A high-power vacuum electron device source of 10 mm-0.1 mm wavelength radiation is composed of an electron gun joined to a RF vacuum electronic circuit. The electron gun includes a cathode, a focus electrode, and a grid. It generates an electron beam that is injected into the circuit for amplifying RF waves. The circuit is composed of metal circuit plates, e.g., copper alloy, that mate with each other and are shaped to provide a beam tunnel and RF circuit envelopes. Precision alignment pins made of nickel super alloy, are used to mutually align the metal circuit plates using elastic averaging implemented by positioning the precision alignment pins in precision alignment holes in the metal circuit plates. Preferably, the electron gun is aligned with the circuit using quasi-kinematic coupling.

A high-power vacuum electron device source of 10 mm-0.1 mm wavelength radiation is composed of an electron gun joined to a RF vacuum electronic circuit. The electron gun includes a cathode, a focus electrode, and a grid. It generates an electron beam that is injected into the circuit for amplifying RF waves. The circuit is composed of metal circuit plates, e.g., copper alloy, that mate with each other and are shaped to provide a beam tunnel and RF circuit envelopes. Precision alignment pins made of nickel super alloy, are used to mutually align the metal circuit plates using elastic averaging implemented by positioning the precision alignment pins in precision alignment holes in the metal circuit plates. Preferably, the electron gun is aligned with the circuit using quasi-kinematic coupling.

A high-power vacuum electron device source of 10 mm-0.1 mm wavelength radiation is composed of an electron gun joined to a RF vacuum electronic circuit. The electron gun includes a cathode, a focus electrode, and a grid. It generates an electron beam that is injected into the circuit for amplifying RF waves. The circuit is composed of metal circuit plates, e.g., copper alloy, that mate with each other and are shaped to provide a beam tunnel and RF circuit envelopes. Precision alignment pins made of nickel super alloy, are used to mutually align the metal circuit plates using elastic averaging implemented by positioning the precision alignment pins in precision alignment holes in the metal circuit plates. Preferably, the electron gun is aligned with the circuit using quasi-kinematic coupling.

A high-power vacuum electron device source of 10 mm-0.1 mm wavelength radiation is composed of an electron gun joined to a RF vacuum electronic circuit. The electron gun includes a cathode, a focus electrode, and a grid. It generates an electron beam that is injected into the circuit for amplifying RF waves. The circuit is composed of metal circuit plates, e.g., copper alloy, that mate with each other and are shaped to provide a beam tunnel and RF circuit envelopes. Precision alignment pins made of nickel super alloy, are used to mutually align the metal circuit plates using elastic averaging implemented by positioning the precision alignment pins in precision alignment holes in the metal circuit plates. Preferably, the electron gun is aligned with the circuit using quasi-kinematic coupling.

A particle beam device including a magnet, the device including: a particle beam source configured to emit electron and ion beams; a plurality of yokes arranged in a substantially rectangular shape; a coil set including a plurality of coils, wherein windings of the plurality of coils are uniformly distributed across and wound around the plurality of yokes, wherein the coil set is configured to produce both dipole and quadrupole fields, wherein the magnet is configured to deflect and focus electron and ion beams.

A particle beam device including a magnet, the device including: a particle beam source configured to emit electron and ion beams; a plurality of yokes arranged in a substantially rectangular shape; a coil set including a plurality of coils, wherein windings of the plurality of coils are uniformly distributed across and wound around the plurality of yokes, wherein the coil set is configured to produce both dipole and quadrupole fields, wherein the magnet is configured to deflect and focus electron and ion beams.

A particle beam device including a magnet, the device including: a particle beam source configured to emit electron and ion beams; a plurality of yokes arranged in a substantially rectangular shape; a coil set including a plurality of coils, wherein windings of the plurality of coils are uniformly distributed across and wound around the plurality of yokes, wherein the coil set is configured to produce both dipole and quadrupole fields, wherein the magnet is configured to deflect and focus electron and ion beams.

A particle beam device including a magnet, the device including: a particle beam source configured to emit electron and ion beams; a plurality of yokes arranged in a substantially rectangular shape; a coil set including a plurality of coils, wherein windings of the plurality of coils are uniformly distributed across and wound around the plurality of yokes, wherein the coil set is configured to produce both dipole and quadrupole fields, wherein the magnet is configured to deflect and focus electron and ion beams.

A particle beam device including a magnet, the device including: a particle beam source configured to emit electron and ion beams; a plurality of yokes arranged in a substantially rectangular shape; a coil set including a plurality of coils, wherein windings of the plurality of coils are uniformly distributed across and wound around the plurality of yokes, wherein the coil set is configured to produce both dipole and quadrupole fields, wherein the magnet is configured to deflect and focus electron and ion beams.