H01L21/6776

Systems and methods for solvent extraction
11577270 · 2023-02-14 · ·

Systems and methods for venting a solvent are disclosed. The system includes a chamber, such as an oven having an interior volume defining a heating zone, where the interior volume receives at least one substrate coated with a coating material comprising a solvent. The system further includes a vent coupled to the oven and defining a passage between the interior volume and the environment external to the oven. The system also includes a solvent sensor measuring an amount of evaporated solvent present in the interior volume, and a fan removing at least a portion of the solvent from the interior volume. The system may also include a coating assembly including an applicator and a flow meter, wherein the applicator applies a portion of the coating material to the substrate, and the flow meter determines the amount of coating material applied to the substrate.

Printing device
11577502 · 2023-02-14 · ·

A printing device for printing substrates, such as circuit boards, wafers, or solar cells, has at least one movably mounted printing unit with a working surface on which the substrate to be printed can be placed. The printing unit is paired with a transport belt device, which has a supply roller with a transport belt wound thereon, a collection roller for winding up the transport belt, and two deflecting surfaces, in particular deflecting rollers, which are paired with the working surface. The transport belt is guided by the supply roller over one deflecting surface and onto the working surface in order to form a contact surface for the substrates, and by the working surface over the other deflecting surface to the collection roller. The deflecting surfaces can be moved together with the respective printing unit. The supply and collection rollers are held on the printing device in a stationary manner.

CONVEYING DEVICE, CONVEYING METHOD AND EVAPORATION APPARATUS
20180005858 · 2018-01-04 ·

A conveying device, a conveying method, and an evaporation apparatus are provided. The conveying device comprises a carrying mechanism for carrying a substrate; and a fastening mechanism for fastening the substrate on the carrying mechanism in a mechanical manner. In the conveying device, the substrate is fastened on the carrying mechanism in a mechanical manner by the fastening mechanism. As compared with electrostatic fastening and adhesive fastening, this reduces damage to the substrate, increases the reliability for fastening the substrate, and makes it easy to receive and detach the substrate. (FIG. 1)

GUIDED TRANSPORT PATH CORRECTION
20180014411 · 2018-01-11 ·

A printer deposits material onto a substrate as part of a manufacturing process for an electronic product; at least one transported component experiences error, which affects the deposition. This error is mitigated using transducers that equalize position of the component, e.g., to provide an “ideal” conveyance path, thereby permitting precise droplet placement notwithstanding the error. In one embodiment, an optical guide (e.g., using a laser) is used to define a desired path; sensors mounted to the component dynamically detect deviation from this path, with this deviation then being used to drive the transducers to immediately counteract the deviation. This error correction scheme can be applied to correct for more than type of transport error, for example, to correct for error in a substrate transport path, a printhead transport path and/or split-axis transport non-orthogonality.

VACUUM TREATMENT APPARATUS

So as to perform a vacuum surface treatment on a workpiece at a predetermined temperature, which is different from a temperature to which the surface is exposed during the vacuum surface treatment, the workpiece is conveyed in a conveyance direction along one or more than one station group including one or more than one tempering station and of a single treatment station.

DEVICE FOR SHIFTING AT LEAST ONE SUB-ASSEMBLY BETWEEN A PROVISIONING ZONE AND WORKING ZONE

Device (1) for displacing at least one assembly (2, 2′) between a provisioning zone (3) and a working zone (4) of at least one process chamber (5) of a process chamber apparatus (6) for soldering, in particular for reflow soldering, comprising at least one displacement device (7), wherein the at least one assembly (2, 2′) carries out, at least in sections, a displacement movement (9), or such a displacement movement (9) can be carried out, such that the at least one assembly (2, 2′) is displaced by means of a force (8), in particular pushing force, which is transmitted or generated by the displacement device (7), in particular directly, and acts on the assembly (2, 2′).

SUBSTRATE PROCESSING APPARATUS AND METHOD
20230227974 · 2023-07-20 · ·

A substrate processing apparatus, includes a reaction chamber, a central processing volume within a vertically oriented central processing portion of the reaction chamber, to expose at least one substrate to self-limiting surface reactions in the central processing volume, at least two lateral extensions in the reaction chamber laterally extending from the central processing portion, and an actuator configured to reversibly move at least one substrate between the lateral extension(s) and the central processing volume.

SUBSTRATE PROCESSING APPARATUS, METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND RECORDING MEDIUM

A substrate processing technique including: a module including a gas supplier having an upstream side gas guide and a supply structure, a reaction tube communicating with the gas supplier, and a gas exhauster; a supply pipe connected to the gas supplier, and an exhaust pipe connected to the gas exhauster; a carry chamber adjacent to a plurality of the modules; and a piping arrangement region in which the supply pipe or the exhaust pipe can be arranged, in which the reaction tube is disposed at a position overlapping the carry chamber, when the supply pipe is disposed in the piping arrangement region, the gas exhauster is disposed at a position oblique to the shaft and not overlapping the carry chamber, and when the exhaust pipe is disposed in the piping arrangement area, the gas supplier is disposed at a position oblique to the shaft and not overlapping the carry chamber.

POST-PRINT VACUUM DEGASSING
20230016091 · 2023-01-19 ·

A degassing chamber for degassing a material located on a workpiece, comprises a vacuum source and a vacuum reservoir in fluid communication with the vacuum source, a secondary chamber, a port valve which is movable between an open position to allow passage of a workpiece therethrough between the exterior of the degassing chamber and the secondary chamber and a closed position in which the port valve is fluidly sealed, and a reservoir valve which is movable between an open position to provide fluid communication between the secondary chamber and the vacuum reservoir and a closed position in which the reservoir valve is fluidly sealed. The degassing chamber may be provided subsequent to a printing machine in a production line, and has particular application for degassing silicone material when producing fuel cells.

ELECTRODE PRODUCTION PROCESS
20230223508 · 2023-07-13 ·

A method for forming at least one electrode, said method comprising: a) providing an electronically conductive, inert material; b) cutting the substrate material to form at least one current collector; c) placing at least one current collector on a carrier; d) applying one or more protection layers to one or both sides of the current collector to form a coated electrode; and e) removing the electrode from the carrier.