A pressure control device has at least two switching valves (10, 12), a feedback control unit (14), a sensor unit (20), and a voltage supply unit (24), and continuously adjusts hydraulic systems.

A method for controlling and/or monitoring a compressor system is provided. The compressor system includes one or more compressors and one or more peripheral devices. The compressors and the peripheral devices are arranged or connected in a predetermined configuration. The compressor system is controlled and/or monitored by a control/monitoring unit. After creation of the compressor system, the concretely existing configuration is input in the form of a P&I diagram by an editor and forms the basis for subsequent control, monitoring, diagnosis or evaluation routines.

A method of mixing at N gases is provided. This method includes providing N gas flow meters, including N gas flows, wherein N is 3 or more. Measuring each of the N gas flows, at first predetermined intervals of time, and totaling each of the measured N flows over a second predetermined interval of time. Adding the N measured gas flows, thereby determining the total gas flow at the second predetermined interval of time. Dividing the total gas flow for each of the N gas flows by the total gas flow, thereby determining a cumulative calculated theoretical percentage for each of the N gas flows over the second predetermined interval of time. And sounding an alarm, and/or terminating the N gas flows, if the cumulative calculated theoretical percentage for any of the N gas flows exceeds a predetermined range value.

Another method of mixing at least two gases is provided. This method includes providing a mixture composition control, comprising a predetermined composition input and a composition trim input. Providing N gas flow meters, wherein N is 3 or more. Configuring the N flow meters to adjust the N gas flows to maintain the line pressure at a predetermined value, while maintaining the predetermined composition. Adding the N measured gas flow, thereby determining the total gas flow at the first predetermined intervals of time. Adjusting the composition trim input to vary the composition of the mixed gas, without modifying the predetermined composition input. And sounding an alarm, and/or terminating both the N gas flows, if either of the following exceed a predetermined range value: the instantaneous calculated theoretical percentage for any of the N gas flows, or the cumulative calculated theoretical percentage for any of the N gas flows.

A method of mixing at least two gases is provided. This method includes providing a mixture composition control, including a predetermined composition input and a composition trim input. Providing N gas flow meters, including a N gas flows, and N desired gas flow rates determined by the mixture composition control, wherein N is 3 or more. Mixing the N gas flows, thereby producing a mixed gas flow at the predetermined composition and at a line pressure. Configuring the N flow meters to adjust the N gas flows to maintain the line pressure at a predetermined value, while maintaining the predetermined composition. And adjusting the composition trim input to vary the composition of the mixed gas, without modifying the predetermined composition input.

A method for controlling and/or monitoring a compressor system is provided. The compressor system includes one or more compressors and one or more peripheral devices. The compressors and the peripheral devices are arranged or connected in a predetermined configuration. The compressor system is controlled and/or monitored by a control/monitoring unit. After creation of the compressor system, the concretely existing configuration is input in the form of a P&I diagram by an editor and forms the basis for subsequent control, monitoring, diagnosis or evaluation routines.

A gas pressure within a treatment chamber 2 can be more accurately regulated to a predicted target pressure whereby there can be provided a pressure control apparatus which can easily and speedily regulate the gas pressure for various combination of the treatment chamber 2, a sanction chamber 3 and a valve 4. A required inflow rate (Qi) at which it is necessary for gas to flow into the treatment chamber 2 in order to reach a preset target pressure (Psp) within the treatment chamber is calculated on the basis of the expression of Qi=Qo+(P/t)V and the thus calculated required inflow rate (Qi) is flown into the treatment chamber 2 to control the pressure within the treatment chamber 2 to the required pressure (Psp). In calculation of a current predicted outflow rate (Qo(n)) at which gas is discharged from the treatment chamber on the basis of the expression Qo(n)=P2*f1(P2), using a current pressure (P2) within the suction pump and a known characteristic suction rate (Sp=f1(P2)) of the suction pump under prescribed pressure, the current pressure (P2) within the suction pump is calculated according to the expression P2=P1(Qo(n1)/f2(, P)) from an accurate conductance (Cv(, P)=f2(, P)) calculated by adding the error between the current pressure (P1) actually measured within the treatment chamber and a known specified pressure (P) within the treatment chamber at the characteristic conductance (Cv=f2()) of the valve at the opening/closing angle () associated with the current position of the switching plate of the valve to the known characteristic conductance (Cv=f2()) of the valve at the opening/closing angle () associated with the current position of the switching plate of the valve, and the current predicted outflow rate Qo(n) at which gas is discharged from the treatment chamber is calculated.

A method for controlling and/or monitoring a compressor system is provided. The compressor system includes one or more compressors and one or more peripheral devices. The compressors and the peripheral devices are arranged or connected in a predetermined configuration. The compressor system is controlled and/or monitored by a control/monitoring unit. After creation of the compressor system, the concretely existing configuration is input in the form of a P&I diagram by an editor and forms the basis for subsequent control, monitoring, diagnosis or evaluation routines.

A gas pressure within a treatment chamber 2 can be more accurately regulated to a predicted target pressure whereby there can be provided a pressure control apparatus which can easily and speedily regulate the gas pressure for various combination of the treatment chamber 2, a sanction chamber 3 and a valve 4. A required inflow rate (Qi) at which it is necessary for gas to flow into the treatment chamber 2 in order to reach a preset target pressure (Psp) within the treatment chamber is calculated on the basis of the expression of Qi=Qo+(P/t)V and the thus calculated required inflow rate (Qi) is flown into the treatment chamber 2 to control the pressure within the treatment chamber 2 to the required pressure (Psp). In calculation of a current predicted outflow rate (Qo(n)) at which gas is discharged from the treatment chamber on the basis of the expression Qo(n)=P2*f1(P2), using a current pressure (P2) within the suction pump and a known characteristic suction rate (Sp=f1(P2)) of the suction pump under prescribed pressure, the current pressure (P2) within the suction pump is calculated according to the expression P2=P1(Qo(n1)/f2(, P)) from an accurate conductance (Cv(, P)=f2(, P)) calculated by adding the error between the current pressure (P1) actually measured within the treatment chamber and a known specified pressure (P) within the treatment chamber at the characteristic conductance (Cv=f2()) of the valve at the opening/closing angle () associated with the current position of the switching plate of the valve to the known characteristic conductance (Cv=f2()) of the valve at the opening/closing angle () associated with the current position of the switching plate of the valve, and the current predicted outflow rate Qo(n) at which gas is discharged from the treatment chamber is calculated.

A method for controlling and/or monitoring a compressor system is provided. The compressor system includes one or more compressors and one or more peripheral devices. The compressors and the peripheral devices are arranged or connected in a predetermined configuration. The compressor system is controlled and/or monitored by a control/monitoring unit. After creation of the compressor system, the concretely existing configuration is input in the form of a P&I diagram by an editor and forms the basis for subsequent control, monitoring, diagnosis or evaluation routines.