A method to form a three-dimensional photonic crystal template with a gradient structure involves irradiating a photoresist composition of a thickness of at least 15 μm from at least four laser beams to yield a periodic patterned with a percolating matrix of mass in constructive volumes of a cured photoresist composition and destructive volumes of voids free of condensed matter where the proportion of constructive volume displays a gradient from the irradiated surface to the substrate after development. For a given light intensity, photoinitiator concentration in the photoresist composition, and a given thickness, by irradiating for a relatively short period, a three-dimensional photonic crystal template displaying a gradient having greater constructive volume proximal the air interface forms and a relatively long irradiation period results in a gradient having greater constructive volume proximal the substrate.

A method to control the density of a three-dimensional photonic crystal template involves changing the irradiation time from at least four laser beams to yield a periodic percolating matrix of mass and voids free of condensed matter from a photoresist composition. The photoresist composition includes a photoinitiator at a concentration where the dose or irradiation is controlled by the irradiation time and is less than the irradiation time that would convert all photoinitiator to initiating species such that the density of the three-dimensional photonic crystal template differs for different irradiation times. A deposition of reflecting or absorbing particles can be patterned on the surface of the photoresist composition to form a template with varying densities above different areas of the substrate.

Example embodiments relate to methods and devices for generating (quasi-) periodic interference patterns. One embodiment includes a method for generating an interference pattern using multi-beam interference of electromagnetic radiation. The method includes computing a set of grid points in a complex plane representing a grid with a desired symmetry. The method also includes selecting a radius of a virtual circle. Additionally, the method includes selecting a set of grid points in the complex plane that lies on the virtual circle centered around a virtual center point. Further, the method includes associating an argument of each grid point of the selected set of grid points in the complex plane with a propagation direction of plane waves or quasi plane waves or parallel wave fronts. In addition, the method includes obtaining the interference pattern that is a superposition of the plane waves or quasi plane waves or parallel wave fronts.

The present disclosure generally relates to methods and systems for manufacturing wire grid polarizers (WGP) using Markle-Dyson exposure systems and dual tone development (DTD) frequency doubling. In one embodiment, the method includes depositing a photoresist layer over an aluminum-coated display substrate, patterning the photoresist layer by dual tone development using a Markle-Dyson system to form a photoresist pattern, and transferring the photoresist pattern into the aluminum-coated display substrate to manufacture a WGP having finer pitch, for example less than or equal to about 100 nm, and increased frequency.

The present invention relates to a microstructure 20 having pores 22 on its surface or inside. The microstructure is a sheet containing an energy ray active resin 21. The pores 22 are formed in a vertical array and are in a formation pattern with a Talbot distance being specified by Formula 1 below:

Z.sub.T=(2nd.sup.2)/λ  [Formula 1] where Z.sub.T represents a Talbot distance (nm), n represents a refractive index, d represents a pitch distance (nm), and λ represents a light wavelength (nm). The pores have a periodic shape in the planar direction. Thus, the present invention provides three-dimensional microfabricated structures through which the periodicity is controlled.

A three-dimensional photonic crystal template on a reflective substrate displays a periodic patterned from multibeam interference lithography with constructive volumes of a cured photoresist composition and destructive volumes that are voids free of mass containing defects and where the reflective substrate is conductive. A method to generate the three-dimensional photonic crystal template includes using at least four laser beams of unequal intensity, oriented such that a dose of light controlled by the irradiation time generates the periodic pattern with a small dose, where the light reflected from the substrate is insufficient to activate a threshold quantity of photoinitiator in the destructive volumes for the formation of any anomalous condensed matter in the intended void volume.

A lighting device and method for manufacturing the lighting device are provided. A substrate contains at least a first surface and a second surface opposing the first surface. Light-sensitive material is provided on the first surface and/or the second surface. The light-sensitive material is exposed to light by applying the light from a light source onto a mask having a periodic pattern of light-attenuating features with interspaced light-permeable features. The light forms a periodic distribution of high intensity regions with interspaced low intensity regions at the first surface and/or the second surface. A periodic structure is formed based on the exposed light-sensitive material and includes light-attenuating features and light-permeable features corresponding to the light-attenuating features and light-permeable features of the mask.

Provided is a multifunctional lithography device, including: a vacuum substrate-carrying stage configured to place a substrate and adsorb the substrate on the vacuum substrate-carrying stage by controlling an airflow, so as to control a gap between the substrate and the mask plate; a mask frame arranged above the vacuum substrate-carrying stage and configured to fix the mask plate; a substrate-carrying stage motion system arranged below the vacuum substrate-carrying stage and configured to adjust a position of the vacuum substrate-carrying stage, so that a distance between the substrate and the mask plate satisfies a preset condition; an ultraviolet light source system arranged above the mask plate and configured to generate an ultraviolet light for lithography; and a three-axis alignment optical path system configured to align the ultraviolet light with the mask plate.

A manufacturing method of a template includes: providing a base; forming a photoresist pattern on the base and patterning the base by using the photoresist pattern as a mask, and the forming the photoresist pattern includes: forming a plurality of first patterns spaced apart from each other on the base; forming a first material layer on the plurality of first patterns; patterning the at least one first pattern by using the first material layer as a mask so that the first pattern is formed into at least one first sub-pattern; and removing the first material layer; and the first material layer at least cover one side of at least one of the plurality of first patterns in a direction perpendicular to a surface on which the base is located.

This disclosure of a scanner and method is a new way of removing non-uniformities from optical interference patterns.