The present specification provides a detector for an X-ray imaging system. The detector includes at least one high resolution layer having high resolution wavelength-shifting optical fibers, each fiber occupying a distinct region of the detector, at least one low resolution layer with low resolution regions, and a single segmented multi-channel photo-multiplier tube for coupling signals obtained from the high resolution fibers and the low resolution regions.

This disclosure relates to an apparatus and methods for applying X-ray reflectometry (XRR) in characterizing three dimensional nanostructures supported on a flat substrate with a miniscule sampling area and a thickness in nanometers. In particular, this disclosure is targeted for addressing the difficulties encountered when XRR is applied to samples with intricate nanostructures along all three directions, e.g. arrays of nanostructured poles or shafts. Convergent X-ray with long wavelength, greater than that from a copper anode of 0.154 nm and less than twice of the characteristic dimensions along the film thickness direction, is preferably used with appropriate collimations on both incident and detection arms to enable the XRR for measurements of samples with limited sample area and scattering volumes.

A method of inspecting a structure during additive manufacturing of the structure and additive manufacturing systems are presented. An additive manufacturing system comprises additive manufacturing equipment comprising a casing and an additive manufacturing head configured to form a plurality of layers of a structure within the casing; and an x-ray backscatter imaging system configured to send an x-ray beam into a structure formed within the additive manufacturing equipment and detect scattered x-rays for imaging and analysis of the structure during fabrication.

A measurement device includes an analyzer configured to analyze a diffraction image of X-rays scattered from a subject; estimate a surface contour shape of a measurement area of the subject; extract feature data from shape information, and determine shape parameters for representing the surface contour shape; calculate a theoretical scattering intensity of each of the scattered X-rays when values of the shape parameters are changed; calculate a difference between a measured scattering intensity of each scattered X-ray and the corresponding theoretical scattering intensity, and generate a regression model of a relationship between a corresponding value of the shape parameter and the difference for each shape parameter; extract one shape parameter candidate value reducing the difference from the regression model, and calculate a theoretical scattering intensity of the shape parameter candidate value; and estimate the value of the shape parameter minimizing the difference while repeatedly changing the shape parameter candidate value.

An in vitro method for detecting presence of cancer includes obtaining a single hair sample. An x-ray beam is emitted from a source towards the hair sample. A small angle X-ray scattering (SAXS) intensity profile is generated after the x-ray beam hits the hair sample. The SAXS profile is received on a detector to obtain SAXS data, which is desmeared and Kratky Analysis is performed. A relative estimation of peak area under 1.38 nm.sup.−1 to 0.89 nm.sup.−1 from keratin and lipid content in the hair sample is performed to obtain R and is corrected by dividing by D, thickness of the hair. R′ is computed using formula: 10×R.sup.2/(D−R). The value of R′ is compared with clinically validated samples. If R′ value is below 0.7, it indicates the presence of cancer and if it is above 0.8, it indicates absence of cancer.

An apparatus for inspecting a semiconductor device according to an embodiment includes an X-ray irradiation unit configured to make monochromatic X-rays obliquely incident on the semiconductor device, which is an object at a predetermined angle of incidence, a detection unit configured to detect observed X-rays observed from the object using a plurality of two-dimensionally disposed photodetection elements, an analysis apparatus configured to generate X-ray diffraction images obtained by photoelectrically converting the observed X-rays, and a control unit configured to change an angle of incidence and a detection angle of the X-rays, in which the analysis apparatus acquires an X-ray diffraction image every time the angle of incidence is changed, extracts a peak X-ray diffraction image, X-ray intensity of which becomes maximum for each of pixels and compares the peak X-ray diffraction image among the pixels to thereby estimate a stress distribution of the object.

A sample inspection system and a corresponding method for inspecting a sample is provided. The sample inspection system includes a beam former, a beam modulator an energy resolving detector and a collimator. The beam former is adapted to receive an electromagnetic radiation from an electromagnetic source to generate a primary beam of electromagnetic radiation. The beam modulator is provided at a distance from the beam former to define a sample chamber. The collimator is provided between the beam modulator and the energy resolving detector. The collimator has a plurality of channels adapted to receive diffracted or scattered radiation. Upon incidence of the primary beam onto the beam modulator, the beam modulator provides a reference beam of diffracted or scattered radiation. The energy resolving detector is arranged to detect the reference beam.

The present specification provides a detector for an X-ray imaging system. The detector includes at least one high resolution layer having high resolution wavelength-shifting optical fibers, each fiber occupying a distinct region of the detector, at least one low resolution layer with low resolution regions, and a single segmented multi-channel photo-multiplier tube for coupling signals obtained from the high resolution fibers and the low resolution regions.

Described herein are examples of industrial radiography systems that enable rotation of a part about a custom axis that is offset from an actual rotation axis of a rotatable fixture that retains the part. This may be valuable in situations where it is difficult, impractical, and/or impossible to align the center of the part with the center of the rotatable fixture. In some examples, the custom axis rotation may be implemented on existing radiography machines, without requiring physical alteration of the radiography machines, integration of new components into the radiography machines, and/or risk of instability to the part and/or radiography machines.

Provided is a portable XRF data screening method for heavy metal contaminated soil, relating to the technical field of heavy metal contamination test. The method includes the following steps: (1) laboratory test; (2) XRF test; and (3) calculation of a recheck interval: dividing test data into four areas by a contaminant screening value X.sub.c as a horizontal line and a correlation-derived site screening value as a vertical line to calculate the recheck interval. The method is simple and efficient, and is beneficial to saving investigation costs and shortening a project cycle.