Patent classifications
G02B5/0825
METHOD FOR PREPARING A STACK OF DIELECTRIC LAYERS ON A SUBSTRATE
A method for preparing a stack of dielectric layer on a substrate. A substrate is provided and a first layer of liquid is printed onto a surface of the substrate. A first dielectric layer is formed by solidifying the first layer of liquid and a second layer of liquid is printed onto the first dielectric layer. A second dielectric layer is formed by solidifying the second layer of liquid. The liquid includes dielectric constituents and the liquid is printed such that droplets having a volume of less than one hundred nanoliters are locally deposited per square millimeter on the surface of the substrate.
MIRROR PLATE FOR AN OPTICAL INTERFEROMETER AND AN OPTICAL INTERFEROMETER
A mirror plate (100) for a Fabry-Perot interferometer (300) includes a substrate (50), which includes silicon (Si), a semi-transparent reflective coating (110) implemented on the substrate (50), a de-coupling structure (DC1) formed on the substrate (50), a first sensor electrode (G1a) formed on top of the de-coupling structure (DC1), and a second sensor electrode (G1b), wherein the de-coupling structure (DC1) includes an electrically insulating layer (60a), and a first stabilizing electrode (G0a), which is located between the first sensor electrode (G1a) and the substrate (50).
High contrast optical film having specified transmittance and reflectance of polarized light
Optical films are disclosed that include a plurality of interference layers. Each interference layer reflects or transmits light primarily by optical interference. The total number of the interference layers is less than about 1000. For a substantially normally incident light in a predetermined wavelength range, the plurality of interference layers has an average optical transmittance greater than about 85% for a first polarization state, an average optical reflectance greater than about 80% for an orthogonal second polarization state, and an average optical transmittance less than about 0.2% for the second polarization state.
Omnidirectional high chroma red structural colors
A multilayer thin film that reflects an omnidirectional high chroma red structural color. The multilayer thin film may include a reflector layer, at least one absorber layer extending across the reflector layer, and an outer dielectric layer extending across the at least one absorber layer. The multilayer thin film reflects a single narrow band of visible light when exposed to white light and the outer dielectric layer has a thickness of less than or equal to 2.0 quarter wave (QW) of a center wavelength of the single narrow band of visible light.
MACHINING HEAD FOR LASER MACHINING MACHINE, AND LASER MACHINING MACHINE
The invention relates to a machining head (1) for laser machining machines, in particular for laser cutting machines, having an interface to a laser light source (3), preferably to fiber-coupled or fiber-based laser sources. Said laser sources are designed for more than 500 W of average output power in the near infrared region. The interface is preferably designed for coupling an optical waveguide (2) for the working laser beam (6). The machining head (1) also has a focusing optical unit (11) having preferably only one imaging lens. A deflecting assembly (9, 10) for at least one single deflection of the working laser beam (6) is arranged between the interface and the focusing optical unit (11). Said deflecting assembly (9, 10) is designed as a passive optical element that changes the divergence of the working laser beam (6) in dependence on power.
SCANNING MIRROR DEVICE AND A METHOD FOR MANUFACTURING IT
An optical device formed of a mirror wafer, a cap wafer, and a glass wafer. The mirror wafer includes a first layer of electrically conductive material, a second layer of electrically conductive material, and a third layer of electrically insulating material between the first layer and the second layer. A mirror element is formed of the second layer of the mirror wafer, and has a reflective surface in the bottom of a cavity opened into at least the first layer. A good optical quality planar glass wafer can be used to enclose the mirror element when the mirror wafer, cap wafer, and glass wafer are bonded to each other.
Exposed Lens Retroreflective Articles Comprising A Self-Assembled Dielectric Mirror
An exposed lens retroreflective article (100), transfer articles comprising same, and methods of making same. The retroreflective article can include a binder layer (114); a layer of transparent microspheres (108) partially embedded in the binder layer; and reflective layer (110) disposed between the binder layer and the microspheres. The reflective layer (110) can include a dielectric mirror, which can include a first stack (115) and a second stack (111) positioned in planar contact with the first stack, wherein each of the first stack and the second stack comprises at least one bilayer (119), wherein each bilayer comprises a first material with a first bonding group and a second material with a complementary second bonding group. The transfer article can include the retroreflective article and a carrier web. The method can include partially embedding transparent microspheres in a carrier web; applying the reflective layer to the microspheres, and applying a binder layer composition to the reflective layer.
INVERTED LCD STRUCTURE FOR VR
A liquid crystal display (LCD) is configured for use in a head mounted display (HMD) to increase the brightness and improve power consumption of the LCD by recycling light. The LCD includes a color filter (CF) substrate, a thin film transistor (TFT) substrate, and a backlight unit (BLU). The CF substrate is closer to the BLU than the TFT substrate. The CF substrate includes a first reflective layer in regions of the CF substrate between pixels to reflect light back towards the BLU to be recycled to increase the brightness of the LCD. The TFT substrate includes TFTs to drive the pixels and a second reflective layer covering TFTs to reflect light away from the TFTs.
AN OPTICAL DEVICE WITH REDUCED REFLECTION IN DEEP RED, NEAR INFRARED AND VISIBLE RANGES
This optical device comprises an ophthalmic lens and a light source emitting in the deep red and near infrared region. The ophthalmic lens has front and rear faces coated with interferential coatings. The mean reflectance of the rear interferential coating is lower than or equal to 2.5% for wavelengths ranging from 700 nm to a predetermined maximum wavelength lower than or equal to 2500 nm, at an angle of incidence lower than or equal to 45°. At an angle of incidence lower than or equal to 45°, for wavelengths ranging from 700 nm to the predetermined maximum wavelength, the mean reflectance of the front interferential coating is either lower than or equal to 2.5% if the source is directed towards the front face of the ophthalmic lens, or higher than or equal to 25% if the source is directed towards the rear face of the ophthalmic lens.
BEAM SPLITTER WITH PHOTOCATALYTIC COATING AND FABRICATION METHOD THEREOF
A method for making a beam splitter with photocatalytic coating is disclosed. First, a TiO.sub.2—SiO.sub.2 sol, a SiO.sub.2 sol, and an anatase TiO.sub.2 preform sol are prepared. A glass substrate having two opposite surfaces is provided. The two opposite surfaces of the glass substrate is coated with the TiO.sub.2—SiO.sub.2 sol, the SiO.sub.2 sol, and the anatase TiO.sub.2 preform sol by dip-coating, thereby forming a coated glass substrate with a multi-layer optical coating on each of the two opposite surfaces. The multi-layer optical coating comprises a TiO.sub.2—SiO.sub.2 coating, a SiO.sub.2 coating, and an anatase TiO.sub.2 preform coating. The coated glass substrate is subjected to an anneal process. The coated glass substrate is cut, thereby forming the beam splitter with photocatalytic coating.