In one embodiment, a gas supply line is connected to a chamber of a substrate processing apparatus. A vaporizer is connected to the gas supply line. A flow rate controller is connected to the gas supply line in parallel with the vaporizer through a secondary valve. A primary valve is provided on a primary side of the flow rate controller. A method of the embodiment includes supplying a processing gas to the chamber from the vaporizer through the gas supply line in a state in which the primary valve is closed, the secondary valve is opened, and an exhaust device is operated to set a pressure of the chamber to a predetermined pressure and determining a time-average value of a measurement value obtained by a pressure sensor of the flow rate controller while the supplying the processing gas is performed.

In one embodiment, a vaporizer is connected to a chamber of a substrate processing apparatus through a gas supply line and a gas introduction port. An exhaust device is connected to the gas supply line. The substrate processing apparatus includes a pressure sensor that obtains a measurement value of a pressure of the gas supply line. A method according to the embodiment includes supplying a processing gas to the chamber from the vaporizer through the gas supply line, and monitoring a change of the measurement value obtained by the pressure sensor in a state in which supply of the processing gas to the gas supply line is stopped.

A system for controlling pressure of a sealed enclosure such as a glove box or containment vessel, including: a first control circuit configured to keep a current pressure value of the sealed enclosure within an operational pressure range, and configured to isolate the sealed enclosure and to transmit a primary alarm signal in event of current pressure value reaching one or other of primary limits of a degradation range; an independent secondary safety circuit separate from the primary circuit, the secondary safety circuit configured to isolate the sealed enclosure and to transmit a secondary alarm signal when the pressure of the sealed enclosure reaches one or other of secondary limits of an alarm range.

Systems, methods, and apparatuses for a regulator are provided. The regulator includes a reducing valve, an accumulator, an accumulator line, and a regulated line. The reducing valve is operable between a closed position and an open position. The reducing valve includes a first opening inlet configured to receive fluid to bias the reducing valve towards the open position, a first closing inlet configured to receive fluid to bias the reducing valve towards the closed position, and a first spring configured to transmit a first spring force to the reducing valve to bias the reducing valve towards the closed position. The accumulator is configured to store fluid at a first pressure. The accumulator line is configured to receive fluid from the accumulator and to provide the fluid to the first opening inlet at the first pressure. The regulated line is connected to the first closing inlet at a second pressure. The reducing valve transitions from the closed position to the open position when a first force created by the first pressure on the reducing valve is greater than a sum of the first spring force, a first tolerance, and a second force created by the second pressure on the reducing valve.

Animal drinking troughs have pressure reducers for reducing the higher pressure of the liquid supply to a low liquid pressure for supplying the animal drinking troughs. For various reasons, it is desired to change the reduced pressure. This takes place by adjustment of the pressure reducers. It is known to undertake such an adjustment with compressed air. This requires a separate compressed air source and a corresponding pipe system. The invention makes provision to adjust the pressure reducer hydraulically by means of the higher pressure of the liquid of the liquid supply. The energy required for adjusting the pressure reducers thereby provides the liquid pressure of the liquid supply. As a result, the pressure reducers according to the invention operate autonomously. A separate energy source for adjusting the pressure reducers is not required.

Pressure control systems and methods are provided that aid in the control of fluidic or pneumatic devices, by improving the ability to control pressure independently and simultaneously on multiple channels, which in turn permits pressure changes on the channels to occur more quickly and more precisely. In order to match rise/fall times between steps on different channels that may be of different magnitudes, various embodiments slow down fast steps such that they match the default rate of slower steps, such as by using a step partitioning method or breaking a single step into substeps with a pause inserted between substeps of necessary duration such that the complete step time matches the target step time. The provided systems and methods may utilize a combination of proportional-integral-derivative (PID) control loop and discrete pressure steps to achieve faster, more accurate control over pressure rises and pressure falls.

A vacuum valve placed between a vacuum vessel and a vacuum pump to adjust a valve opening degree using an operating fluid includes a packing mounted in a recessed groove of a piston. The packing is provided with a contact portion on a radially inner side and a contact portion on a radially outer side, and a slide-contact portion contacting with an inner peripheral surface of a cylinder. A portion between the contact portion and the slide-contact portion has a thin thickness.

An intelligent pressure regulator in a process control system is controlled according to a profile constructed by a user on a computer connected to the device. The profile is a multi-step command sequence. The profile includes at least one conditional statement and, optionally, at least one branching statement. That is, the profile includes at least one statement that, depending on whether the statement is true or false, causes the device to execute a first command or a second command, respectively. The profile may also include a statement (e.g., a goto statement) that causes the device to skip one or more commands in the profile.

In one embodiment, a gas supply line is connected to a chamber of a substrate processing apparatus. A vaporizer is connected to the gas supply line. A flow rate controller is connected to the gas supply line in parallel with the vaporizer through a secondary valve. A primary valve is provided on a primary side of the flow rate controller. A method of the embodiment includes supplying a processing gas to the chamber from the vaporizer through the gas supply line in a state in which the primary valve is closed, the secondary valve is opened, and an exhaust device is operated to set a pressure of the chamber to a predetermined pressure and determining a time-average value of a measurement value obtained by a pressure sensor of the flow rate controller while the supplying the processing gas is performed.

In one embodiment, a vaporizer is connected to a chamber of a substrate processing apparatus through a gas supply line and a gas introduction port. An exhaust device is connected to the gas supply line. The substrate processing apparatus includes a pressure sensor that obtains a measurement value of a pressure of the gas supply line. A method according to the embodiment includes supplying a processing gas to the chamber from the vaporizer through the gas supply line, and monitoring a change of the measurement value obtained by the pressure sensor in a state in which supply of the processing gas to the gas supply line is stopped.