H01S3/1127

LASER DEVICE, METHOD OF MANUFACTURING LASER DEVICE, LASER APPARATUS, AND LASER AMPLIFYING DEVICE
20220344892 · 2022-10-27 ·

[Object] To provide a compact and high-performance laser device and a laser apparatus.

[Solving Means] A laser device according to the present disclosure includes an excitation light source having a first reflective layer with respect to a first wavelength; a laser medium having a second reflective layer with respect to a second wavelength on a first surface facing to the excitation light source and a third reflective layer with respect to the first wavelength on a second surface opposite to the first surface; and a saturable absorber having a fourth reflective layer with respect to the second wavelength on a third surface opposite to the laser medium.

Degradation detection for a pulsed laser

A device may determine at least one metric related to a plurality of laser pulses associated with a Q-switched laser. The device may determine a statistical metric for the at least one metric related to the plurality of laser pulses. The device may determine that the statistical metric satisfies a threshold level of deviation of the at least one metric related to the plurality of laser pulses from a baseline value for the at least one metric. The device may indicate laser degradation of the Q-switched laser based on determining that the statistical metric satisfies the threshold.

Q-switched cavity dumped sub-nanosecond laser
11791603 · 2023-10-17 · ·

Apparatuses and methods are disclosed for applying laser energy having desired pulse characteristics, including a sufficiently short duration and/or a sufficiently high energy for the photomechanical treatment of skin pigmentations and pigmented lesions, both naturally-occurring (e.g., birthmarks), as well as artificial (e.g., tattoos). The laser energy may be generated with an apparatus having a resonator with a sub-nanosecond round trip time.

Q-switched Cavity Dumped Sub-nanosecond Laser
20220337024 · 2022-10-20 ·

Apparatuses and methods are disclosed for applying laser energy having desired pulse characteristics, including a sufficiently short duration and/or a sufficiently high energy for the photomechanical treatment of skin pigmentations and pigmented lesions, both naturally-occurring (e.g., birthmarks), as well as artificial (e.g., tattoos). The laser energy may be generated with an apparatus having a resonator with a sub-nanosecond round trip time.

Q-switched cavity dumped sub-nanosecond laser
11418000 · 2022-08-16 · ·

Apparatuses and methods are disclosed for applying laser energy having desired pulse characteristics, including a sufficiently short duration and/or a sufficiently high energy for the photomechanical treatment of skin pigmentations and pigmented lesions, both naturally-occurring (e.g., birthmarks), as well as artificial (e.g., tattoos). The laser energy may be generated with an apparatus having a resonator with a sub-nanosecond round trip time.

Q-switched Cavity Dumped Sub-nanosecond Laser
20200412082 · 2020-12-31 ·

Apparatuses and methods are disclosed for applying laser energy having desired pulse characteristics, including a sufficiently short duration and/or a sufficiently high energy for the photomechanical treatment of skin pigmentations and pigmented lesions, both naturally-occurring (e.g., birthmarks), as well as artificial (e.g., tattoos). The laser energy may be generated with an apparatus having a resonator with a sub-nanosecond round trip time.

DEGRADATION DETECTION FOR A PULSED LASER

A device may determine at least one metric related to a plurality of laser pulses associated with a Q-switched laser. The device may determine a statistical metric for the at least one metric related to the plurality of laser pulses. The device may determine that the statistical metric satisfies a threshold level of deviation of the at least one metric related to the plurality of laser pulses from a baseline value for the at least one metric. The device may indicate laser degradation of the Q-switched laser based on determining that the statistical metric satisfies the threshold.

EXCIMER LASER SYSTEMS WITH A RING CAVITY STRUCTURE

The present disclosure provides an excimer laser system. A master oscillator chamber may generate laser pulses with a narrowed line width and a small energy by means of a line width narrowing module, as a seed light. The seed light is refracted by a master oscillator wavefront engineering box and then incident into a power amplifier chamber through a beam splitting system. The beam splitting system, a first high reflectance mirror, a second high reflectance mirror and a third high reflectance mirror may constitute a quadrilateral annular optical path, The power amplifier chamber may have a first pair of Brewster windows and a second pair of Brewster windows, wherein the first pair of Brewster windows is located in a first optical path of the annular optical path along with a discharging electrode of the power amplifier chamber, and the second pair of Brewster windows is located in a second optical path of annular optical path which is parallel to a first amplification optical path. The present disclosure reduces the length of a ring cavity of an excimer laser system with a ring cavity structure, increasing the amplification times and achieving a deeper gain saturation amplification than a traditional structure, thereby improving the output characteristic of the excimer laser system.

Methods of operating a laser system chiller

A laser system includes a laser element, a pump source configured to input light to the laser element, a first cooling circuit and a second cooling circuit. The first cooling circuit includes a first pump configured to drive a first flow of cooling liquid through a first fluid pathway, a first primary heat exchanger configured to cool the first flow of cooling liquid, and a laser element heat exchanger configured to remove heat from the laser element using the first flow of cooling liquid. The second cooling circuit includes a second pump configured to drive a flow of cooling liquid through a second fluid pathway, a second primary heat exchanger configured to cool the second flow of cooling liquid, and a pump source heat exchanger configured to remove heat from the pump source using the first and second flows of cooling liquid.