H01J2237/2803

Systems and methods of determining aberrations in images obtained by a charged-particle beam tool
20220328282 · 2022-10-13 · ·

A method of determining aberrations in images obtained by a charged-particle beam tool, comprising: a) obtaining two or more images of a sample, wherein each image is obtained at a known relative difference in a measurement condition of the charged-particle beam tool; b) selecting an estimated aberration parameter for the aberrations of a probe profile representing the charged-particle beam used by the charged-particle beam tool; c) evaluating an error function indicative of the difference between the two or more images and two or more estimated images that are a function of the estimated aberration parameter and the known relative difference in the measurement condition; d) updating the estimated aberration parameter; e) performing processes c) and d) iteratively; f) determining the final aberration parameter as the estimated aberration parameter that provides the smallest value of the error function.

CHARGED PARTICLE BEAM DEVICE

A charged particle beam device includes a plurality of detectors configured to detect one or more signal charged particle beams caused by irradiation on a sample with one or more primary charged particle beams, and a control system. The control system is configured to measure an intensity distribution of the one or more signal charged particle beams detected by the plurality of detectors, and correct the intensity distribution by using a correction function. The control system is configured to generate an image based on the corrected intensity distribution.

Method Of Imaging And Milling A Sample

The invention relates to method of milling and imaging a sample. The method comprises the step of providing an imaging system, as well as a milling beam source. The method comprises the steps of milling, using a milling beam from said milling beam source, a sample to remove a layer of the sample; and imaging, using said imaging system, an exposed surface of the sample. As defined herein, the method further comprises the step of determining a relative position of said sample, and using said determined relative position of said sample in said milling step for positioning said sample relative to said milling beam. The relative position of said sample can be a working distance with respect to the imaging system, which can be determined by means of an autofocus procedure.

METHOD AND APPARATUS FOR ENERGY SELECTIVE DIRECT ELECTRON IMAGING
20230145436 · 2023-05-11 · ·

A method of, and a detector for, performing energy sensitive imaging of ionizing radiation are provided, including acquiring a first frame having a plurality of pixels, each pixel of the plurality having an energy of detection and a location; grouping, into a cluster, pixels of the plurality having an energy of detection above a predetermined threshold and a location along with at least one other pixel also having an energy of detection above the predetermined threshold and being within a predetermined distance of the location; summing the energy of detection of all pixels within the grouped cluster to determine a cluster energy; determining a location of the cluster based on a distribution and an intensity of the summed energy of detection; and generating an image of the cluster based on the determined cluster energy and the determined location of the cluster.

INTERFERENCE SCANNING TRANSMISSION ELECTRON MICROSCOPE
20230207258 · 2023-06-29 · ·

An interference scanning transmission electron microscope includes an electron source configured to emit an electron beam, a lens configured to irradiate a sample with a converged electron beam, an electron beam bi-prism configured to divide an electron wave through the sample and to superimpose a first electron wave and a second electron wave divided to form an interference fringe, a camera which is a detector configured to detect the interference fringe, and a computer configured to calculate a phase difference between the first electron wave and the second electron wave based on the interference fringe, wherein the electron beam bi-prism is provided between the sample and the detector.

Super-resolution microscopy
11676794 · 2023-06-13 · ·

We describe a super-resolution optical microscopy technique in which a sample is located on or adjacent to the planar surface of an aplanatic solid immersion lens and placed in a cryogenic environment.

Measurement method and electron microscope
09728372 · 2017-08-08 · ·

A measurement method capable of easily measuring the directions of detector segments of a segmented detector relative to a scanning transmission electron microscope (STEM) image is provided. The measurement method is for use in an electron microscope equipped with the segmented detector having a detection surface divided into the detector segments. The measurement method is used to measure the directions of the detector segments relative to the STEM image. The method involves defocusing the STEM image to thereby cause a deviation of the STEM image and measuring the directions of the detector segments relative to the STEM image from the direction of the deviation of the STEM image (step S11).

Charged particle beam device

The scanning charged particle beam microscope according to the present application is characterized in that, in acquiring an image of the FOV (field of view), interspaced beam irradiation points are set, and then, a deflector is controlled so that a charged particle beam scan is performed faster when the charged particle beam irradiates a position on the sample between each of the irradiation points than when the charged particle beam irradiates a position on the sample corresponding to each of the irradiation points (a position on the sample corresponding to each pixel detecting a signal). This allows the effects from a micro-domain electrification occurring within the FOV to be mitigated or controlled.

Image forming method and impedance microscope
11454605 · 2022-09-27 ·

An image forming method includes: arranging a sample between a first main surface of an insulating thin film and a counter electrode, measuring an impedance value by inputting an AC potential signal to the counter electrode, scanning a physical beam while focusing and irradiating a conductive thin film given to cover a second main surface of the insulating thin film with the physical beam to lower an insulation property of the insulating thin film directly below an irradiation position, guiding the AC potential signal to the irradiation position, and forming an image from the impedance value corresponding to the irradiation position.

Methods and systems for acquiring 3D diffraction data
11456149 · 2022-09-27 · ·

Diffraction patterns of a sample at various tilt angles are acquired by irradiating a region of interest using a first charged particle beam. Sample images are acquired by irradiating the region of interest using a second charged particle beam. The first and second charged particle beams are formed by splitting charged particles generated by a charged particle source.