Embodiments of a photolithographic machine with two or more camera systems (i.e., projection lens systems) are described herein. The photolithographic machine may include two or more cameras independently operated and controlled for exposing integrated circuit, flat panel display, and other substrates used in manufacturing semiconductor electronics. The cameras may be independently controlled to move laterally in the x-axis (i.e., not fixed). The independent control can include movement, focusing, tilt, reticle position, among other things.

The present disclosure relates to apparatus and methods for performing maskless lithography processes. A substrate rocessing apparatus includes a slab with a plurality of guiderails coupled to and extending along the slab. A first shuttle is disposed on the plurality of guiderails, a second shuttle is disposed on the first shuttle, and a metrology bar is coupled to the second shuttle. The etrology bar includes a first plurality of sensors coupled to the metrology bar. A second plurality of sensors coupled to the metrology bar are disposed laterally inward of the first plurality of sensors.

Embodiments of the present invention provide a roll-to-roll exposure system having a reference mark array and alignment scope units for precisely measuring the position and orientation of an object on a flexible multilayered circuit film. A roll-to-roll exposure system according to an exemplary embodiment of the present invention includes: a plurality of rolls configured to move a flexible multilayered circuit film having an object positioned thereon; alignment scope units positioned so as to be spaced apart from each other and proximate to the rolls; and at least one exposure unit positioned so as to be spaced proximate to the rolls and spaced apart from sides of the alignment scope units, in which one of the rolls has a reference mark array on its surface.

An exposure apparatus includes: a projection optical system; an adjusting unit configured to adjust imaging characteristics of the projection optical system; and a controller configured to divide the plurality of shot regions into groups based on data of a shift in the pattern of each shot region and an order of the exposure, determine setting amounts of the imaging characteristics for each group, and control the adjusting unit to set the imaging characteristics to the setting amounts for each group. The setting amount is common to a plurality of shot regions in the group and varies among the groups. The controller performs the division such that the shot regions belonging to the same group have a sequential exposure order and all values of the shift in the shot regions belonging to the same group fall within a predetermined range.

A reticle shape regulation device includes: an adsorption device having an upper surface and a lower surface; and a limit mechanism having a limit surface. The adsorption device is movable relative to the limit mechanism at least in a vertical direction. The upper surface of the adsorption device faces toward and is engagable with the limit surface. The lower surface of the adsorption device defines a vacuum chamber that is configured for communication with a negative-pressure source so as to adsorb the reticle by a negative pressure. The lower surface of the adsorption device further defines at least one positive-pressure outlet that is in communication with a positive-pressure source and is configured to supply a continuous positive-pressure air flow between the lower surface of the adsorption device and the reticle during the adsorption of the reticle. The positive-pressure air flow is so controlled as to form an air cushion between the lower surface of the adsorption device and the reticle while allowing the adsorption of the reticle by the adsorption device. This can correct deformations of the reticle, thus enabling satisfactory flatness thereof during an exposure process, and can easily create vacuum and an air cushion between a deformed reticle and the adsorption device.

A drawing method for drawing a wiring pattern on a substrate is provided. The wiring pattern includes first regions, in which a pattern in the width direction of the substrate changes in the longitudinal direction of that, and second regions, in which a pattern in the width direction does not change in the longitudinal direction. The drawing data includes two-dimensional image data representing a two-dimensional pattern of the first regions, one-dimensional image data representing a one-dimensional pattern in the width direction of the second regions, and information representing lengths of the second regions. The method includes: drawing the pattern of the first regions by scanning the beam based on the two-dimensional image data and conveying the substrate; and drawing the pattern of the second regions by irradiating the substrate with the beam based on the one-dimensional image data and conveying the substrate based on the information representing lengths.

A method of manufacturing a photomask including the steps of receiving initial photomask design data associated with one or more patterns to be formed on a photomask and optimizing the initial photomask design data to minimize printing exposure energy while maintaining an acceptable pattern quality and size. In embodiments, the step of optimizing includes setting minimization of printing exposure energy as a priority design rule, setting optimization of pattern quality and size as a secondary design rule, iterating size of mask design features to determine a range of size biases that satisfy both the priority and secondary design rules so as to provide an initial optimized mask design, and adjusting mask variables over the range of size biases to determine mask variables that further optimize the initial optimized mask design to obtain a final optimized mask design.

A liquid crystal exposure apparatus that irradiates a substrate held by a substrate holder which moves along an XY plane with an illumination light via an optical system while the substrate holder moves in the X-axis direction, has; a scale measured based on movement of the substrate holder in the X-axis direction, heads that measure the scale while relatively moving in the X-axis direction with respect to the scale, a plurality of scales arranged at mutually different positions in the X-axis direction measured based on movement of the substrate holder in the Y-axis direction, and a plurality of heads provided for each scale that measures the scales while relatively moving in the Y-axis direction with respect to the scales based on movement of the substrate in the Y-axis direction.

A calibration system includes: an optical system that is provided insertably into and removably from an optical path of the beam that is emitted from the exposure head and enters the exposure surface, the optical system guiding the beam in a direction different from that of the optical path when the optical system is inserted into the optical path; a movement mechanism that inserts and removes the optical system into and from the optical path; and an optical sensor having a light-receiving surface for receiving the beam that is guided by the optical system when the optical system is inserted into the optical path, the optical sensor outputting a detection signal by detecting an irradiation position and an irradiation intensity at the light-receiving surface of the beam that has entered the light-receiving surface.

An exposure device that draws a pattern on a substrate by shining a beam from a light source device on substrate and scanning the beam in a main scanning direction while varying the intensity of beam according to pattern information, including: a scanning unit having a beam scanning unit that includes a polygonal mirror whereby the beam is oriented to scan the beam, and light detector for photoelectric detection of reflected light generated when beam is shined on substrate; an electro-optical element for controlling the beam's intensity modulation according to pattern information such that at least part of second pattern to be newly drawn is drawn on top of at least part of first pattern formed on substrate; and a measurement unit measuring relative positional relationship between the first and second pattern on the basis of a detection signal output by the detector while second pattern is drawn on substrate.