Substrate tables for lithography and methods of handling a substrate. In one arrangement, a substrate table includes one or more membranes. An actuation system deforms each membrane to change a height of a portion of the membrane. In another arrangement, a substrate table includes one or more membranes and a clamping system for clamping a substrate to the substrate table, wherein the clamping deforms each membrane by pressing the substrate against the membrane.

The invention provides an assembly comprising a cryostat (6, 7, 8, 9) and a flat coil layer (3) of superconducting coils (2) for use with a magnetic levitation and/or acceleration motor system (1) of a lithographic apparatus. The cryostat comprises two insulation coverings (8, 9). The coil layer is arranged between the two coverings. The coverings each comprise an inner plate (10) configured to be cryocooled and an outer plate (11) parallel to the inner plate, and an insulation system with a vacuum layer (13) between the inner and outer plate. The insulation system of said covering comprises a layer of circular bodies (101), the central axes of these bodies extending perpendicular to the inner and outer plate, and is configured to provide a layer of point contacts between two layers of circular bodies or between a layer of circular bodies and the inner and/or outer plate.

A magnetic gravity compensator comprises a stator (1), a rotor (2), a base (4) and an adjustment mechanism (6). The stator (1) is disposed on the base (4), and the rotor (2) is levitated with respect to the stator (1). The stator (1) comprises a central cylindrical magnet (11) that is fixed to the base (4) by the adjustment mechanism (6) and consists of at least two arc magnets (111). The adjustment mechanism (6) has a first end fixed to the base (4) and a second end securely connected to the at least two arc magnets (111). The adjustment mechanism (6) is configured to drive the at least two arc magnets (111) to synchronously move radially with respect to a central axis of the central cylindrical magnet (11) so as to change a magnetic circuit between the central cylindrical magnet (11) and the rotor (2), and thereby adjust a magnetic levitation force between the stator (1) and the rotor (2).

An optical assembly of a microlithography imaging device comprises a holding device for holding an optical element. The holding device has a holding element having first and second interface sections. The first interface section for a first interface connecting the holding element and the optical element in an installed state. The second interface section forms a second interface connecting the holding element and a support unit in the installed state. The support unit connects the optical element to a support structure to support the optical element on the support structure via a supporting force. The holding device comprises an actuator device engaging on the holding element between the first and second interfaces. The actuator device acts on the holding element via a controller so that a specifiable interface deformation and/or a specifiable interface force distribution acting on the optical element is set on the first interface.

The present invention provides an exposure apparatus for performing scanning exposure on each of a plurality of shot regions in a substrate, comprising: a stage configured to hold the substrate; a driver configured to drive the stage; and a controller configured to control the scanning exposure on each of the plurality of shot regions while controlling the driver in accordance with a driving profile, wherein the driving profile includes a first section in which the stage is driven at a constant acceleration in a first direction, a second section in which the stage is driven at a constant acceleration in a second direction opposite to the first direction, and a connection section connecting the first section and the second section, and a period in which the scanning exposure is performed includes at least a part of the connection section.

The present invention provides a control method of a driving apparatus that repeatedly performs a process of driving a target object in a predetermined range by a linear motor, wherein the linear motor includes a stator in which a plurality of coils are arrayed, and a mover provided with the target object, the control method comprising: changing a position of the stator with respect to the predetermined range at an arbitrary timing; and determining, in accordance with the changed position of the stator, output ratios of the plurality of coils in the process.

The present invention provides a stage driving apparatus for driving a stage, the apparatus comprising: a linear motor including a stator having a plurality of coils arrayed along a driving direction of the stage, and a mover provided with the stage; and a controller configured to control the linear motor, wherein the mover includes a permanent magnet provided on one of an upper side and a lower side of the plurality of coils, and an electromagnet provided on the other, the stator includes a yoke member provided to cover the electromagnet side of the plurality of coils, and the controller controls driving of the stage in the driving direction while floating the mover relative to the stator by controlling energization to the plurality of coils and the electromagnet.

A stage apparatus includes a surface plate as well as a guide shaft fixedly secured to the surface plate, a drive member moving along the guide shaft, and a hydrostatic fluid bearing that forms fluid films in the gap portion between the guide shaft and the drive member. The apparatus further includes: a positional deviation detection section—for detecting a relative positional deviation which occurs between the guide shaft and the drive member and which affects the thickness dimensions of the fluid films; and a state decision section for making a decision on the condition of the apparatus itself based on the positional deviation detected by the detection section and outputting information responsive to the decision.

An actuator comprises a coil, a first cooling plate and a second cooling plate. The cooling plates are configured to cool the coil. The first and second cooling plates are arranged at opposite sides of the coil to be in thermal contact with the coil. The coil comprises a first coil part and a second coil part, the first coil part facing the first cooling plate and the second coil part facing the second cooling plate, the first and second coil parts being separated by a spacing there between. The first cooling plate, the first coil part, the spacing, the second coil part and the second cooling plate form a stacked structure whereby the coil parts are arranged between the cooling plates and the spacing is arranged between the coil parts. The actuator further comprises a filling element arranged in the spacing. The filling element to push the first coil part towards the first cooling plate and to push the second coil part towards the second cooling plate.

A substrate processing apparatus includes a holder configured to hold, within a processing container, a substrate having a pattern formed of a resist material for EUV lithography on a surface thereof, a rotation driving part configured to rotate the holder, and a light source part including a plurality of light sources configured to emit light to the surface of the substrate held by the holder rotated by the rotation driving part such that a number of rotations of the substrate is 0.5 rpm to 3 rpm.