An optical device includes a plurality of laser light sources, an output module having an optical modulator, and a time divider that is disposed between the plurality of laser light sources and the output module and that is configured to divide laser beams emitted from the plurality of laser light sources in time.

Embodiments of the present disclosure include a lithography apparatus, patterning system, and method of patterning a layered structure. The patterning system includes an image formation device and a reactive layer. The patterning system allows for creating lithography patterns in a single operation. The lithography apparatus includes the patterning system and an optical system. The lithography apparatus uses a plurality of wavelengths of light, along with the image formation device, to create a plurality of color patterns on the reactive layer. The method of patterning includes exposing the reactive layer to a plurality of wavelengths of light. The light reacts differently with different regions of the reactive layer, depending on the wavelength of light emitted onto the different regions. The method and apparatuses disclosed herein require only one image formation device and one lithography operation.

An optical component for coupling out an individual output beam from a collective output beam includes a plurality of radiation-reflecting regions which are grouped in such a way that regions of the same group serve for guiding different partial beams of the individual output beam to the same scanner.

Maskless lithographic apparatus measuring accumulated amount of light is provided. The maskless lithographic apparatus includes a light source which emits light, a stage on which a substrate is disposed, an optical system which converts the light into a beam spot array including a plurality of columns and a plurality of rows and irradiates the beam spot array onto the stage, a slit to which the beam spot array is irradiated and which passes an nth (n is a natural number) row of the beam spot array, an optical sensor which senses the nth row of the beam spot array which has passed through the slit, and a measuring unit which measures an accumulated amount of light in the nth row of the beam spot array sensed by the optical sensor

Techniques are disclosed for optical distortion reduction in projection systems for scanning projection and/or lithography. A projection system includes an illumination system configured to generate illumination radiation for generating an image of an object to be projected onto an image plane of the projection system. The illumination system includes a field omitting illumination condenser configured to receive the illumination radiation from a radiation source and provide a patterned illumination radiation beam to generate the image of the object, wherein the patterned illumination radiation beam comprises an omitted illumination portion corresponding to a ridge line of a roof prism disposed within an optical path of the projection system.

An exposure apparatus according to the present invention includes an illumination optical system including a first optical modulation unit having a plurality of optical modulation elements, a second optical modulation unit having a plurality of optical modulation elements, and an imaging optical system forming optical images on a predetermined plane by using lights from the first optical modulation unit and the second optical modulation unit, and a projection optical system projecting the optical image formed on the predetermined plane onto a substrate.

A device and a method for regulating and controlling an incident angle of a light beam in a laser interference lithography process are disclosed. The device comprises: a beam splitter prism between a first lens and a second lens, a first position detector, a first decoupling lens between the first position detector and the beam splitter prism, a feedback control system connected to the first position detector and a first universal reflecting mirror. The beam splitter prism reflects first incident light passing through the first universal reflecting mirror, the first decoupling lens enables a first reflected light enter into the first position detector, the first position detector measures the light beam position, the feedback control system outputs a control command according to the measurement result to regulate a mirror base of the first universal reflecting mirror, thereby regulating and controlling an incident angle of an exposure light beam.

An illumination optical system of the present invention includes a first lens array FE including a plurality of lens cells dividing a light flux emitted from a light source into a plurality of light fluxes, a second lens array MLAi including lens cells on which spot lights exiting from the lens cells included in the first lens array FE are condensed, and a first optical member IL3 imaging the spot light, which has been condensed on the lens cell included in the second lens array MLAi, on one of optical modulation elements constituting an optical modulation unit.

An illumination optical system of the present invention includes a first lens array FE including a plurality of lens cells dividing a light flux emitted from a light source into a plurality of light fluxes, a second lens array MLAi including lens cells on which spot lights exiting from the lens cells included in the first lens array FE are condensed, and a first optical member IL3 imaging the spot light, which has been condensed on the lens cell included in the second lens array MLAi, on one of optical modulation elements constituting an optical modulation unit.

An imprint method includes supplying a first photocurable resist to a first region of an object; irradiating the first resist with first light; forming a second resist over the object; bringing a template into contact with the second resist; and irradiating at least the second resist with second light through the template while the template is in contact with the second resist.