An electrical fuse (e-fuse) includes a fuse link including a silicided semiconductor layer over a dielectric layer covering a gate conductor. The silicided semiconductor layer is non-planar and extends orthogonally over the gate conductor. A first terminal is electrically coupled to a first end of the fuse link, and a second terminal is electrically coupled to a second end of the fuse link. The fuse link may be formed in the same layer as an intrinsic and/or extrinsic base of a bipolar transistor. The gate conductor may control a current source for programming the e-fuse. The e-fuse reduces the footprint and the required programming energy compared to conventional e-fuses.

An electrical fuse (e-fuse) includes a fuse link including a silicided semiconductor layer over a dielectric layer covering a gate conductor. The silicided semiconductor layer is non-planar and extends orthogonally over the gate conductor. A first terminal is electrically coupled to a first end of the fuse link, and a second terminal is electrically coupled to a second end of the fuse link. The fuse link may be formed in the same layer as an intrinsic and/or extrinsic base of a bipolar transistor. The gate conductor may control a current source for programming the e-fuse. The e-fuse reduces the footprint and the required programming energy compared to conventional e-fuses.

A semiconductor device includes a switching element, a control circuit, and a first and second temperature detectors. The control circuit controls the switching element and have an overcurrent detection circuit for the switching element. The first temperature detector detects the temperature of the switching element and the second temperature detector detects the temperature of the control circuit. The control circuit includes a reference correction circuit for correcting an overcurrent reference value of the overcurrent detection circuit on the basis of a first detection value and a second detection value detected by the first and second temperature detectors and outputting a corrected overcurrent reference value.

An integrated circuit includes a number of components disposed at a surface of a semiconductor body and an interconnect region connecting the components into a functional circuit. A metallic shield is also produced in the interconnect region. A configurable stage is configurable to operate in a receiving antenna configuration or in a detection configuration during which the integrated circuit is configured to detect a presence of an external electromagnetic radiation representative of an attack by injection of faults

An integrated circuit includes a number of components disposed at a surface of a semiconductor body and an interconnect region connecting the components into a functional circuit. A metallic shield is also produced in the interconnect region. A configurable stage is configurable to operate in a receiving antenna configuration or in a detection configuration during which the integrated circuit is configured to detect a presence of an external electromagnetic radiation representative of an attack by injection of faults

Various embodiments of an integrated circuit package and a method of forming such package are disclosed. The package includes a substrate having a core layer disposed between a first dielectric layer and a second dielectric layer, a die disposed in a cavity of the core layer, and an encapsulant disposed in the cavity between the die and a sidewall of the cavity. The package further includes a first patterned conductive layer disposed within the first dielectric layer, a device disposed on an outer surface of the first dielectric layer such that the first patterned conductive layer is between the device and the core layer, a second patterned conductive layer disposed within the second dielectric layer, and a conductive pad disposed on an outer surface of the second dielectric layer such that the second patterned conductive layer is between the conductive pad and the core layer.

Methods of forming a capacitor structure might include forming a first and second conductive regions having first and second conductivity types, respectively, in a semiconductor material, forming a dielectric overlying the first and second conductive regions, forming a conductor overlying the dielectric, and patterning the conductor, the dielectric, and the first and second conductive regions to form a first island of the first conductive region, a second island of the first conductive region, an island of the second conductive region, a first portion of the dielectric overlying the first island of the first conductive region separated from a second portion of the dielectric overlying the second island of the first conductive region and the island of the second conductive region, and a first portion of the conductor overlying the first portion of the dielectric separated from a second portion of the conductor overlying the second portion of the dielectric.

Methods of forming a capacitor structure might include forming a first and second conductive regions having first and second conductivity types, respectively, in a semiconductor material, forming a dielectric overlying the first and second conductive regions, forming a conductor overlying the dielectric, and patterning the conductor, the dielectric, and the first and second conductive regions to form a first island of the first conductive region, a second island of the first conductive region, an island of the second conductive region, a first portion of the dielectric overlying the first island of the first conductive region separated from a second portion of the dielectric overlying the second island of the first conductive region and the island of the second conductive region, and a first portion of the conductor overlying the first portion of the dielectric separated from a second portion of the conductor overlying the second portion of the dielectric.

This application provides an embedded substrate, a circuit board assembly, and an electronic device. The embedded substrate in this application includes an insulation layer, and an electronic element and a conductive connector that are embedded inside the insulation layer. The conductive connector is electrically connected to the electronic element. The conductive connector includes at least one fuse unit, the fuse unit includes a fusible structure and two electrical connection ends, the fusible structure is connected between the two electrical connection ends in a direction of an electrical path of the conductive connector, and the fusible structure is configured to be blown when a passing current exceeds a preset current threshold, to disconnect an electrical connection between the electronic element and an external connection end. In this application, maintenance and replacement costs are low during current burning prevention, and a volume is compact.

A spring electrode for a press-pack power semiconductor module includes a first electrode in contact with a power semiconductor chip, a second electrode arranged to face the first electrode, and a pressure pad which connects the first electrode and the second electrode and has flexibility in a normal direction of opposing surfaces of the first electrode and the second electrode. The opposing surfaces of the first electrode and the second electrode can be polygons of a pentagon or more, the pressure pad can be a cylindrical conductor or a plurality of wire conductors, and sides of the opposing surface of the first electrode and sides of the opposing surface of the second electrode corresponding to these sides are connected in parallel by the pressure pad.