change in the pattern projected from the plurality of projection units onto the surface of the object.

A shape measurement apparatus includes a work stage supporting a target substrate, a pattern-projecting section including a light source, a grating part partially transmitting and blocking light generated by the light source to generate a grating image and a projecting lens part making the grating image on a measurement target of the target substrate, an image-capturing section capturing the grating image reflected by the measurement target of the target substrate, and a control section controlling the work stage, the pattern-projecting section and the image-capturing section, calculating a reliability index of the grating image and phases of the grating image, which is corresponding to the measurement target, and inspecting the measurement target by using the reliability index and the phases. Thus, the accuracy of measurement may be enhanced.

An apparatus (100) for use in a device for generating a three-dimensional (3D) representation of a scene. The apparatus (100) comprises an emitter module (104) having an emitter for emitting a plurality of waves in a predetermined pattern, wherein the pattern has a primary axis. The apparatus (100) further comprises a static portion and a movable portion (116). The movable portion (116) is configured to allow the emitter module (104) to emit the predetermined pattern in a plurality of different arrangements depending on the position and/or orientation of the movable portion (116). A mechanical element (150) of the apparatus (100) constrains movement of the movable portion (116) so as to provide a predictable orientation of the primary axis relative to the static portion in one or more of the different arrangements.

A system can include an axis, a motor coupled with the axis and configured to rotate the axis, an optical modulator coupled with the axis and configured to be rotated by the axis, a lens element, a projection surface, a laser device configured to shine light through the optical modulator to project structured light onto the projection surface through the lens element, and a sensor configured to capture an image of a sample and structured light that is reflected from the projection surface and the sample surface. The system can also include a computing system having a synchronization module configured to phase lock the system by coordinating the laser device and the sensor and an analysis module configured to compute a three-dimensional (3D) object based on the structured light that is reflected from the projection surface and the sample surface.

A lighting system is described that includes a first lighting device, a second lighting device and a pattern element. The first lighting device includes at least one individual light-emitting element configured to emit light with a first beam profile. The second lighting device includes at least one individual light-emitting element configured to emit light with a second beam profile such that a third beam profile, different from the first beam profile and the second beam profile, is provided as a combination of the first beam profile and the second beam profile. The pattern element is configured to generate a pattern on at least one of the first beam profile and the second beam profile and a pattern on the third beam profile.

An imaging processing part 131 executes first imaging processing of causing a first illuminating part to emit structured light from a first direction to a measurement target, causing an imaging part 120 to generate image data, and causing a buffer memory 133 to store therein the generated image data. A computing processing part 132 executes first computing processing of generating, height data corresponding to the first direction. Concurrently with the first computing processing, the imaging processing part 131 executes second imaging processing of causing the second illuminating part to emit structured light from a second direction to the measurement target, causing the imaging part 120 to generate image data, and causing a buffer memory 134 to store therein the generated image data. The computing processing part 132 executes second computing processing of generating height data corresponding to the second direction.