The disclosure provides a high-frequency-reproducibility laser frequency stabilization method and device based on multi-point acquisition of laser tube temperature. The laser frequency stabilization device includes: a frequency stabilization control circuit. The frequency stabilization control circuit includes a polarizing beam splitter, an optical power conversion circuit, an A/D conversion circuit, a temperature measuring circuit, a microprocessor, a D/A converter and a heating film driver. The polarizing beam splitter is disposed outside any one of laser transmitting holes. The optical power conversion circuit is disposed on reflection and refraction optical paths of the polarizing beam splitter. The optical power conversion circuit, the A/D conversion circuit, the microprocessor, the D/A converter, the heating film driver and a plurality of groups of heating films are sequentially in one-way connection. Temperature sensors, the temperature measuring circuit and the microprocessor are sequentially in one-way connection.

The laser system may include a delay circuit unit, first and second trigger-correction units, and a clock generator. The delay circuit unit may receive a trigger signal, output a first delay signal obtained by delaying the trigger signal by a first delay time, and output a second delay signal obtained by delaying the trigger signal by a second delay time. The first trigger-correction unit may receive the first delay signal and output a first switch signal obtained by delaying the first delay signal by a first correction time. The second trigger-correction unit may receive the second delay signal and output a second switch signal obtained by delaying the second delay signal by a second correction time. The clock generator may generate a clock signal that is common to the delay circuit unit and the first and second trigger-correction units.

Systems, apparatuses, methods, and computer program products are provided for controlling a laser source that includes two laser discharge chambers. An example laser control system can include a first pulsed powertrain including a first independent circuit configured to generate a first resonant charging supply (RCS) output voltage. The first RCS output voltage can be configured to drive a first laser discharge chamber. The example laser control system can further include a second pulsed powertrain including a second independent circuit configured to generate a second RCS output voltage independent from the first RCS output voltage. The second RCS output voltage can be configured to drive a second laser discharge chamber independent from the first laser discharge chamber.

A laser apparatus includes a first optical element, a second optical element, a first actuator configured to change a first wavelength component included in a pulse laser beam by changing a posture of the first optical element, a second actuator configured to change a second wavelength component included in the pulse laser beam by changing a posture of the second optical element, a first encoder configured to measure a position of the first actuator, a second encoder configured to measure a position of the second actuator, and a processor. The processor reads a first relation and a second relation and performs control of the first actuator based on the first relation and the position of the first actuator measured by the first encoder and control of the second actuator based on the second relation and the position of the second actuator measured by the second encoder.

A laser apparatus includes a first optical element, a second optical element, a first actuator configured to change a first wavelength component included in a pulse laser beam by changing a posture of the first optical element, a second actuator configured to change a second wavelength component included in the pulse laser beam by changing a posture of the second optical element, a first encoder configured to measure a position of the first actuator, a second encoder configured to measure a position of the second actuator, and a processor. The processor reads a first relation and a second relation and performs control of the first actuator based on the first relation and the position of the first actuator measured by the first encoder and control of the second actuator based on the second relation and the position of the second actuator measured by the second encoder.

The laser doping apparatus may irradiate a predetermined region of a semiconductor material with a pulse laser beam to perform doping. The laser doping apparatus may include: a solution supplying system configured to supply dopant-containing solution to the predetermined region, and a laser system including at least one laser device configured to output the pulse laser beam to be transmitted by the dopant-containing solution, and a time-domain pulse waveform changing apparatus configured to control a time-domain pulse waveform of the pulse laser beam.

A laser system for amplifying laser light generated from a laser light source and emitting the laser light includes an optical element in an optical path of the laser light and transmits the laser light, a control device to control power to be supplied to the laser system, an imager to capture an image of the optical element, and an image processing circuitry to process the image of the optical element captured by the imager. The image processing circuitry in which reference images of the optical element corresponding to power information relating to the power are prepared in advance includes a comparison unit to compare a captured image of the optical element captured by the imager with a reference image selected by a reference image selection unit, the reference image corresponding to the power information at a time of image capturing by the imager.

A laser system for amplifying laser light generated from a laser light source and emitting the laser light includes an optical element in an optical path of the laser light and transmits the laser light, a control device to control power to be supplied to the laser system, an imager to capture an image of the optical element, and an image processing circuitry to process the image of the optical element captured by the imager. The image processing circuitry in which reference images of the optical element corresponding to power information relating to the power are prepared in advance includes a comparison unit to compare a captured image of the optical element captured by the imager with a reference image selected by a reference image selection unit, the reference image corresponding to the power information at a time of image capturing by the imager.

To reduce the size of a magnetic circuit to be provided in a pulse power module for applying a high voltage in the form of a pulse across a pair of discharge electrodes which are disposed in a laser chamber of a gas laser apparatus, the magnetic circuit may include a magnetic core, an insulation member configured to contain a refrigerant flow path therein and cover the periphery of the magnetic core, and a winding wound around the insulation member.

A high-voltage pulse generator may include a number “n” (n is a natural number of not less than 2) of primary electric circuits connected in parallel to one another on the primary side of a pulse transformer, and a secondary electric circuit of the pulse transformer, which is connected to a pair of discharge electrodes disposed in a laser chamber of a gas laser apparatus. The “n” primary electric circuits may include a number “n” of primary coils connected in parallel to one another, a number “n” of capacitors respectively connected in parallel to the “n” primary coils, and a number “n” of switches respectively connected in series to the “n” capacitors. The “n” primary electric circuits may be connected to a number “n” of chargers for charging the “n” capacitors, respectively. The secondary electric circuit may include a number “n” of secondary coils connected in series to one another, and a number “n” of diodes each connected to opposite ends of each of the “n” secondary coils, to prevent a reverse current flowing from the pair of discharge electrodes toward the secondary coils.