H01L31/204

OPTOELECTRONIC DEVICE COMPRISING A SEMICONDUCTOR LAYER BASED ON GeSn HAVING A SINGLE-CRYSTAL PORTION WITH A DIRECT BAND STRUCTURE AND AN UNDERLYING BARRIER REGION

An optoelectronic device including a crystalline semiconductor layer based on GeSn and including a pin junction. This formed semiconductor layer includes a base portion; a single-crystal intermediate portion having an average value x.sub.pi1 of proportion of tin less than x.sub.ps1, thus forming a barrier region against charge carriers flowing in an upper portion; and the single-crystal upper portion including a homogeneous medium with a proportion of tin x.sub.ps1, and vertical structures having an average value x.sub.ps2 of proportion of tin greater than x.sub.ps1, thus forming regions for emitting or for receiving infrared radiation.

Image sensor and manufacturing method thereof

Provided are an image sensor and a method of manufacturing method of manufacturing the image sensor. The image sensor includes a substrate, photoelectric transducers and switching elements formed in layers on the substrate in this order. Each of the photoelectric transducers includes a hydrogenated amorphous silicon layer. Each of the switching elements includes an amorphous oxide semiconductor layer. The image sensor further includes a blocking layer arranged between the hydrogenated amorphous silicon layers of the photoelectric transducers and the amorphous oxide semiconductor layers of the switching elements, where the blocking layer suppresses penetration of hydrogen separated from the hydrogenated amorphous silicon layers.

BLACK-COLOURED PHOTOVOLTAIC DEVICE

A photovoltaic device includes an electrically-conductive front contact layer; an electrically-conductive back contact layer, the back contact layer being intended to be situated further from a source of incident light than the front contact layer; and a semiconductor-based PIN junction having a substantially amorphous intrinsic silicon layer sandwiched between a P-type doped semiconductor layer and an N-type doped semiconductor layer. The layer of the PIN junction situated closest to the back contact layer is a silicon-germanium alloy layer including at least 2 mol % of germanium.

Heterojunction photovoltaic device and fabrication method

A photovoltaic device and method include a doped germanium-containing substrate, an emitter contact coupled to the substrate on a first side and a back contact coupled to the substrate on a side opposite the first side. The emitter includes at least one doped layer of an opposite conductivity type as that of the substrate and the back contact includes at least one doped layer of the same conductivity type as that of the substrate. The at least one doped layer of the emitter contact or the at least one doped layer of the back contact is in direct contact with the substrate, and the at least one doped layer of the emitter contact or the back contact includes an n-type material having an electron affinity smaller than that of the substrate, or a p-type material having a hole affinity larger than that of the substrate.

Omnidirectional polarization independent all-dielectric light trapping scheme

A leaf inspired biomimetic light trapping scheme for ultrathin flexible graphene silicon Schottky junction solar cell. An all-dielectric approach comprising of lossless silica and titania nanoparticles is used for mimicking the two essential light trapping mechanisms of a leaf: (1) focusing and waveguiding and (2) scattering. The light trapping scheme uses two optically tuned layers and does not require any nano-structuring of the active silicon substrate, thereby ensuring that the optical gain is not offset due to recombination losses.

MULTIJUNCTION SOLAR CELLS ON BULK GeSi SUBSTRATE

A solar cell comprising a bulk germanium silicon growth substrate; a diffused photoactive junction in the germanium silicon substrate; and a sequence of subcells grown over the substrate, with the first grown subcell either being lattice matched or lattice mis-matched to the growth substrate.

Multijunction solar cells on bulk GeSi substrate

A solar cell comprising a bulk germanium silicon growth substrate; a diffused photoactive junction in the germanium silicon substrate; and a sequence of subcells grown over the substrate, with the first grown subcell either being lattice matched or lattice mis-matched to the growth substrate.

Heterojunction photovoltaic device and fabrication method

A photovoltaic device and method include a doped germanium-containing substrate, an emitter contact coupled to the substrate on a first side and a back contact coupled to the substrate on a side opposite the first side. The emitter includes at least one doped layer of an opposite conductivity type as that of the substrate and the back contact includes at least one doped layer of the same conductivity type as that of the substrate. The at least one doped layer of the emitter contact or the at least one doped layer of the back contact is in direct contact with the substrate, and the at least one doped layer of the emitter contact or the back contact includes an n-type material having an electron affinity smaller than that of the substrate, or a p-type material having a hole affinity larger than that of the substrate.

OMNIDIRECTIONAL POLARIZATION INDEPENDENT ALL-DIELECTRIC LIGHT TRAPPING SCHEME
20200144526 · 2020-05-07 ·

A leaf inspired biomimetic light trapping scheme for ultrathin flexible graphene silicon Schottky junction solar cell. An all-dielectric approach comprising of lossless silica and titania nanoparticles is used for mimicking the two essential light trapping mechanisms of a leaf: (1) focusing and waveguiding and (2) scattering. The light trapping scheme uses two optically tuned layers and does not require any nano-structuring of the active silicon substrate, thereby ensuring that the optical gain is not offset due to recombination losses.

Monolithic integration of heterojunction solar cells

A method for fabricating a device with integrated photovoltaic cells includes supporting a semiconductor substrate on a first handle substrate and doping the semiconductor substrate to form doped alternating regions with opposite conductivity. A doped layer is formed over a first side the semiconductor substrate. A conductive material is patterned over the doped layer to form conductive islands such that the conductive islands are aligned with the alternating regions to define a plurality of photovoltaic cells connected in series on a monolithic structure.