The disclosure provides recording materials include fluorene derivatized monomers and polymers for use in volume Bragg gratings, including, but not limited to, volume Bragg gratings for holography applications. Several fluorene structures are disclosed: simply substituted fluorenes, cardo-fluorenes, and spiro-fluorenes. Fluorene derivatized polymers in Bragg gratings applications lead to materials with higher refractive index, low birefringence, and high transparency. Fluorene derivatized monomers/polymers can be used in any volume Bragg gratings materials, including two-stage polymer materials where a matrix is cured in a first step, and then the volume Bragg grating is written by way of a second curing step of a monomer.

According to one exemplary embodiment, a method includes exposing one or more portions of an additive manufacturing resin to light; where the light includes a wavelength configured to cause a photo polymerizable compound in the additive manufacturing resin to polymerize; and the one or more portions of the additive manufacturing resin are defined by a three-dimensional pattern. Moreover, a method of forming an additive manufacturing resin suitable for fabricating a click-chemistry compatible composition of matter includes: reacting a compound comprising a terminal alkyne group or a terminal azide group with a protecting reagent to form a protected reactive diluent precursor, reacting the precursor with a second compound to form a protected reactive diluent; and mixing the protected reactive diluent with a photo polymerizable compound.

According to one exemplary embodiment, a method includes exposing one or more portions of an additive manufacturing resin to light; where the light includes a wavelength configured to cause a photo polymerizable compound in the additive manufacturing resin to polymerize; and the one or more portions of the additive manufacturing resin are defined by a three-dimensional pattern. Moreover, a method of forming an additive manufacturing resin suitable for fabricating a click-chemistry compatible composition of matter includes: reacting a compound comprising a terminal alkyne group or a terminal azide group with a protecting reagent to form a protected reactive diluent precursor, reacting the precursor with a second compound to form a protected reactive diluent; and mixing the protected reactive diluent with a photo polymerizable compound.

A method of manufacturing a holographic pattern-expressing organogel, by using a dithering mask, according to an aspect of the present disclosure includes: preparing a dithering mask including white pixels and black pixels arranged in periodic patterns; photocuring a polymer by passing an ultraviolet ray through the dithering mask; passing a first solvent through the cured polymer; and passing a second solvent through the cured polymer through which the first solvent is passed.

Coating compositions comprise: a curable compound comprising: a core chosen from a C.sub.6 carbocyclic aromatic ring, a C.sub.2-5 heterocyclic aromatic ring, a C.sub.9-30 fused carbocyclic aromatic ring system, a C.sub.4-30 fused heterocyclic aromatic ring system, C.sub.1-20 aliphatic, and C.sub.3-20 cycloaliphatic, and three or more substituents of formula (1)

##STR00001##

wherein at least two substituents of formula (1) are attached to the aromatic core; and wherein: Ar.sup.1 is chosen from a C.sub.6 carbocyclic aromatic ring, a C.sub.2-5 heterocyclic aromatic ring, a C.sub.9-30 fused carbocyclic aromatic ring system, and a C.sub.4-30 fused heteroocyclic aromatic ring system; Z is a substituent independently chosen from OR.sup.1, protected hydroxyl, carboxyl, protected carboxyl, SR.sup.1, protected thiol, —O—C(═O)—C.sub.1-6 alkyl, halogen, and NHR.sup.2; wherein each R.sup.1 is independently chosen from H, C.sub.1-10 alkyl, C.sub.2-10 unsaturated hydrocarbyl, and C.sub.5-30 aryl; each R.sup.2 is independently chosen from H, C.sub.1-10 alkyl, C.sub.2-10 unsaturated hydrocarbyl, C.sub.5-30 aryl, C(═O)—R.sup.1, and S(═O).sub.2—R.sup.1; x is an integer from 1 to the total number of available aromatic ring atoms in Ar.sup.1; and * denotes the point of attachment to the core; provided that no substituents of formula (1) are in an ortho position to each other on the same aromatic ring of the core; a polymer; and one or more solvents, wherein the total solvent content is from 50 to 99 wt % based on the coating composition. Coated substrates formed with the coating compositions and methods of forming electronic devices using the compositions are also provided. The compositions, coated substrates and methods find particular applicability in the manufacture of semiconductor devices.

Apparatuses and methods for forming a film on a substrate are described. The film is formed on the substrate by depositing an adamantane monomer and an initiator on the substrate to form a polymerizable seed layer and curing the polymerizable seed layer to form a polyadamantane layer.

The present disclosure relates in one aspect to methods of preparing non-homogeneous polymer materials wherein light is used to control structure and/or composition. In certain embodiments, the present disclosure provides methods for creating gradient index optical elements including holographic elements.

Provided is a compound that can be used for a resin for a resist having excellent sensitivity, resolution, and etching resistance, or the like, by a compound represented by the following formula (1): ##STR00001##
(wherein R.sub.1 represents a hydrogen atom or a methyl group, R.sub.2 represents an aliphatic hydrocarbon group having 1 to 6 carbon atoms, m represents an integer of 0 to 5, and n represents an integer of 0 to 4).

Coating compositions comprise: a B-staged reaction product of one or more compounds comprising: a core chosen from C.sub.6-50 carbocyclic aromatic, C.sub.2-50 heterocyclic aromatic, C.sub.1-20 aliphatic, C.sub.1-20 heteroaliphatic, C.sub.3-20 cycloaliphatic, and C.sub.2-20 heterocycloaliphatic, each of which may be substituted or unsubstituted; and two or more substituents of formula (1) attached to the core: ##STR00001##
wherein: Ar.sup.1 is an aromatic group independently chosen from C.sub.6-50 carbocyclic aromatic and C.sub.2-50 heteroaromatic, each of which may be substituted or unsubstituted; Z is a substituent independently chosen from OR.sup.1, protected hydroxyl, carboxyl, protected carboxyl, SR.sup.1, protected thiol, —O—C(═O)—C.sub.1-6 alkyl, halogen, and NHR.sup.2; wherein each R.sup.1 is independently chosen from H, C.sub.1-10 alkyl, C.sub.2-10 unsaturated hydrocarbyl, and C.sub.5-30 aryl; each R.sup.2 is independently chosen from H, C.sub.1-10 alkyl, C.sub.2-10 unsaturated hydrocarbyl, C.sub.5-30 aryl, C(═O)—R.sup.1, and S(═O).sub.2—R.sup.1; x is an integer from 1 to the total number of available aromatic ring atoms in Ar.sup.1; and * denotes the point of attachment to the core; provided that when the core comprises an aromatic ring, no substituents of formula (1) are in an ortho position to each other on the same aromatic ring of the core; and one or more solvents, wherein the total solvent content is from 50 to 99 wt % based on the coating composition. Coated substrates formed with the coating compositions and methods of forming electronic devices using the compositions are also provided. The compositions, coated substrates and methods find particular applicability in the manufacture of semiconductor devices.

To provide a method for manufacturing a cured film having high film density, high film hardness and high etching resistance. A method for manufacturing a cured film comprising (1) applying a composition (i) above a substrate; (2) forming a hydro-carbon-containing film from the composition (i); and (3) irradiating the hydrocarbon-containing film with plasma, electron beam and/or ion to form a cured film. Use of the cured film.