A varifocal ocular lens is disclosed. The varifocal ocular lens is based on a pancake lens having a polarization-folded optical path formed by two reflectors, e.g. one polarization-selective reflector and one partial reflector. By placing at least one of the reflectors onto a flexible deformable membrane, the shape e.g. radius of curvature and/or cylindricity of the reflector(s) may be dynamically changed to vary focal length and/or astigmatism of the ocular lens. Viewer's visual prescription and eye vergence may be dynamically and/or statically accommodated by the varifocal lens.

An apparatus and method for optically remapping projected pixels to maximize the utilization and to optimize the distribution of remapped projection pixels to achieve optimal visual performance (generally uniform resolution and luminance). A device interposed between a projector and an imaging surface for optically remapping projected pixel locations with minimal aberration. When this device is interposed between a projector and an imaging surface, it changes the terminal location of each focused pixel such that it maximally coincides with the imaging surface, which is often a surface of complex curvature and very different from the native focal surface of the projector. One implementation of the technology includes a device that uses multiple optical surfaces.

The invention relates to an adaptive optical system (1) comprising: an adaptive optical device (2) comprising an optical processing surface (3) and a driving device (5) for controllably modifying the optical behaviour of said optical processing surface (3), an optical analyser (6) intended to be subjected to an input light beam (7) in order to produce, in response, output signals (8, 9, 10), a control device (11) connected to the optical analyser (6) and to the driving device (5) in order to command the latter depending on said output signals (8, 9, 10), characterised in that said optical analyser (6) is designed to spatially demultiplex, via multi-plane light conversion, the input light beams (7) into a plurality of elementary output light beams (80, 90, 100). Adaptive optical systems.

The disclosed aliphatic thermoplastic polyurethane composition is well suited for use in thin, flexible light directing articles to impart flexibility, toughness, or protection to the light directing articles that contain optically active elements. The disclosed aliphatic thermoplastic polyurethanes have improved thermostability at higher temperatures. Specifically, the disclosed aliphatic thermoplastic polyurethanes have a cross-over temperature greater than 110° C. In one embodiment, the cross-over temperature is greater than 130° C. In one embodiment, the cross-over temperature is less than 170° C. and a Tg greater than 35° C. and less than 70° C.

Example display devices include a waveguide configured to propagate visible light under total internal reflection in a direction parallel to a major surface of the waveguide. The waveguide has formed thereon an outcoupling element configured to outcouple a portion of the visible light in a direction normal to the major surface of the waveguide. The example display devices additionally include a polarization-selective notch reflector disposed on a first side of the waveguide and configured to reflect visible light having a first polarization while transmitting the portion of the visible light having a second polarization. The example display devices further include a polarization-independent notch reflector disposed on a second side of the waveguide and configured to reflect visible light having the first polarization and the second polarization, where the polarization-independent notch reflector is configured to convert a polarization of visible light reflecting therefrom.

A facet assembly is a constituent part of a facet mirror for an illumination optical unit for projection lithography. The facet assembly has a facet with a reflection surface for reflecting illumination light. A facet main body of the facet assembly has at least one hollow chamber. A reflection surface chamber wall of the hollow chamber forms at least one portion of the reflection surface. An actuator control apparatus of the facet assembly is operatively connected to the hollow chamber for the controlled deformation of the reflection surface chamber wall. The result is a facet assembly that is usable flexibly as a constituent part of a facet mirror equipped therewith within an illumination optical unit for projection lithography.

A method of scanning a laser over a field of view, the method comprising: providing a laser to produce the laser beam; rasterizing the laser beam over a first sub-area of the field of view; deflecting the laser beam to a second sub-area of the field of view; and rasterizing the laser beam over the second sub-area of the field of view; and capturing image information produced by the laser beam so that, for each sub-area of the field of view, the rasterized laser beam defines a plurality of image segments; for each segment calculating an image correction and applying a correction to the laser according to the calculated image correction for the segment, and corresponding system.

An adaptive optical element for microlithography comprises at least one manipulator for changing the shape of an optical surface of the optical element. The manipulator comprises a dielectric medium which is deformable via an electric field, work electrodes for generating the electric field in the dielectric medium, and a measuring electrode for measuring temperature. The measuring electrode is arranged in a direct assemblage with the dielectric medium. The measuring electrode has a temperature-dependent resistance.

A method for measuring an actuator in a projection exposure apparatus for semiconductor lithography, comprises: driving and deflecting a first actuator with a constant control signal; deflecting a further actuator by way of the mechanical coupling; and determining the capacitance of the further actuator, which was deflected by way of the coupling. A projection exposure apparatus for semiconductor lithography comprises a control device and a measuring device, wherein the measuring device is configured to determine the capacitance of at least one actuator in the projection exposure apparatus.

An apparatus and method for optically remapping projected pixels to maximize the utilization and to optimize the distribution of remapped projection pixels to achieve optimal visual performance (generally uniform resolution and luminance). A device interposed between a projector and an imaging surface for optically remapping projected pixel locations with minimal aberration. When this device is interposed between a projector and an imaging surface, it changes the terminal location of each focused pixel such that it maximally coincides with the imaging surface, which is often a surface of complex curvature and very different from the native focal surface of the projector. One implementation of the technology includes a device that uses multiple optical surfaces.