Embodiments of the present disclosure include a lithography apparatus, patterning system, and method of patterning a layered structure. The patterning system includes an image formation device and a reactive layer. The patterning system allows for creating lithography patterns in a single operation. The lithography apparatus includes the patterning system and an optical system. The lithography apparatus uses a plurality of wavelengths of light, along with the image formation device, to create a plurality of color patterns on the reactive layer. The method of patterning includes exposing the reactive layer to a plurality of wavelengths of light. The light reacts differently with different regions of the reactive layer, depending on the wavelength of light emitted onto the different regions. The method and apparatuses disclosed herein require only one image formation device and one lithography operation.

An exposure apparatus including a micro light emitting diode display unit and a first projection optical system is provided. The micro light emitting diode display unit has a plurality of micro light emitting diodes. The micro light emitting diode display unit is adapted to individually control light emission signals of the micro light emitting diodes and forming a predetermined pattern. The first projection optical system is disposed on a light emitting path of the micro light emitting diode display unit. The first projection optical system is configured to form an exposure pattern on a photosensitive material layer at once by applying the predetermined pattern.

Examples described herein provide a system, a software application, and a method of a lithography process to write multiple tones in a single pass. A system includes a stage and a lithography system. The lithography system includes image projection systems, a controller, and memory. The controller is coupled to the memory, which stores instruction code. Execution of the instruction code by the controller causes the controller to control the stage and the image projection systems to iteratively expose a photoresist supported by the stage and to move the stage relative to the image projection systems a step distance between sequential pairs of the exposures. Each exposure includes using write beam(s) projected from the image projection systems. Each exposure is at a respective one of different dosage amounts. An accumulation of the different dosage amounts is a full tone dosage amount for the photoresist.

An apparatus comprises: (a) a rotatable drum configured to have a UV-curable printing plate with an ablatable layer thereon, placed thereon; (b) at least one laser beam to image the plate on the drum by ablating some of the ablatable layer according to image data to form an imaged plate; (c) an unloading area onto which a plate is movable when unloaded; and (d) a plurality of UV LEDs configured to apply UV radiation to the back of the UV-curable plate or to both the front and back of the UV-curable plate during or after the unloading of the imaged plate.

A photoresist composition includes an alkali soluble resin, a hardening agent, a photo acid generator, and an organic solvent. The photo acid generator may be represented by Formula 1, ##STR00001##
in which L.sub.11 is selected from a single bond, a C.sub.1-C.sub.10 alkylene group, a C.sub.2-C.sub.10 alkenylene group, and a C.sub.2-C.sub.10 alkynylene group; and R.sub.11 is selected from a C.sub.6-C.sub.15 aryl group, or a C.sub.6-C.sub.15 aryl group with at least one substitutent group selected from a group comprising deuterium, a hydroxyl group, a C.sub.1-C.sub.10 alkyl group, a C.sub.1-C.sub.10 alkoxy group, and a C.sub.6-C.sub.15 aryl group.

A mask plate, an exposure system and an exposure method are disclosed. The mask plate includes a control unit (10) and a liquid crystal cell (20), wherein the control unit (10) is electrically connected to the liquid crystal cell (20) and configured to control the liquid crystal cell (20) to render a mask pattern. The mask plate can fulfill the requirements for various mask patterns, which not only save the manufacturing cost, but also simplifies the process operation.

A double-sided digital lithography or exposure system and method are provided. The system includes a first optical engine 110 for exposing a front side of a substrate 910, a second optical engine 120 for exposing the back side of the substrate 910, a control system 710 for generating a first exposure pattern and a second exposure pattern aligned on the front and back surfaces of the substrate 910 based on the position information of the first optical engine 110 and the second optical engine 120, and controlling the first optical engine 110 and the second optical engine 120 to expose the front and back surfaces of the substrate 910 with the first exposure pattern and the second exposure pattern.

Embodiments of the systems, methods, and software provided herein patterns substrates using digital lithography patterning controlled by field programmable gate arrays (FPGA). Stage position data is provided to the FPGA from the lithography environment and the data is loaded into a memory from the FPGA. The graphics processing unit, reads the data from the memory and calculates instructions based on the data. At least a portion of a substrate disposed on the stage is processed using instructions provided by the FPGA.

Systems and processes for making a flexo plate, and plates made thereby. Non-printing indicia defined by areas of presence and absence of polymer in the plate floor created using microdots imaged during a LAMS layer imaging step are readable downstream of the washing or other non-cured-polymer-removal step but not to print in the printing step. The non-printing indicia may define a repeating pattern of alphanumeric characters, non-text graphics, or a combination thereof. A difference in growth of plate structures corresponding to different types of microdots may be used for characterizing processing conditions.

The present disclosure relates to a liquid crystal display (LCD) system. The system in one example has a light source for generating unpolarized light, and an LCD screen arranged in a path of transmittance of the unpolarized light. First and second wire grid polarizers are arranged adjacent to the LCD screen and each have a plurality of nano-scale wires, with the first and second wire grid polarizers have differing polarizations. A pitch of each of the nano-scale wires is no larger than one-third a wavelength of the unpolarized light from the light source. The wire grid polarizers create, in connection with operation of the LCD screen, a 2D light mask suitable for initiating the polymerization of an optically curable material.