A dielectric welding film capable of achieving a tight welding through a short period of dielectric heating, and a welding method using the dielectric welding film are provided. The dielectric welding film is configured to weld a pair of adherends of the same material or different materials through dielectric heating, the dielectric welding film including a thermoplastic resin as an A component and a dielectric filler as a B component and satisfying the conditions (i) and (ii): (i) a melting point or softening point measured in accordance with JIS K 7121 (1987) is in a range from 80 to 200 degrees C.; and (ii) heat of fusion measured in accordance with JIS K 7121 (1987) is in a range from 1 to 80 J/g.

A dielectric welding film capable of achieving a tight welding through a short period of dielectric heating, and a welding method using the dielectric welding film are provided. The dielectric welding film is configured to weld a pair of adherends of the same material or different materials through dielectric heating, the dielectric welding film including a thermoplastic resin as an A component and a dielectric filler as a B component and satisfying the conditions (i) and (ii): (i) a melting point or softening point measured in accordance with JIS K 7121 (1987) is in a range from 80 to 200 degrees C.; and (ii) heat of fusion measured in accordance with JIS K 7121 (1987) is in a range from 1 to 80 J/g.

The present invention relates to a thawing-apparatus, in which a substance is preferably heated. The present invention further relates to a method to thaw a substance with radio-frequency waves.

Heating systems utilizing radio frequency (RF) energy and methods for using the same to rapidly and uniformly heat packaged articles moving through the system on one or more convey lines. These systems may be useful for a variety of processes, including the pasteurization or sterilization of packaged foodstuffs.

In an embodiment, an apparatus includes a radio frequency (RF) generator that is to generate a RF signal, first and second electrodes, and an impedance match module in series between the RF generator and the first electrode. The RF generator detects reflected power from the RF signal applied to a load electrically coupled between the first and second electrodes to change a temperature of the load, the RF signal to be applied to the load until the reflected power reaches a particular value.

In an embodiment, an apparatus includes a radio frequency (RF) generator that is to generate a RF signal, first and second electrodes, and an impedance match module in series between the RF generator and the first electrode. The RF generator detects reflected power from the RF signal applied to a load electrically coupled between the first and second electrodes to change a temperature of the load, the RF signal to be applied to the load until the reflected power reaches a particular value.

A household appliance includes a compartment, a door for closing the compartment, a non-movable part, and a door monitoring apparatus including a contact pair which has two contact parts. One of the two contact parts is arranged on the door and the other one of the two contact parts is arranged on the non-movable part of the household appliance.

A household appliance includes a compartment, a door for closing the compartment, a non-movable part, and a door monitoring apparatus including a contact pair which has two contact parts. One of the two contact parts is arranged on the door and the other one of the two contact parts is arranged on the non-movable part of the household appliance.

An electrode is embedded in a piece of ceramic material having a population of conduction band electrons. Applying a voltage bias to the electrode causes electrons to flow towards or away from the electrode to form a positively charged sheath either a distance apart from or adjacent the electrode, depending the polarity of the bias. The electron flow also forms a negatively charged sheath lying opposite the positively charged sheath, and an electrically neutral region lying between the two sheaths. Electromagnetic radiation impinging the ceramic material heats the ceramic where the radiation is absorbed by the electron population. As the incident radiation is absorbed in proportion to the electron density, heating is increased in the negatively charged sheath, relative to the other parts of the ceramic material. The location of heating is controlled by controlling the magnitude and polarity of the voltage bias.

An electrode is embedded in a piece of ceramic material having a population of conduction band electrons. Applying a voltage bias to the electrode causes electrons to flow towards or away from the electrode to form a positively charged sheath either a distance apart from or adjacent the electrode, depending the polarity of the bias. The electron flow also forms a negatively charged sheath lying opposite the positively charged sheath, and an electrically neutral region lying between the two sheaths. Electromagnetic radiation impinging the ceramic material heats the ceramic where the radiation is absorbed by the electron population. As the incident radiation is absorbed in proportion to the electron density, heating is increased in the negatively charged sheath, relative to the other parts of the ceramic material. The location of heating is controlled by controlling the magnitude and polarity of the voltage bias.