Patent classifications
H01S3/0835
UNDERCUT ELECTRODES FOR A GAS DISCHARGE LASER CHAMBER
Provided is a light source apparatus and an electrode design for use in a discharge chamber of the light source apparatus. The discharge chamber is configured to hold a gas discharge medium configured to output a light beam. The light source apparatus include a pair of opposed electrodes configured to excite a gas medium to form a discharge plasma. At least one electrode of the pair of opposing electrodes may include recessed portions or hollowed-out portions at each end of the electrode, or at other suitable locations. The disclosed electrode structures improve uniformity of the erosion profile of the electrodes, significantly extending the lifespan of the discharge chamber by redistributing the discharge particle flux through the electrode with an optimized design of the electrode geometry, as the local discharge particle flux is reduced at the recessed portions.
LASER APPARATUS AND ELECTRONIC DEVICE MANUFACTURING METHOD
A laser apparatus according to an aspect of the present disclosure includes a master oscillator configured to emit a laser beam, an amplifier including an optical resonator and configured to amplify the laser beam emitted by the master oscillator in the optical resonator, and a phase shift structure disposed on an optical path between the master oscillator and the amplifier at a position closer to the amplifier than a middle point of the optical path. The phase shift structure includes a plurality of cells having different phase shift amounts for the laser beam. The cells have a disposition interval of 80 μm to 275 μm inclusive.
DEVICE FOR GENERATING A LASER RADIATION AND ASSOCIATED FABRICATION METHOD
Disclosed is a device for generating a laser radiation including a box and an electrode, the electrode including a column extending along an axial direction and a collar surrounding the column and having a first face perpendicular to the axial direction and a second face parallel to the first face, the second face facing the box. The generating device includes a ring having a third face bearing against the box, the ring defining a hole emerging on the third face and accommodating the collar, the hole being defined along the axial direction by a bearing face arranged in the ring, perpendicular to the axial direction and facing the box, the first face bearing against the bearing face.
DISC LASER
There is provided a laser system having a cylindrically-shaped annular minor with at least one opening in its surface; a pair of planar metallic electrodes disposed proximate opposite edges of the annular mirror, normal to the axis of the annular minor, the electrodes configured to have an RF field applied between them; a pair of end minors disposed at said at least one opening; and a ceramic material in the form of a disc, disposed in the internal volume of the annular minor, the ceramic material having a series of channels formed therein such that they generate a zig-zag pathway in the ceramic material, wherein (i) the zig-zag path, when filled with a gain medium, (ii) the annular minor and (iii) the pair of end minors, together constitute a laser cavity.
Laser system
A laser system includes: A. a solid-state laser apparatus configured to output a pulse laser beam having light intensity distribution in a Gaussian shape that is rotationally symmetric about an optical path axis; B. an amplifier including a pair of discharge electrodes and configured to amplify the pulse laser beam in a discharge space between the pair of discharge electrodes; and C. a conversion optical system configured to convert the light intensity distribution of the pulse laser beam output from the amplifier into a top hat shape in each of a discharge direction of the pair of discharge electrodes and a direction orthogonal to the discharge direction.
Optical element for a deep ultraviolet light source
An optical element for a deep-ultraviolet light source includes a crystalline substrate; a coating on an exterior surface of the crystalline substrate, the coating having a thickness along a direction that extends away from the exterior surface; and a structure on and/or in the coating, the structure including a plurality of features that extend away from the crystalline substrate along the direction. The features include an amorphous dielectric material and are arranged such that an index of refraction of the structure varies along the direction.
OPTICAL ELEMENT FOR A DEEP ULTRAVIOLET LIGHT SOURCE
An optical element for a deep-ultraviolet light source includes a crystalline substrate; a coating on an exterior surface of the crystalline substrate, the coating having a thickness along a direction that extends away from the exterior surface; and a structure on and/or in the coating, the structure including a plurality of features that extend away from the crystalline substrate along the direction. The features include an amorphous dielectric material and are arranged such that an index of refraction of the structure varies along the direction.
Method and apparatus for real time averaging of beam parameter variations
A waveguide gas laser having a laser resonator cavity of a variable length is subjected to cyclical varying of the length of the cavity during generation of a laser beam a length variation amount sufficient to force a laser beam generated in the resonator cavity though a substantially complete optical longitudinal cavity mode at a rate operable to smooth at least one laser beam parameter variation. In this manner variation in the laser beam parameter is averaged by moving through at least a portion of an optical longitudinal cavity mode.
Method and Apparatus for Real Time Averaging of Beam Parameter Variations
A waveguide gas laser having a laser resonator cavity of a variable length is subjected to cyclical varying of the length of the cavity during generation of a laser beam a length variation amount sufficient to force a laser beam generated in the resonator cavity though a substantially complete optical longitudinal cavity mode at a rate operable to smooth at least one laser beam parameter variation. In this manner variation in the laser beam parameter is averaged by moving through at least a portion of an optical longitudinal cavity mode.
LASER SYSTEM
A laser system includes: A. a solid-state laser apparatus configured to output a pulse laser beam having light intensity distribution in a Gaussian shape that is rotationally symmetric about an optical path axis; B. an amplifier including a pair of discharge electrodes and configured to amplify the pulse laser beam in a discharge space between the pair of discharge electrodes; and C. a conversion optical system configured to convert the light intensity distribution of the pulse laser beam output from the amplifier into a top hat shape in each of a discharge direction of the pair of discharge electrodes and a direction orthogonal to the discharge direction.