The present invention relates to a method for manufacturing a flexible photo-patterned mask. The method includes a) coating a photoresist composition on a substrate to form a photoresist film, b) exposing the photoresist film to pattern the photoresist film, c) developing the patterned photoresist film, and d) curing the developed photoresist film to form a patterned layer having a plurality of tapered openings.

Gray-tone lithography techniques for controlling the thickness profile of an overcoat layer on a surface-relief grating that has a non-uniform grating parameter (e.g., depth, duty cycle, or period), compensating for the non-uniform etch rate in a large area, defining etch/block regions, and/or controlling the thickness of the grating layer.

Gray-tone lithography techniques for controlling the thickness profile of an overcoat layer on a surface-relief grating that has a non-uniform grating parameter (e.g., depth, duty cycle, or period), compensating for the non-uniform etch rate in a large area, defining etch/block regions, and/or controlling the thickness of the grating layer.

A method of manufacturing a metal mask includes calendering a metal material, so as to form a metal mask substrate, where the metal mask substrate includes a surface and a plurality of grooves formed in the surface, and the grooves all extend in a direction. The surface has at least one sampling region, while at least two grooves are distributed in the sampling region, where an average area ratio of the area of the grooves within the sampling region to the area of the sampling region ranges between 45% and 68%.

A method of manufacturing a metal mask includes calendering a metal material, so as to form a metal mask substrate, where the metal mask substrate includes a surface and a plurality of grooves formed in the surface, and the grooves all extend in a direction. The surface has at least one sampling region, while at least two grooves are distributed in the sampling region, where an average area ratio of the area of the grooves within the sampling region to the area of the sampling region ranges between 45% and 68%.

A method and apparatus for measurement of density of a photosensitive printing plate (130) having a mask (132) embodying image information corresponding to an image to be printed. A density measurement system includes a first radiation source (112) spaced apart from and adjacent the plate and configured to emit radiation having a first wavelength or range of wavelengths toward the plate. A densitometer (110) spaced apart from and adjacent the plate in a fixed relationship relative to the first radiation source receives and measures an amount of the first radiation transmitted through or reflected by the plate and the mask during relative movement between the plate and the density measurement system. The densitometer readings are processed to provide an output correlating to quality of the mask. The density measurement system may be coupled to an exposure system (120,122,124) for curing the plate.

A method and apparatus for measurement of density of a photosensitive printing plate (130) having a mask (132) embodying image information corresponding to an image to be printed. A density measurement system includes a first radiation source (112) spaced apart from and adjacent the plate and configured to emit radiation having a first wavelength or range of wavelengths toward the plate. A densitometer (110) spaced apart from and adjacent the plate in a fixed relationship relative to the first radiation source receives and measures an amount of the first radiation transmitted through or reflected by the plate and the mask during relative movement between the plate and the density measurement system. The densitometer readings are processed to provide an output correlating to quality of the mask. The density measurement system may be coupled to an exposure system (120,122,124) for curing the plate.

A shadow mask for patterned vapor deposition of an organic light-emitting diode (OLED) material includes a ceramic membrane under tensile stress with a plurality of through-apertures forming an aperture array through which a vaporized deposition material can pass. A multilayer peripheral support is attached to a rear surface with a hollow portion beneath the aperture array. A compressively-stressed interlayer balances the tensile stress of the ceramic membrane. A shadow mask module with multiple shadow masks is also provided and includes a rigid carrier having plural windows with a shadow mask positioned in each window. To make the module, shadow mask blanks are affixed to each carrier window followed by etching of apertures and support layers. In this way extremely flat masks with precise aperture patterns are formed.

A method of manufacturing a metal mask includes calendering a metal material, so as to form a metal mask substrate, where the metal mask substrate includes a surface and a plurality of grooves formed in the surface, and the grooves all extend in a direction. The surface has at least one sampling region, while at least two grooves are distributed in the sampling region, where an average area ratio of the area of the grooves within the sampling region to the area of the sampling region ranges between 45% and 68%.

Graphene ink compositions as can be utilized with gravure and screen printing processes, to provide flexible electronic components with high-resolution printed graphene circuitry.