Patent classifications
H01J37/32825
DEVICE FOR PLASMA TREATMENT OF ELECTRONIC MATERIALS
Plasma applications are disclosed that operate with argon and other molecular gases at atmospheric pressure, and at low temperatures, and with high concentrations of reactive species. The plasma apparatus and the enclosure that contains the plasma apparatus and the substrate are substantially free of particles, so that the substrate does not become contaminated with particles during processing. The plasma is developed through capacitive discharge without streamers or micro-arcs. The techniques can be employed to remove organic materials from a substrate, thereby cleaning the substrate; to activate the surfaces of materials, thereby enhancing bonding between the material and a second material; to etch thin films of materials from a substrate; and to deposit thin films and coatings onto a substrate; all of which processes are carried out without contaminating the surface of the substrate with substantial numbers of particles.
Device For Generating A Dielectric Barrier Discharge And Method For Treating An Object To Be Activated
The present invention relates to a device for generating a dielectric barrier discharge for treatment of an object (1) to be activated with non-thermal atmospheric pressure plasma, comprising a dielectric working chamber (2) which has a wall (3) of a dielectric material and which encloses a working space (4), wherein a metallization (6) is applied to an outer side (5) of the wall (3) facing away from the working space (4), wherein the working space (4) is an open volume, and a high-voltage source (9) which is configured to apply a high voltage to the metallization (6) or to the object (1) to be activated when the object (1) to be activated is in the working space (4). According to a further aspect, the invention relates to a method of treatment of an object (1) to be activated with a non-thermal atmospheric pressure plasma.
METHODS AND APPARATUS FOR REDIRECTING IONS GENERATED FROM ATMOSPHERIC PRESSURE LOW TEMPERATURE PLASMA
Some embodiments are directed to a generator and separator assembly for generating ions via atmospheric pressure, low temperature plasma and separating the generated ions. The generator and separator assembly include a plasma generator for generating the generating atmospheric pressure, low temperature plasma that is configured to eject positively and negatively ions. A separator is disposed to receive the positively and negatively ions ejected from the plasma generator, and includes a first separator electrode; a second separator electrode spaced from the first separator electrode; and a separator power supply that supplies electric power in the form of at least one of different voltages and different polarities to the first and second electrodes ranging from 0 kV and 10 kV, such that the received positively charged ions are redirected in one direction and the received negatively charged ions are redirected to another direction different from the one direction.
SYSTEM AND METHOD FOR PREVENTING OIL SPLASH IN ROTARY-TYPE PLASMA HEAD
A system and a method for preventing oil splash in a rotary-type plasma head is provided, including a nozzle unit through which plasma is discharged, a rotating body unit, in which the nozzle unit is attached to and detached from one side of the rotating body unit, the other side of the rotating body unit is connected to a housing unit, and the rotating body unit is configured to drive the nozzle unit to rotate, and an oil cover unit connected to one side of the nozzle unit and configured to surround the rotating body unit from outside, to prevent oil vapor or oil micro-droplets discharged through joints of components of the rotating body unit from leaking outside.
FREQUENCY CHIRP RESONANT OPTIMAL PLASMA IGNITION METHOD
A system for plasma ignition and maintenance of an atmospheric pressure plasma. The system has a variable frequency alternating current (AC) power source, a transformer, a cable connected to a secondary winding of the transformer, a programmed microprocessor for control of power to the atmospheric pressure plasma. The microprocessor is configured to a) at pre-ignition, power the AC power source at an operational frequency f.sub.op higher than the resonant frequency f.sub.r, b) decrease the operational frequency f.sub.op of the AC power source until there is plasma ignition, and c) after the plasma ignition, further decrease the operational frequency f.sub.op of the AC power source to a frequency lower than the resonant frequency f.sub.r.
Atmospheric pressure linear rf plasma source for surface modification and treatment
An atmospheric pressure linear RF plasma source having an enclosure enclosing a chamber in the form of an extended slot having a width W, a length L, and a thickness T, with W≥20T, the enclosure having a top opening for receiving a flow of a working gas in the direction of the length L and a bottom opening for delivering a flow of plasma, with the bottom opening being open to atmospheric pressure. Then walls of the enclosure comprise a dielectric material. Two mutually opposing pancake coils are positioned on opposite sides of the enclosure and are capable of being driven by an RF power source in an opposing phase relationship. Alternatively, an elongated solenoid coil may surround the enclosure.
Plasma generating apparatus and method for operating same
A plasma generating apparatus according to an embodiment of the present invention comprises: a pair of electrodes arranged in a dielectric discharge tube; an initial discharge induction coil module; and a main discharge induction coil module. The initial discharge induction coil module and the main discharge induction coil module are connected to an RF power source, and the RF power source provides RF power having different resonance frequencies to the initial discharge induction coil module and the main discharge induction coil module, respectively.
Plasma system and method of mixing plasma and water mist
A plasma system is provided. The plasma system includes a low-temperature atmospheric-pressure plasma source and a water-mist supplying source. The low-temperature atmospheric-pressure plasma source has a nozzle. The nozzle is configured to eject a plasma. The water-mist supplying source is configured to deliver a water mist to the plasma ejected from the nozzle.
Composition for atopy or psoriasis treatment comprising liquid type plasma
The present invention relates to a composition for atopy or psoriasis treatment comprising a plasma-treated liquid material. More particularly, the present invention relates to a method for producing a plasma-treated liquid material for preventing or treating atopic dermatitis or psoriasis, a pharmaceutical composition for preventing or treating a topic dermatitis or psoriasis using a plasma-treated liquid material produced according to the method, and a method for preventing or treating atopic dermatitis or psoriasis using the plasma-treated liquid material.
A PROCESS AND APPARATUS FOR THE PREPARATION OF A BONDED SUBSTRATE
The present invention relates to a process and apparatus for the preparation of a bonded substrate. More particularly, the present invention relates to a PDMS bonding apparatus. More specifically, the present invention relates to a PDMS bonding apparatus which uses plasma to bond PDMS to a substrate.
The present invention discloses a PDMS bonding apparatus and process for using said apparatus, the apparatus comprising: a process chamber (100) forming a sealed processing space (S) for bonding of PDMS (polydimethylsiloxane); a first support (200) installed in the process chamber (100) and which supports the PDMS (1); a second support (300) installed in the process chamber (100) opposing the first support (200) and which supports a bonding object (2) which is bonded to the PDMS (1); a gas injection unit (400) which ejects process gas between the first support (200) and the second support (300), and; a plasma generator (500) which creates a plasma atmosphere within the process chamber (100).