An exposure apparatus exposes a substrate with an illumination light via a projection optical system. The apparatus has a base member supported via a first isolating member below the projection optical system; a stage arranged on the base member, and having a holder configured to support the substrate; a metrology frame supported via a second isolating member; a drive system to drive the stage on the base member; a plurality of grating portions on the metrology frame and arranged substantially parallel to a predetermined plane orthogonal to an optical axis of the projection optical system above the stage; an encoder system on the stage and configured to obtain position information of the stage; and a controller configured to control the drive system based on the position information obtained by the encoder system.

A processing apparatus includes a first structure supported by a vibration reduction mechanism, a drive mechanism supported by the first structure and configured to drive an object to be processed, a second structure supported by the first structure and facing the object, an actuator configured to apply a force to the first structure, a sensor configured to detect a vibration of the second structure, and a controller configured to feedforward-control the actuator based on feedforward control information so as to reduce vibrations of the first structure and the second structure. The feedforward control information includes first control information determined in advance based on an output from the sensor.

An arrangement of a microlithographic optical imaging device includes first and supporting structures. The first supporting structure supports an optical element of the imaging device. The first supporting structure supports the second supporting structure via supporting spring devices of a vibration decoupling device. The supporting spring devices act kinematically parallel to one another between the first and second supporting structures. Each supporting spring device defines a supporting force direction and a supporting length along the supporting force direction. The second supporting structure supports a measuring device configured to measure the position and/or orientation of the optical element in relation to a reference in at least one degree of freedom and up to all six degrees of freedom in space. A creep compensation device compensates a change in a static relative situation between the first and second supporting structures in at least one correction degree of freedom.

An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame.

A lithographic apparatus comprises a projection system comprising position sensors to measure a position of optical elements of the projection system. The positions sensors are referenced to a sensor frame. Damping actuators damp vibrations of the sensor frame. A control device drives the actuators and is configured to derive sensor frame damping force signals from at least one of the acceleration signals and the sensor frame position signals, derive an estimated line of sight error from the position signals, determine actuator drive signals from the sensor frame damping force signals and the estimated line of sight error, drive the actuators using the actuator drive signals to dampen the sensor frame and to at least partly compensate the estimated line of sight error.

A fluid handling system that includes a liquid confinement structure configured to confine immersion liquid to a space between at least a part of the liquid confinement structure and a surface of a substrate. The fluid handling system also includes a mechanism configured to vibrate a vibration component in contact with the immersion liquid.

An arrangement of a microlithographic optical imaging device includes first and second supporting structures. The first supporting structure supports an optical element of the imaging device. The first supporting structure supports the second supporting structure via supporting spring devices of a vibration decoupling device. The supporting spring devices act kinematically parallel to one another between the first and second supporting structures. Each of the supporting spring devices defines a supporting force direction and a supporting length along the supporting force direction. The second supporting structure supports a measuring device which measures the position and/or orientation of the at least one optical element in relation to a reference in at least one degree of freedom up to all six degrees of freedom in space. A reduction device reduces a change in a static relative situation between the first and second supporting structures in at least one correction degree of freedom.

A stage apparatus includes a movable body having a first support surface for supporting an object, a support portion that is elastically deformable, has a predetermined thickness, and supports the movable body, a support device having a second support surface that supports the support portion, and a drive unit configured to move the movable body so that an angle between the first support surface and the second support surface is changed, wherein the support portion elastically deforms so that the predetermined thickness at a first side where an interval between the first support surface and the second support surface is narrow becomes small and the predetermined thickness at a second side where the interval between the first support surface and the second support surface is wide becomes large in accordance with a change in the angle caused by the drive unit to support the movable body.

An assembly, for example in a microlithographic projection exposure apparatus, comprises an optical element and a joint arrangement for mechanically bearing the optical element. The joint arrangement comprises at least one connecting element secured on the optical element. The mass of the connecting element is distributed over its length so that the moment of inertia of the connecting element is increased in comparison with a connecting element of identical mass and length in which the mass is distributed uniformly over the length.

A passive flow induced vibration reduction system for use in a temperature conditioning system that controls the temperature of at least one component within a lithographic apparatus. This FIV reduction system includes: a conduit that provides a flow path for a liquid through the system; a liquid filled cavity in fluid connection with the conduit, wherein the fluid connection is provided via one or more openings in the wall of the conduit; a membrane configured such that it separates the liquid in the liquid filled cavity from a gas at a substantially ambient pressure and the membrane is configured such that compliance of the membrane reduces at least low frequency flow induced vibrations in the liquid flowing through the conduit; and an end-stop located on the gas side of the membrane, wherein the end-stop is configured to limit an extent of deflection of the membrane.