Patent classifications
H
H01
H01L
27/00
H01L27/02
H01L27/04
H01L27/10
H01L27/118
H01L27/11803
H01L27/11807
H01L2027/11809
H01L2027/11835
H01L2027/1184
H01L2027/1184
SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE
A layout structure of a standard cell using a complementary FET (CFET) is provided. First and second transistors that are three-dimensional transistors lie between first and second power supply lines as viewed in plan, the second transistor being formed above the first transistor in the depth direction. A first local interconnect is connected with the source or drain of the first transistor, and a second local interconnect is connected with the source or drain of the second transistor. The first and second local interconnects extend in the Y direction, overlap each other as viewed in plan, and both overlap the first and second power supply lines as viewed in plan.