Apparatus, methods and are disclosed for measuring refractive index of an absorber material used in EUV phase shift masks. The method and apparatus utilize a reference measurement and as series of reflectance measurements at a range of EUV wavelengths and thickness values for the absorber material to determine the refractive index of the absorber material.

A method for analysing a sample uses a resonant support having a surface on which a plurality of separated photonic crystals extends. At least two crystals are configured to capture the same analyte. A resonance wavelength associated with each crystal varies with an amount of analyte in contact with the crystal. The wavelengths define a resonance spectral band between 200-1500 nm. The transmission/reflection of the light is maximum at an associated resonance wavelength. The method includes: illuminating the support in the resonance spectral band, the intensity of the lamination being variable in band; acquiring a measurement image using an image sensor, the image having different regions-of-interest each optically coupled to a photonic crystal; using a reference image representative of an image acquired by the image sensor, when the support is illuminated in the resonance spectral band in a reference configuration; and comparing the measurement image with the reference image.

A method for analysing a sample uses a resonant support. The sample extends on the support having a surface on which a plurality of separated photonic crystals extend. The sample extends between a light source and the crystals, wherein a resonance wavelength is associated with each crystal addressing the analyte and the wavelengths of the crystals define a resonance spectral band extending between 2 μm and 20 μm. The transmission or reflection of light by each crystal addressing the analyte is maximum at the associated resonance wavelength. The method includes illuminating the support by the light source, the light source emitting an illumination lightwave defining an illumination spectral band which at least partially covers the resonance spectral band, such that a plurality of crystals are simultaneously illuminated; acquiring an image of the support, and then determining the presence of the analyte in the sample from the image.

A system and method for evaluation of an interaction between an analyte in a fluid sample and a ligand immobilized on a sensor surface of a biosensor is provided. In one example, the system includes a plurality of needles, each being arranged to inject a fluid sample to one of sensor surfaces or detection spots. A plurality of fluid samples, each containing known concentrations of analyte, is provided. The plurality of fluid samples may be divided into at least two groups, each group having a number of fluid samples corresponding to the number of needles. The system and method is configured to perform the injections without intermediate regeneration or renewal of the immobilized ligand. Software for performing the steps of the method and a computer readable medium for storing the software are also provided.

An embodiment sensor includes a hybrid waveguide. The hybrid waveguide includes a first dielectric optical waveguide lying on and in contact with a dielectric support layer; a first surface waveguide optically coupled to the first dielectric optical waveguide, parallel to the first dielectric optical waveguide, and lying on the dielectric support layer. The first surface waveguide has a lateral surface configured to guide a surface mode. The hybrid waveguide includes a cavity intended to be filled with a dielectric fluid, separating laterally the first dielectric optical waveguide from the lateral surface of the first surface waveguide.

Systems and methods for conducting contact-free thickness and refractive-index measurements of transparent objects, such as intraocular lenses using a dual confocal microscopy system are disclosed.

Apparatus, methods and are disclosed for measuring refractive index of a material film. The method and apparatus utilize a reference measurement and as series of reflectance measurements at a range of wavelengths and thickness values for the material film to determine the refractive index of the material film.

Apparatus, methods and are disclosed for measuring refractive index of an absorber material used in EUV phase shift masks. The method and apparatus utilize a reference measurement and as series of reflectance measurements at a range of EUV wavelengths and thickness values for the absorber material to determine the refractive index of the absorber material.

The invention relates to a method for determining the thickness and refractive index of a layer (6) on a substrate (26). The layer (6) having a layer boundary surface (30) facing the substrate (26) and a layer top side (28) facing away from the substrate (26). In said method, the following steps are performed; imaging the layer (6), by confocal microscopy, along an optical axis (8), determining a point spread function resolved along the optical axis (8) al the layer boundary surface (30) and the layer lop side (28), determining an apparent thickness of the layer at a lateral point of the layer from the distance between two maxima of the point spread function, determining the widening of a maximum that the point spread function has at the layer boundary surface (30) relative to the width of the same maximum that the point spread function has at the layer top side (28), at the lateral point, and determining the thickness and refractive index of the layer (6) at the lateral point from the apparent thickness and the widening.

Apparatus, methods and are disclosed for measuring refractive index of a material film. The method and apparatus utilize a reference measurement and as series of reflectance measurements at a range of wavelengths and thickness values for the material film to determine the refractive index of the material film.