A high-power fast-pulse driver and illumination system for high speed metrology imaging is provided, which includes an illumination source and a driver circuit configured to overdrive the illumination source using high currents and/or high current densities. The high currents are currents higher than manufacturer-recommended currents used to drive the illumination source and the high current densities are current densities higher than manufacturer-recommended current densities used to drive the illumination source. The illumination source is operated using a lifetime preserving technique selected from a first technique of operating the illumination source at low duty cycles of 2% or less or a second technique of operating the illumination source in a burst mode at higher duty cycles for short intervals. The driver and illumination system may be incorporated in a variable focus lens (VFL) system, to define multiple exposure increments for acquiring one or more images focused at one or more focus planes.

An actuator assembly including a first piezo actuator and a second piezo actuator. The piezo actuator has a correction unit configured to determine an output voltage difference representing a difference between a voltage at the output terminal of the first piezo actuator and a voltage at the output terminal of the second piezo actuator, and a first power correction for correcting the first power signal and/or a second power correction for correcting the second power signal, based on the output voltage difference.

A control apparatus for generating a control signal for controlling a control target includes a plurality of neural networks, and a selector configured to select, from the plurality of neural networks, a neural network to be used to generate the control signal, wherein each of the plurality of neural networks is selected by the selector to be used in execution of one corresponding control pattern among a plurality of control patterns for controlling the control target.

The present application provides an exposure machine, relates to semiconductor integrated circuit manufacturing technologies. The exposure machine includes a machine platform, a shielding device, and a drive device; the machine platform is provided with a recess portion, the recess portion has a top opening, a base and a placement table are disposed in the recess portion, the placement table is configured to carry a mask carrier, and the mask carrier can be placed on the placement table through the top opening; and the machine platform is further provided with a drive device and a movable shielding device, when the shielding device is at an initial position, the shielding device covers the top opening, and when the mask carrier needs to be placed on the placement table through the top opening, the drive device opens the shielding device to expose the top opening.

The present application provides an exposure machine, relates to semiconductor integrated circuit manufacturing technologies. The exposure machine includes a machine platform, a shielding device, and a drive device; the machine platform is provided with a recess portion, the recess portion has a top opening, a base and a placement table are disposed in the recess portion, the placement table is configured to carry a mask carrier, and the mask carrier can be placed on the placement table through the top opening; and the machine platform is further provided with a drive device and a movable shielding device, when the shielding device is at an initial position, the shielding device covers the top opening, and when the mask carrier needs to be placed on the placement table through the top opening, the drive device opens the shielding device to expose the top opening.

The invention provides an assembly comprising a cryostat and a flat coil layer of superconducting coils for use with a magnetic levitation and/or acceleration motor system of a lithographic apparatus. The cryostat comprises two insulation coverings. The coil layer is arranged between the two coverings. The coverings each comprise an inner plate configured to be cryocooled and an outer plate parallel to the inner plate, and an insulation system with a vacuum layer between the inner and outer plate. The insulation system of said covering comprises a layers of circular bodies, the central axes of these bodies extending perpendicular to the inner and outer plate, and is configured to provide a layer of point contacts between two layers of circular bodies or between a layer of circular bodies and the inner and/or outer plate.

The invention provides a substrate support arranged to support a substrate, comprising piezo a actuator, further comprising a first pair of electrodes, a second pair of electrodes and a piezo material having a first surface and a second surface. The first surface is arranged along a first direction and second direction. The first pair of electrodes comprises a first electrode arranged on the first surface and a second electrode arranged on the second surface. The second pair of electrodes is arranged to shear the piezo material. The first pair of electrodes is arranged to elongate the piezo material in a third direction perpendicular to the first direction and second direction. The first electrode is divided into at least two parts and is arranged to rotate the first surface and the second surface relatively to each other about the first direction wherein the piezo actuator is arranged to support the substrate.

A photomask clamping device includes a clamping assembly, a frame body and a handle, where the clamping assembly is provided on the frame body, and is used to clamp a side of a photomask; a connecting portion is provided in the middle of one side of the frame body; the handle is rotatably connected to the connecting portion, and is provided with a first drive mechanism; and the first drive mechanism is connected to the connecting portion, and is used to drive the connecting portion to rotate. When it is necessary to deal with a problem on the surface of a photomask, the clamping assembly is used to clamp a side of the photomask, and the handle is held to take the photomask out of a container.

The invention relates to an actuator device for use in a positioning system, wherein the actuator device is linearly movable within a plane with respect to a supporting structure of the positioning system as well as such a positioning system implementing such an actuator device.

In an example of the actuator device according to the invention, it comprises a carrier having a longitudinal and a transversal dimension; and multiple groups of coil assemblies mounted in the carrier, each group of coil assemblies being structured to orientate the carrier in at least one degree of freedom.

The single design actuator device according to the invention has limited constructional dimensions and allows high accuracy as to motion and position in multiple degrees of freedom.

The invention provides a magnet assembly for a planar electromagnetic motor, the magnet assembly comprising:—a first plurality of superconductive (SC) coils, inside an outer circumference and arranged in a planar pattern such as a rectangular pattern,—a second plurality of SC coils, arranged along an outer boundary of the planar pattern, a coil of the first plurality of SC coils having a first in-plane shape and a coil of the second plurality of SC coils having a second in-plane shape, different from the first in-plane shape, wherein the second plurality of SC coils is arranged at least partly inside the outer circumference.