A charged particle beam device includes: a charged particle beam source; an analyzer that analyzes and detects particles including secondary electrons and backscattered charged particles that are emitted from a specimen by irradiating the specimen with a primary charged particle beam emitted from the charged particle beam source; a bias voltage applying unit that applies a bias voltage to the specimen; and an analysis unit that extracts a signal component of the secondary electrons based on a first spectrum obtained by detecting the particles with the analyzer in a state where a first bias voltage is applied to the specimen, and a second spectrum obtained by detecting the particles with the analyzer in a state where a second bias voltage different from the first bias voltage is applied to the specimen.

A charged particle beam device includes: a charged particle beam source; an analyzer that analyzes and detects particles including secondary electrons and backscattered charged particles that are emitted from a specimen by irradiating the specimen with a primary charged particle beam emitted from the charged particle beam source; a bias voltage applying unit that applies a bias voltage to the specimen; and an analysis unit that extracts a signal component of the secondary electrons based on a first spectrum obtained by detecting the particles with the analyzer in a state where a first bias voltage is applied to the specimen, and a second spectrum obtained by detecting the particles with the analyzer in a state where a second bias voltage different from the first bias voltage is applied to the specimen.

A charged particle beam apparatus that forms a probe with a charged particle beam and scans a specimen with the probe to acquire a scanning image. The charged particle beam apparatus includes an optical system for scanning the specimen with the probe; a detector that detects a signal generated from the specimen through the scanning of the specimen with the probe; and a control unit that controls the optical system. The control unit performs correction processing of acquiring a reference image obtained by the scanning of the specimen with the probe, comparing the reference image to a criterion image to determine a drift amount, and correcting a displacement of an irradiation position with the probe on the specimen based on the drift amount; and processing of setting a frequency with which the correction processing is to be performed based on the drift amount.

An Auger electron microscope includes a processing unit, and the processing unit performs processing of: acquiring an actually measured Auger spectrum obtained by measuring a test specimen containing an analysis target element; acquiring a plurality of first standard Auger spectra obtained by measuring a plurality of standard specimens each containing the same analysis target element but in different chemical states; calculating, based on a test specimen measurement condition that is a measurement condition when the test specimen has been measured and a standard specimen measurement condition that is a measurement condition when the standard specimens have been measured, a plurality of second standard Auger spectra under the test specimen measurement condition from the plurality of first standard Auger spectra; and performing curve fitting calculation of the actually measured Auger spectrum by using the plurality of calculated second standard Auger spectra.

A charged particle beam device includes: a charged particle beam source; an analyzer that analyzes and detects particles including secondary electrons and backscattered charged particles that are emitted from a specimen by irradiating the specimen with a primary charged particle beam emitted from the charged particle beam source; a bias voltage applying unit that applies a bias voltage to the specimen; and an analysis unit that extracts a signal component of the secondary electrons based on a first spectrum obtained by detecting the particles with the analyzer in a state where a first bias voltage is applied to the specimen, and a second spectrum obtained by detecting the particles with the analyzer in a state where a second bias voltage different from the first bias voltage is applied to the specimen.

An Auger electron microscope includes a processing unit, and the processing unit performs processing of: acquiring an actually measured Auger spectrum obtained by measuring a test specimen containing an analysis target element; acquiring a plurality of first standard Auger spectra obtained by measuring a plurality of standard specimens each containing the same analysis target element but in different chemical states; calculating, based on a test specimen measurement condition that is a measurement condition when the test specimen has been measured and a standard specimen measurement condition that is a measurement condition when the standard specimens have been measured, a plurality of second standard Auger spectra under the test specimen measurement condition from the plurality of first standard Auger spectra; and performing curve fitting calculation of the actually measured Auger spectrum by using the plurality of calculated second standard Auger spectra.

A charged particle beam device acquires an image by scanning a specimen with a probe formed from a charged particle beam and detects a signal emitted from the specimen. The charged particle beam device includes an optical system that forms the probe; a control unit that repeatedly performs correction processing and image acquisition processing for acquiring a frame image; and an image processing unit that generates an image of the specimen based on a plurality of the frame images. In the correction processing, the control unit acquires a reference image, and corrects the shifting of the irradiation position of the probe. The image processing unit acquires position shift information, corrects a position shift between the frame images based on the position shift information, and generates an image of the specimen based on the plurality of corrected frame images.

Provided is a compact two-dimensional electron spectrometer that is capable of variably adjusting the deceleration ratio over a wide range, and performing simultaneous measurement of the two-dimensional emission angle distribution with a high energy resolution over a wide solid angle of acquisition. The two-dimensional electron spectrometer is configured from: a variable deceleration ratio spherical aberration correction electrostatic lens; a cylindrical mirror type energy analyzer or a wide angle energy analyzer; and a projection lens. The variable deceleration ratio spherical aberration correction electrostatic lens is configured from: an electrostatic lens that consists of an axially symmetric spherical mesh having a concave shape with respect to a point source, and one or a plurality of axially symmetrical electrodes, and that adjusts the spherical aberration of charged particles generated from the point source; and an axially symmetric deceleration field generating electrode that is placed coaxially with the electrostatic lens.

An immersion objective lens is configured below a stage such that multiple detectors can be configured above sample for large beam current application, particularly for defect inspection. Central pole piece of the immersion objective lens thus can be provided that a magnetic monopole-like field can be provided for electron beam. Auger electron detector thus can be configured to analyze materials of sample in the defect inspection.

An electron spectrometer is provided which can collect spectra in a reduced measurement time. The electron spectrometer includes an electron analyzer for providing energy dispersion of electrons emitted from a sample (S), a detector having a plurality of detection elements juxtaposed and arranged in the direction of energy dispersion of the dispersed electrons, and a processor. The processor operates (i) to sweep a measurement energy in first incremental energy steps (E.sub.1) within the analyzer, to detect the dispersed electrons with the detection elements, and to obtain a plurality of resulting first spectra; (ii) to interpolate points of measurement in each of the first spectra; and (iii) to generate a spectral chart in second incremental energy steps (E.sub.2) smaller than the first incremental energy steps (E.sub.1) on the basis of the first spectra for which the points of measurement have been interpolated.