SRAM designs based on GAA transistors are disclosed that provide flexibility for increasing channel widths of transistors at scaled IC technology nodes and relax limits on SRAM performance optimization imposed by FinFET-based SRAMs. GAA-based SRAM cells described have active region layouts with active regions shared by pull-down GAA transistors and pass-gate GAA transistors. A width of shared active regions that correspond with the pull-down GAA transistors are enlarged with respect to widths of the shared active regions that correspond with the pass-gate GAA transistors. A ratio of the widths is tuned to obtain ratios of pull-down transistor effective channel width to pass-gate effective channel width greater than 1, increase an on-current of pull-down GAA transistors relative to an on-current of pass-gate GAA transistors, decrease a threshold voltage of pull-down GAA transistors relative to a threshold voltage of pass-gate GAA transistors, and/or increases a β ratio of an SRAM cell.

A semiconductor device is provided. The semiconductor device includes: an active pattern provided on a substrate and extending in a first direction; a pair of source/drain patterns provided on the active pattern and spaced apart from each other in the first direction; a plurality of channel layers vertically stacked and spaced apart from each other on the active pattern between the pair of source/drain patterns; a gate electrode extending in a second direction between the pair of source/drain patterns, the gate electrode being provided on the active pattern and surrounding the plurality of channel layers, and the second direction intersecting the first direction; and a gate spacer provided between the plurality of channel layers, and between the gate electrode and the pair of source/drain patterns. The gate spacer includes a plurality of first spacer patterns and a plurality of second spacer patterns that are alternately stacked on sidewalls of the pair of source/drain patterns.

A semiconductor device may include: an active pattern on a substrate and extending in a first direction; a plurality of source/drain patterns on the active pattern and spaced apart from each other in the first direction; a gate electrode between the plurality of source/drain patterns that crosses the active pattern and extends in a second direction intersecting the first direction; and a plurality of channel patterns stacked on the active pattern and configured to connect two or more of the source/drain patterns to each other. The channel patterns may be spaced apart from each other. Each of the channel patterns may include a first portion between the gate electrode and the source/drain patterns, and a plurality of second portions connected to the first portion and overlapped with the gate electrode in a direction perpendicular to a plane defined by an upper surface of the substrate.

Disclosed is a method for manufacturing a semiconductor device. The method includes: forming a gate insulating material layer on a substrate; forming a gate material layer on the gate insulating material layer; and performing an etching process on the gate material layer and the gate insulating material layer to form a gate layer and a gate insulating layer. The gate insulating layer and the gate layer each include a first end and a second end opposite to each other in a direction parallel to a channel length. The first end of the gate insulating layer is recessed inwards by a preset length relative to the first end of the gate layer, and the second end of the gate insulating layer is recessed inwards by the preset length relative to the second end of the gate layer.

A multiplier has a pair of charge reservoirs. The pair of charge reservoirs are connected in series. A first charge movement device induces charge movement to or from the pair of charge reservoirs at a same rate. A second charge movement device induces charge movement to or from one of the pair of reservoirs, the rate of charge movement programmed to one of add or remove charges at a rate proportional to the first charge movement device. The first charge movement device loads a first charge into a first of the pair of charge reservoirs during a first cycle. The first charge movement device and the second charge movement device remove charges at a proportional rate from the pair of charge reservoirs during a second cycle until the first of the pair of charge reservoirs is depleted of the first charge. The second charge reservoir thereafter holding the multiplied result.

An integrated circuit device having insulated gate field effect transistors (IGFETs) having a plurality of horizontally disposed channels that can be vertically aligned above a substrate with each channel being surrounded by a gate structure has been disclosed. The integrated circuit device may include a temperature sensor circuit and core circuitry. The temperature senor circuit may include at least one portion formed in a region other than the region that the IGFETs are formed as well as at least another portion formed in the region that the IGFETs having a plurality of horizontally disposed channels that can be vertically aligned above a substrate with each channel being surrounded by a gate structure are formed. By forming a portion of the temperature sensor circuit in regions below the IGFETs, an older process technology may be used and device size may be decreased and cost may be reduced.

An object of the present disclosure is to provide a trench gate type power semiconductor device that does not easily break even when stress is applied. A SiC-MOSFET includes a SiC substrate, a drift layer of a first conductive type, formed on the SiC substrate, a base region of a second conductivity type formed in a surface layer of the drift layer, a source region of the first conductivity type selectively formed in a surface layer of the base region, a trench extending through the base region and the source region and reaching the drift layer, a gate electrode embedded in the trench and having a V-shaped groove on an upper surface thereof, and an oxide film formed on an upper surface including the groove of the gate electrode, in which a bottom of the V-shape groove is deeper than the base region.

The invention relates to a lateral field effect transistor, in particular a HEMT having a heterostructure, in a III/V semiconductor system with a p-type semiconductor being arranged between an ohmic load contact, in particular a drain contact, and a gate contact of the transistor for an injection of holes into a portion of the transistor channel. Further, a recombination zone implemented by a floating ohmic contact is provided for to improve the device performance.

A semiconductor device 1 includes a base body 3 that includes a p type substrate 4 and an n type semiconductor layer 5 formed on the p type substrate 4 and includes an element region 2 having a transistor 40 with the n type semiconductor layer as a drain, a p type element isolation region 7 that is formed in a surface layer portion of the base body such as to demarcate the element region, and a conductive wiring 25 that is disposed on a peripheral edge portion of the element region and is electrically connected to the n type semiconductor layer. The transistor includes an n.sup.+ type drain contact region 14 that is formed in a surface layer portion of the n type semiconductor layer in the peripheral edge portion of the element region. The conductive wiring is disposed such as to cover at least a portion of an element termination region 30 between the n.sup.+ type drain contact region and the p type element isolation region.

A transistor includes a wide bandgap semiconductor layer, a gate electrode, a gate pad, and a gate runner. The gate electrode extends to a region where the gate pad is located and a region where the gate runner is located. The gate pad is connected to the gate electrode. The gate runner is connected to the gate electrode. The gate electrode includes a first region connected to the gate pad, a second region connected to the gate runner, and a third region and a fourth region arranged between the first and second regions in different positions in a first direction. In a cross section perpendicular to the first direction, the gate electrode in the fourth region has a cross-sectional area smaller than that of the gate electrode in the third region.