A detector substrate (or detector array) for use in a charged particle multi-beam assessment tool to detect charged particles from a sample. The detector substrate defines an array of apertures for beam paths of respective charged particle beams of a multi-beam. The detector substrate includes a sensor unit array. A sensor unit of the sensor unit array is adjacent to a corresponding aperture of the aperture array. The sensor unit is configured to capture charged particles from the sample. The detector array may include an amplification circuit associated with each sensor unit in the sensor unit array and proximate to the corresponding aperture in the aperture array. The amplification circuit may include a Trans Impedance Amplifier and/or an analogue to digital converter.

A compact two-dimensional (2D) scanning magnet for scanning ion beams is provided. The compact 2D scanning magnet may include an outer double-helix coil and an inner double-helix coil that is disposed within the outer double-helix coil and is rotated about an axis relative to the outer double-helix coil. The outer double-helix coil may include a first outer coil configured to receive an input electrical current through the first outer coil in a first direction, and a second outer coil configured to receive the input electrical current through the second outer coil in a second direction. The inner double-helix coil may include a first inner coil configured to receive a second input electrical current through the first inner coil in the first direction, and a second inner coil configured to receive the second input electrical current through the second inner coil in the second direction.

A charged particle beam device for irradiating or inspecting a specimen is described. The charged particle beam device includes a charged particle beam source for generating a primary charged particle beam and a multi-aperture lens plate having a plurality of apertures for forming four or more primary. Two or more electrodes having one opening, e.g. having one opening each, for the primary charged particle beam or the four or more primary beamlets are provided. The charged particle beam device further includes a collimator for deflecting a first primary beamlet, a second primary beamlet, a third primary beamlet, and a fourth primary beamlet of the four or more primary beamlets with respect to each other. The charged particle beam device further includes an objective lens unit having three or more electrodes, each electrode having openings for the four or more primary beamlets.

The present disclosure provides an ion implantation method and an ion implanter for realizing the ion implantation method. The above-mentioned ion implantation method comprises: providing a spot-shaped ion beam current implanted into the wafer; controlling the wafer to move back and forth in a first direction; controlling the spot-shaped ion beam current to scan back and forth in a second direction perpendicular to the first direction; and adjusting the scanning width of the spot-shaped ion beam current in the second direction according to the width of the portion of the wafer currently scanned by the spot-shaped ion beam current in the second direction. According to the ion implantation method provided by the present disclosure, the scanning path of the ion beam current is adjusted by changing the scanning width of the ion beam current, so that the beam scanning area is attached to the wafer, which greatly reduces the waste of the ion beam current, improves the effective ion beam current and increases productivity without increasing actual ion beam current.

The present invention has been made in view of the above problems, and an object thereof is to provide a charged particle beam device capable of improving the reproducibility of the magnetic field response of a magnetic field lens and realizing highly-accurate electron orbit control in a short time. A charged particle beam device according to the present invention generates an excitation current of a magnetic field lens by combining a direct current with an alternating current (see FIG. 6A).

Disclosed herein are superconducting gantry magnets that include multiple quadrupole winding sections placed in sequence on a curve such that the effective current direction is reversed between sections. This produces alternating quadrupole field regions along the length of the bend whose individual integral strengths can be tuned by the location of the current polarity transitions. A simple transition scheme to reverse the current between sections can be implemented to allow for the use of one continuous winding and power supply. Dipole windings can be included in the superconducting gantry magnets so that the magnets produce superposed dipole and alternating quadrupole fields. The disclosed design for the windings and transition scheme to reverse current polarity can be implemented for higher order multipoles as well.

A magnet having an annular coolant fluid passage is generally described. Various examples provide a magnet including a first magnet and a second magnet disposed around an ion beam coupler with an aperture there through. The first and second magnets each including a metal core having a cavity therein, one or more conductive wire wraps disposed around the metal core, and an annular core element configured to be inserted into the cavity, wherein an annular coolant fluid passage is formed between the cavity and the annular core element. Furthermore, the annular core element may have a first diameter and a middle section having a second diameter, the second diameter being less than the first diameter. Other embodiments are disclosed and claimed.

A scanning electron microscope comprises three objective lenses, including a distant objective lens and a close objective lens, which are of conventional type, and an immersion objective lens of the immersion type below the distant objective lens and the close objective lens. These three objective lenses can be controlled independently, therefor different combinations of active objective lenses can be achieved. The scanning electron microscope therefore offers various imaging modes. There is a possibility to switch between these imaging modes and therefore, choose the most suitable way of imaging for given application.

The present invention provides an electrode assembly comprising two or more electrodes arranged around a primary axis forming a non-cylindrical channel space. General electronic apparatus/device, particularly apparatus of charged-particle beam such as electron microscope, may use the electrode assembly to create an optimized pattern of electrical field within non-cylindrical channel space. When the electrode assembly is used as a beam deflector in a magnetic objective lens, the electrical field within the central channel space can be co-optimized with the magnetic field for reducing aberration(s) such as distortion, field curvature, astigmatism, and chromatic aberration, after the beam passes through the central channel space.

A charged particle beam irradiation apparatus according to an embodiment includes: a first scanning electromagnet device configured to deflect a charged particle beam to a second direction that is substantially perpendicular to a first direction along which the charged particle beam enters, the first scanning electromagnet device having an aperture on an outlet side larger than that on an inlet side; and a second scanning electromagnet device configured to deflect the charged particle beam to a third direction that is substantially perpendicular to the first direction and the second direction, the second scanning electromagnet device having an aperture on an outlet side larger than that on an inlet side, the first scanning electromagnet device and the second scanning electromagnet device being disposed to be parallel with the first direction.